• Title/Summary/Keyword: Pt-doping

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Mg and Ti Doping Effect in $SrBi_2Ta_2O_9$ (Mg와 Ti Doping에 따른 $SrBi_2Ta_2O_9$의 특성 변화)

  • Park, Sol-la;Pak, Sung-Ho;Jun, Ho-Sung;Kim, Chul-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.43-46
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    • 2002
  • Ferroelectric Mg-doped SBT and Ti-doped SBT were successfully deposited on Pt/Ti/$SiO_2/Si$ substrate by using a sol-gel solution coating method. The solutions were prepared through out adding the metal alkoxide solutions to SBT solution. The typical hysteresis loop of the films was obtained at 5V. The measured $2P_r$ value were $16.50{\mu}C/cm^2$ for SBT, $18.98{\mu}C/cm^2$ and for Mg-doped SBT, and $17.10{\mu}C/cm^2$ for Ti-doped SBT at an applied voltage of 5V, respectively. And it is found that the leakage current densities are less than $10^{-7}A/cm^2$ when applied voltage is less than 10.8MV/cm, which indicates the excellent insulating characteristics.

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Structural and Electrical Properties of BiFeO3 Thin Films by Eu and V Co-Doping (Eu와 V 동시 도핑에 의한 BiFeO3 박막의 구조와 전기적 특성)

  • Chang, Sung-Keun;Kim, Youn-Jang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.3
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    • pp.229-233
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    • 2019
  • Pure $BiFeO_3$ (BFO) and (Eu, V) co-doped $Bi_{0.9}Eu_{0.1}Fe_{0.975}V_{0.025}O_{3+{\delta}}$ (BEFVO) thin films were deposited on $Pt(111)/Ti/SiO_2/Si(100)$ substrates by chemical solution deposition. The effects of co-doping were observed by X-ray diffraction, Raman spectroscopy, and scanning electron microscopy (SEM). The electrical properties of the BEFVO thin film were improved as compared to those of the pure BFO thin film. The remnant polarization ($2P_r$) of the BEFVO thin film was approximately $26{\mu}C/cm^2$ at a maximum electric field of 1,190 kV/cm with a frequency of 1 kHz. The leakage current density of the co-doped BEFVO thin film ($4.81{\times}10^{-5}A/cm^2$ at 100 kV/cm) was two orders of magnitude lower than of that of the pure BFO thin film.

Comparison of Dye Removal Performance of Direct and Indirect Oxidation Electrode (직접 산화와 간접 산화용 전극의 Dye 제거 성능 비교)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Korean Society on Water Environment
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    • v.26 no.6
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    • pp.963-968
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    • 2010
  • This study has carried out to evaluate the performance of direct and indirect oxidation electrode for the purpose of decolorization of Rhodamine B (RhB) in water. Four kinds of electrodes were used for comparison: Pt and JP202 (indirect oxidation electrode), Pb and boron doping diamond (BDD, direct oxidation electrode). The effect of applied current (0.5 ~ 2.5 A), electrolyte type (NaCl, KCl, HCl, $Na_2SO_4$ and $H_2SO_4$) and electrolyte concentration (0.5 ~ 2.5 g/L), solution pH (3 ~ 11) and initial RhB concentration (25 ~ 125 mg/L) were evaluated. Experimental results showed that RhB removal efficiency were increased with increase of current, NaCl dosage and decrease of the pH. However, the effect of operating parameter on the RhB removal were different with the electrode type. JP202 electrode was the best electrode from the point of view of performance and energy consumption. The order of removed RhB concentration per energy lie in: JP202>Pt>Pb>BDD.

Heteroatom-doped carbon nanostructures as non-precious cathode catalysts for PEMFC (이종 원자 도핑 탄소 나노재료를 이용한 PEMFC Cathode용 촉매 합성 및 평가)

