• Title/Summary/Keyword: Pt(100)

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Synthesis and Photovoltaic Properties of Novel Ruthenium(II) Sensitizers for Dye-sensitized Solar Cell Applications

  • Ryu, Tae-In;Song, Myung-Kwan;Lee, Myung-Jin;Jin, Sung-Ho;Kang, Sun-Woo;Lee, Jin-Yong;Lee, Jae-Wook;Lee, Chan-Woo;Gal, Yeong-Soon
    • Bulletin of the Korean Chemical Society
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    • v.30 no.10
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    • pp.2329-2337
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    • 2009
  • Three heteroleptic ruthenium sensitizers, Ru(L)($L^1)(NCS)_2$ [L = 4,4'-dicarboxylic acid-2,2'-bipyridine, Ru-T1: $L^1$ = (E)-2-(4'-methyl-2,2'-bipyridin-4-yl)-3-(thiophen-2-yl)acrylonitrile, Ru-T2: $L^2$ = (E)-3-(5'-hexyl-2,2'-bithiophen-5- yl)-2-(4'-methyl-2,2'-bipyridin-4-yl)acrylonitrile, and Ru-T3: $L^3$ = (E)-3-(5"-hexyl-2,2':5',2"-terthiophen-5-yl)-2- (4'-methyl-2,2'-bipyridin-4-yl)acrylonitrile)], were synthesized and used as photosensitizers in nanocrystalline dyesensitized solar cells (DSSCs). The introduction of the 3-(5-hexyloligothiophen-5-yl)acrylonitrile group increased the conjugation length of the bipyridine donor ligand and thus improved their molar absorption coefficient and light harvesting efficiency. DSSCs with the configuration of Sn$O_2$: F/Ti$O_2$/ruthenium dye/liquid electrolyte/Pt devices were fabricated using these Ru-$T1{\sim}T3$ as a photosensitizers. Among the devices, the DSSCs composed of Ru-T2 exhibited highest power conversion efficiency (PCE) of 2.84% under AM 1.5 G illumination (100 mW/$cm^2$).

LS-MOCVD OF BARIUM STRONTIUM TITANATE THIN FILMS USING NOVEL PRECURSORS

  • Kwon, Hyun-Goo;Oh, Young-Woo;Park, Jung-Woo;Lee, Young-Kuk;Kim, Chang-Gyoun;Kim, Do-Jin;Kim, Yunsoo
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2002.11a
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    • pp.19-19
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    • 2002
  • Perovskite-type titanate dielectrics have attracted much attention in memory devices such as DRAMs or FeRAMs due to their high dielectric constants. However, low volatility of the Ba, Sr, Pb or Zr precursors with only thd ligands has limitations in obtaining high quality thin films by liquid source metal organic chemical vapor deposition (LS-MOCVD) processes. To improve the volatility of these precursors, many attempts have been made such as adding polyether ligands to satisfy the coordinative saturation. We report the synthesis of new precursors Ba(thd)₂(tmeea) and Sr(thd)₂(tmeea), where tmeea = tris[2-(2-methoxyethoxy)ethyl]amino, and LS-MOCVD of barium strontium titanate (BSTO) thin films using these precursors. Due to increased basicity of amines compared with ethers, it is expected that the nitrogen-donor ligand will make a strong bond to a metal than an analogous oxygen-donor ligand, consequently improving the volatility and thermal behavior of these precursors. Thin films of BSTO were grown on Pt(111)/SiO₂/Si(100) substrates by LS-MOCVD using a cocktail source consisting of the conventional Ti precursor Ti(thd)₂(O/sup i/Pr), and these new Ba and Sr precursors. As-grown films were characterized by XPS, SEM, XRD, XRF, and C-V and I-V measurements. BSTO films grown at 420℃ were stoichiometric barium strontium titanate with very smooth surface morphology and their dielectric constants were found to be as targe as 450. Dependence of the composition, microstructure and the electrical properties of the BSTO films on the growth temperature, annealing temperature, working pressure, and the composition of the cocktail source will be discussed.

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Research on ultra-precision fine-pattern machining through single crystal diamond tool fabrication technology (단결정 다이아몬드공구 제작 기술을 통한 초정밀 미세패턴 가공 연구)

  • Jung, Sung-Taek;Song, Ki-Hyeong;Choi, Young-Jae;Baek, Seung-Yub
    • Design & Manufacturing
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    • v.14 no.3
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    • pp.63-70
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    • 2020
  • As the consumer market in the VR(virtual reality) and the head-up display industry grows, the demand for 5-axis machines and grooving machines using on a ultra-precision machining increasing. In this paper, ultra-precision diamond tools satisfying the cutting edge width of 500 nm were developed through the process research of a focused ion beam. The material used in the experiment was a single-crystal diamond tool (SCD), and the equipment for machining the SCD used a focused ion beam. In order to reduce the influence of the Gaussian beam emitted from the focused ion beam, the lift-off process technology used in the semiconductor process was used. 2.9 ㎛ of Pt was coated on the surface of the diamond tool. The sub-micron tool with a cutting edge of 492.19 nm was manufactured through focused ion beam machining technology. Toshiba ULG-100C(H3) equipment was used to process fine-pattern using the manufactured ultra-precision diamond tool. The ultra-precision machining experiment was conducted according to the machining direction, and fine burrs were generated in the pattern in the forward direction. However, no burr occurred during reverse machining. The width of the processed pattern was 480 nm and the price of the pitch was confirmed to be 1 ㎛ As a result of machining.

Electrical Characteristics of PZT Thin film Deposited by Rf-magnetron Sputtering as Pb Excess Content of Target (Rf-sputtering법으로 증착한 PZT박막의 타겟의 Pb 함량에 따른 전기적 특성에 관한 연구)

  • Lee, Kyu-Il;Kang, Hyun-Il;Park, Young;Park, Ki-Yub;Song, Joon-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.3
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    • pp.186-189
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    • 2003
  • The role of excess Pb about the crystallization behavior and electrical properties in b(Zr$\sub$0.52/Ti$\sub$0.48/)O3(PZT) thin films has not been precisely defined. In this work, the effect of excess Pb content on the ferroelectric properties of these films was investigated. To analyze the effect, PZT films containing various amounts of excess Pb were Prepared. PZT thin films were deposited on the Pt/Ti bottom electrode by rf magnetron sputtering method and then they were crystallized by rapid thermal annealing (RTA). The experiment showed that all PZT films indicated perovskite polycrystalline structure with preferred orientation (111) and no pyrochlore phase was observed. As higher excess Pb was included, the films showed that value of leakage current shift from 2.03${\times}$10$\^$-6/ to 6.63 ${\times}$ 10$\^$-8/A/cm$^2$ at 100kV/cm, and value of remanent polarization shift from 8.587 ${\mu}$C /cm$^2$ to 4.256 ${\mu}$C/ cm$^2$. Electrical properties of PZT thin film affected by Pb excess content of target were explained to be caused of defect among space charges and defect grain boundaries.

A New 1200V PT-IGBT with Protection Circuit employing the Lateral IGBT and Floating p-well Voltage Sensing Scheme (Floating P-well 전압 감지 방법과 수평형 절연 게이트 바이폴라 트랜지스터(LIGBT)를 이용한 새로운 1200V 절연 게이트 바이폴라 트랜지스터(IGBT)의 보호회로)

  • Cho, Kyu-Heon;Ji, In-Hwan;Han, Young-Hwan;Lee, Byung-Chul;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 2006.10a
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    • pp.99-100
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    • 2006
  • 절연 게이트 바이폴라 트랜지스터 (Insuialed atc Bipolar Transistor : IGBT)는 높은 전류구동 능력과 높은 입력 임피던스 특성으로 인해 대전력 스위칭 소자로 널리 응용되고 있다. 특히, 대용량 모터 구동을 위해 응용되는 경우, 모터의 부하 특성상, 모터의 단락에 의한 단락 회로 (Short-circuit fault) 현상을 비롯한 클램핑 다이오드의 파손으로 인한 unclamped 유도성 부하 스위칭 (UIS) 상황에서 견딜 수 있도록 설계되어야 한다. 이를 위해, 이전 연구를 통해 Floating p-well을 600V급 IGBT에 도입함으로써 UIS 상황에서 IGBT가 견딜 수 있는 에너지(항복 에너지)륵 증가시키고 Floating p-weil 전압을 감지함으로써 단락 회로 상황에서 IGBT가 보호될 수 있도록 보호회로를 제안하고 검증하였다. 그러나 이 보호회로는 수평형 금속 산화막 반도체 전계 효과 트랜지스터 (Latcral MOSFET)로 제작됨으로써 보호회로 기능을 수행하기 위해서는 넓은 면적을 요구하였다. 또한, 정상적인 동작 상황에서 오류를 감지 (오류 감지: False detection)하는 동작으로 인해 추가적인 filter를 요구함으로써 보호회로 동작 속도를 감소시켰다. 이러한 단점을 해결하기 위해, 수평형 절연 게이트 바이폴라 트랜지스터 (Lateral IGBT : LIGBT)를 보호회로에 적용함으로써 LIGBT의 높은 전류 구동능력을 이용하여 기존 보호회로 면적의 30% 수준의 보호회로를 구현하였다. 또한, 구현된 보호회로는 오류 감지 현상을 제거함으로써 보호회로의 동작 속도를 개선하였다. 제안된 보호회로와 1200V급 IGBT는 7장의 마스크를 이용한 표준 수평형 IGBT 공정을 이용하여 제작되었으며, 특히, 전자빔 조사를 이하여 턴오프 속도를 개선함으로써 고속 스위칭에 적합하도록 최적화 되었다.