  • Jo, G.Y.;Shanmugam, S.
    • 한국태양에너지학회:학술대회논문집
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    • 2012.03a
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    • pp.406-409
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    • 2012
  • Recently, enormous research efforts have been focused on the development of non-precious catalysts to replace Pt for electrocatalytic oxygen reduction reaction (ORR), and to reduce the cost of proton exchange membrane fuel cells (PEMFCs). In recent years, heteroatom (N, B, and P) doped carbon nanostructures have been received enormous importance as a non-precious electrode materials for oxygen reduction. Doping of foreign atom into carbon is able to modify electronic properties of carbon materials. In this study, nitrogen and boron doped carbon nanostructures were synthesized by using a facile and cost-effective thermal annealing route and prepared nanostructures were used as a non-precious electrocatalysts for the ORR in alkaline electrolyte. The nitrogen doped carbon nanocapsules (NCNCs) exhibited higher activity than that of a commercial Pt/C catalyst, excellent stability and resistance to methanol oxidation. The boron-doped carbon nanostructure (BC) prepared at $900^{\circ}C$ showed higher ORR activity than BCs prepared lower temperature (800, $700^{\circ}C$). The heteroatom doped carbon nanomaterials could be promising candidates as a metal-free catalysts for ORR in the PEMFCs.

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The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film

  • Choi, J.Y.;Jang, G.E.
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.5
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    • pp.189-193
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    • 2004
  • Pure and Sn or Pt doped $\alpha-Fe_2O_3$ thin films were prepared on $Al_2O_3$ substrates by RF-magnetron sputtering method and the sensitivities were compared. It was found that pure $\alpha-Fe_2O_3$ thin films did not exhibit much selectivity in CO and $i-C_4H_{10}$ gases while it showed the high sensitivity in proportion to the gas concentration of $C_2H_{5}OH$ gas. Pt-doped $\alpha-Fe_2O_3$ showed to be alike sensing properties as pure $\alpha-Fe_2O_3$ thin film in $C_2H_{5}OH$ gas. However, Sn-doped $\alpha-Fe_2O_3$ thin films exhibited the excellent sensitivity and selectivity in Hz gas. After microstructure modification by plasma etching on pure $\alpha-Fe_2O_3$ thin films, the gas sensing characteristics were dramatically changed.

A study on the Ohmic contact resistance as function of V/III ratio of n-GaAs (n-GaAs의 V/III족 비율에 따른 오믹 저항 연구)

  • Kim, In-Sung;Kim, Sang-Taek;Kim, Seon-Hoon;Ki, Hyun-Chul;Ko, Hang-Ju;Kim, Hwe-Jong;Jun, Gyeong-Nam;Kim, Hyo-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.25-26
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    • 2008
  • Electrical properties of Pt/Ti/Au/Pt contacts to n-GaAs were characterized as the V/III ratio of GaAs grown by metalorganic chemical vapor deposition were 25, 50, and 100, respectively. The samples have been annealed during 30sec at 350 and $450^{\circ}C$ in rapid thermal annealing, and those specific contact resistance investigated by using transmission line method. According to experimental results, the specific contact resistance between p-metal and GaAs was decreased as the V/III ratio was lower. These results indicate that Si doping concentration of GaAs increased as the vacancy of V-series of GaAs was high.

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Fabrication of NO sensor integrated SiC micro heaters for harsh environments and its characteristics (SiC 마이크로 히터가 내장된 극한 환경용 NO 센서의 제작과 특성)

  • Kim, Kang-San;Chung, Gwiy-Sang
    • Journal of Sensor Science and Technology
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    • v.19 no.3
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    • pp.197-201
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    • 2010
  • This paper describes the fabrication and characteristics of a NO sensor using ZnO thin film integrated 3C-SiC micro heater based on polycrystalline 3C-SiC thin film of operation in harsh environments. The sensitivity, response time, and operating properties in high temperature and voltages of NO sensors based SiC MEMS are measured and analyzed. The sensitivity of device with pure ZnO thin film at the heater operating power of 13.5 mW ($300^{\circ}C$) is 0.875 in NO gas concentration of 0.046 ppm. In the case of Pt doping, the sensitivity of at power consumption of 5.9 mW ($250^{\circ}C$) was 1.92 at same gas flow rate. The ZnO with doped Pt was showed higher sensitivity, lower working temperature and faster adsorption characteristics to NO gas than pure ZnO thin film. The NO gas sensor integrated SiC micro heater is more strength than others in high voltage and temperature environments.