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Single crystal growth of synthetic emerald by flux method of Vandadium - Molybdenum - Lithium oxide system (산화 바나디움, 몰리브데늄, 리티움계 융제법에 의한 합성 Emerald 단결정 육성)

  • 최의석;김무경;이종민;안영필;서청교;안찬준
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.1
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    • pp.44-55
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    • 1996
  • Emerald (3BeO{\cdot}Al$_{2}$O_{3}{\cdot}6SiO_2 : Cr^{3+}$) single crystals were grown by flux method of $Li_2O-MoO_3 - V_2O_5$ system. The composition of starting materials were 1, 3, 5 mole ratio of $MoO_3 - V_2O_5/$Li_2O$, 20 - 15% of emerald content to flux composition and 1% of $Cr_2O_3$ colordopant to emerald composition. After mixing those were melted at $1100^{\circ}C$ in Pt crucible of electric furnace. Single crystal growth was cooled down slowly rate of $3^{\circ}C$/hr from $1100^{\circ}C$ to $650^{\circ}C$, for the cooling period it was controlled and prevented the nucleation of microcrystallite from variation of each thermal fluctuation range. Specially it has been obtained plenty of large emerald single crystal when thermal fluctuation was treated for cooling period at $1050 ~ 950^{\circ}C$, in 3 mole ratio of $V_2O_5 - MoO_3/Li_2O$ flux. Emerald single crystal growing effect and $Cr_{+3}$ ion of substitutional solid solution effect for $Al_{+3}$ ion was good than mole ratio of 5. Emerald single crystals were c (0001) hexagonal rystal face of preferencial direction and m (1010) post side. Emerald was hexagonal columnar greenish transparent and 2.65 ~ 2.66 of specific gravity.

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AFM을 이용한 나노급 $Ge_2Sb_2Te_5$의 전기적 특성

  • Bae, Byeong-Ju;Hong, Seong-Hun;Jo, Jung-Yeon;O, Sang-Cheol;Hwang, Jae-Yeon;Lee, Heon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.21.1-21.1
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    • 2009
  • 상변화 메모리는 비휘발성 메모리이면서 빠른 동작 속도, 낮은 동작 전압 등 다양한 장점을 지니고 있어 차세대 메모리로 주목 받고 있다. 최근 상변화 메모리의 동작 전류를 감소시키기 위해 상변화 물질 및 전극 물질에 대한 연구를 진행하고 있으며, 소자의 크기를 최소화 하기 위한 연구가 진행되고 있다. 본 연구에서는 나노 임프린트 리소그래피와 전도성 AFM을 이용하여 나노급 상변화 물질의 특성을 평가하였다. 나노급 상변화 물질을 형성하기 위해 열경화성 나노 임프린트 리소그래피를 이용하여 $Ge_2Sb_2Te_5$(GST)/Mo/SiO2 기판 위에 200nm급 홀 패턴을 형성하였다. 홀 패턴에 Cr을 증착하여 리프트 오프 한 뒤 Cr을 하드 마스크로 사용하여 GST를 식각하였다. 그 결과, Mo 하부 전극 위에200nm 지름과 100nm 높이를 가지는 GST 나노 기둥을 형성하였다. GST 나노 기둥의 전기적 특성 평가를 위해 저항 측정 장비 및 펄스 발생기와AFM을 사용하였다. AFM은 접촉 모드로 설정하였으며, Pt가 코팅된 AFM tip을 사용하여 Cr 하드 마스크와 함께 상부 전극으로 사용하였다. GST 나노 기둥을 초기화 시키기 위해 I-V sweep을 하였으며, 그 결과 $1M\Omega$에서 $10\;k\Omega$으로 저항이 변화함을 확인하였다. GST 나노 기둥은 2V, 5ns의 리셋 펄스에서 비정질로 변화하였으며, 1.3V, 150ns의 셋 펄스에서 결정질로 변화하였다. 이 동작 전압으로 5번의 스위칭 특성을 평가하였으며, 이 결과는 소자 형태의 200nm 급GST의 특성과 유사하여 나노급 상변화 물질을 테스트하는 새로운 방법으로 사용될 수 있을 것이다.