Leakage Current of Capacitive BST Thin Films (BST 축전박막의 누설전류 평가)

  • 인태경;안건호;백성기
    • Journal of the Korean Ceramic Society
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    • v.34 no.8
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    • pp.803-810
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    • 1997
  • Ba0.5Sr0.5TiO3 thin films were deposited by RF magnetron sputliring method in order to clarify the anneal condition and doping effect on loakage current Nb and Al were selected as electron donor and acceptor dopants respectively, in the BST films because they have been known to have nearly same ionic radii as Ti and thought to substitute Ti sites to influence the charge carrier and the acceptor state adjacent to the gram boundary. BST thin films prepared in-situ at elevated temperature showed selatively high leakage current density and low breakdown voltage. In order to achieve smooth surface and to improve electrical properties, BST thin films were deposited at room temperature and annealed at elevated temperature. Post-annealed BST thin films showed smoother surface morphology and lower leakage current density than in-situ prepared thin films. The leakage current density of Al doped thin films was measured to be around 10-8A/cm2, which is much lower than those of undoped and Nb doped BST films. The result clearly demonstrates that higher Schottky barrier and lower mobile charge carrier concentration achieved by annealing in the oxygen atmosphere and by Al doping are desirable for reducing leakage current density in BST thin films.

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Fabrication of SiC Schottky Diode with Field oxide structure (Field Oxide를 이용한 고전압 SiC 쇼트키 diode 제작)

  • Song, G.H.;Bahng, W.;Kim, S.C.;Seo, K.S.;Kim, N.K.;Kim, E.D.;Park, H.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.350-353
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    • 2002
  • High voltage SiC Schottky barrier diodes with field plate structure have been fabricated and characterized. N-type 4H-SiC wafer with an epilayer of ∼10$\^$15/㎤ doping level was used as a starting material. Various Schottky metals such as Ni, Pt, Ta, Ti were sputtered and thermally-evaporated on the low-doped epilayer. Ohmic contact was formed at the backside of the SiC wafer by annealing at 950$^{\circ}C$ for 90 sec in argon using rapid thermal annealer. Field oxide of 550${\AA}$ in thickness was formed by a wet oxidation process at l150$^{\circ}C$ for 3h and subsequently heat-treated at l150$^{\circ}C$ for 30 min in argon for improving oxide quality. The turn-on voltages of the Ni/4H-SiC Schottky diode was 1.6V which was much higher than those of Pt(1.0V), Ta(0.7V) and Ti(0.7). The voltage drop was measured at the current density of 100A/$\textrm{cm}^2$ showing 2.1V for Ni Schottky diode, 1.45V for Pt 1.35V, for Ta, and 1.25V for Ti, respectively. The maximum reverse breakdown voltage was measured 1100V in the file plated Schottky diodes with 101an thick epilayer.

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Mn-Modified PMN-PZT [Pb(Mg1/3Nb2/3)O3-Pb(Zr,Ti)O3] Single Crystals for High Power Piezoelectric Transducers

  • Oh, Hyun-Taek;Lee, Jong-Yeb;Lee, Ho-Yong
    • Journal of the Korean Ceramic Society
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    • v.54 no.2
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    • pp.150-157
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    • 2017
  • Three types of piezoelectric single crystals [PMN-PT (Generation I $[Pb(Mg_{1/3}Nb_{2/3})O_3-PbTiO_3]$), PMN-PZT (Generation II $[Pb(Mg_{1/3}Nb_{2/3})O_3-Pb(Zr,Ti)O_3]$), PMN-PZT-Mn (Generation III)] were grown by the solid-state single crystal growth (SSCG) method, and their dielectric and piezoelectric properties were measured and compared. Compared to (001) PMN-PT and PMN-PZT single crystals, the (001) PMN-PZT-Mn single crystals exhibited a higher transition temperature between the rhombohedral and tetragonal phases ($T_{RT}=144^{\circ}C$), as well as a higher coercive electric field ($E_C=6.3kV/cm$) and internal bias field ($E_I=1.6kV/cm$). The (011) PMN-PZT-Mn single crystals showed the highest coercive electric field ($E_C=7.0kV/cm$), and the highest stability of $E_C$ and $E_I$ during 60 cycles of polarization measurement. These results demonstrate that both Mn doping (for higher electromechanical quality factor ($Q_m$)) and a (011) crystallographic orientation (for higher coercive electric field and stability) are necessary for high power transducer applications of these piezoelectric single crystals. Specifically, the (011) PMN-PZT-Mn single crystal (Gen. III) had the highest potential for application in the fields of SONAR transducers, high intensity focused ultrasound (HIFU), ultrasonic motors, and others.