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Antiplatelet Activity of 2-(4-Cyanophenyl) amino-1,4-naphthalenedione-3-pyridinium perchlorate (PQ5) (2-(4-시아노페닐) 아미노 -1,4-나프탈렌디온-3-피리디니움 퍼클로레이트 (PQ5)의 항혈소판작용)

  • 김도희;이수환;최소연;문창현;문창현;김대경;유충규
    • YAKHAK HOEJI
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    • v.43 no.6
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    • pp.809-817
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    • 1999
  • The effect of 2-(4-cyanophenyl)amino-1,4-naphthalenedione-3-pyridinium perchlorate (PQ5) on pla-telet aggregation and its action mechanisms were investigated with rat platelet. PQ5 inhibited the platelet aggregation induced by collagen ($6{\;}{\mu\textrm{g}}/ml$), thrombin (0.4 U/ml) and A23187 ($3{\mu}M$) in concentration-dependent manner with $IC_{50}$ values of 5.50, 25.89 and $37.12{\;}{\mu}M$, respectively. PQ5 also significantly reduced the thromboxane $A_2$ (TXA2) formation in a concentration dependent manner. The collagen-induced arachidonic acid (AA) release in [-3H]-AA incorporated platelet, an indication of the phospholipase $A_2$ activity, was decreased by PQ5 pretreatment PQ5 significantly inhibited the activity of thormboxane synthase only at high concentration ($100{\mu}M$), but did not affect the cyclooxygenase activity at all. Collagen-induced ATP release was significantly reduced by PQ5. Calcium-induced platelet aggregation experiment suggests that the elevation of intracellular free $Ca^{2+}$ concentration ($[Ca^{2+}]_i$) by collagen stimulation is decreased by the pretreatment of PQ5, which is due to the inhibition of calcium release from intracellular store and influx from outside of the cell. PQ5 did not showed the effect of anticoagulation as prothrombin time (PT) or activated partial thromboplastin time (APTT). Form these results, it is suggested that PQ5 exerts its antiplatelet activity through the inhibition of the intracellular $Ca^{2+}$ mobilization and the decrease of the $TXA_2$ synthesis.

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Study on the Characteristics of Catalyst Reaction for Hydrogen Recovery from Nuclear Fusion Exhaust Gas (핵융합 배가스 중 수소 회수를 위한 촉매반응 특성 연구)

  • JUNG, WOOCHAN;JUNG, PILKAP;KIM, JOUNGWON;MOON, HUNGMAN
    • Journal of Hydrogen and New Energy
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    • v.26 no.5
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    • pp.402-408
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    • 2015
  • In D-T fusion reaction, $D_2$ (duterium) and $T_2$(tritium) are used as fuel gas. The exhaust gas of nuclear fusion includes hydrogen isotopes $Q_2$ (Q means H, D or T), tritiated components ($CQ_4$ and $Q_2O$), CO, $CO_2$, etc. All of hydrogen isotopes should be recovered before released to the atmosphere. This study focused on the recovery of hydrogen isotopes from $CQ_4$ and $Q_2O$. Two kinds of experiments were conducted to investigate the catalytic reaction characteristics of SMR (Steam Methane Reforming) and WGS (Water Gas Shift) reactions using Pt catalyst. First test was performed to convert $CH_4$ into $H_2$ using 6% $CH_4$, 6% CO/Ar feed gas. In the other test, 100% CO gas was used to convert $H_2O$ into $H_2$ at various reaction conditions (reaction temperature, S/C ratio, GHSV). As a result of the first test, $CH_4$ and CO conversion were 41.6%, 57.8% respectively at $600^{\circ}C$, S/C ratio 3, GHSV $2000hr^{-1}$. And CO conversion was 72% at $400^{\circ}C$, S/C ratio 0.95, GHSV $333hr^{-1}$ in the second test.

The Designing of an Air-gap Type FBAR Filter using Leach Equivalent Model

  • Choi, Hyung-Wook;Jung, Joong-Yeon;Lee, Seung-Kyu;Park, Yong-Seo;Kim, Kyung-Hwan;Shin, Hyun-Yong
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.4
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    • pp.196-203
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    • 2006
  • An air-gap type FBAR was designed using Leach equivalent model for analyzing a vertical structure of the FBAR. For the top electrode, Pt, and the bottom electrode, Au, of $1.2{\mu}m$ thickness and the piezoelectric of 0.8,urn thickness, the resonance and anti-resonance occurred at 2.401 GHz and 2.460 GHz, respectively. $S_{11}$ was increased and $S_{21}$ was decreased as the resonance area of FBAR was widened. We observed the characteristics of insertion loss, bandwidth and out-of-band rejection of ladder-type FBAR BPF by changing resonance areas of series and shunt resonators and by adding stages. As the resonance area of series resonator was increased, insertion loss was improved but out-of-band rejection was degraded. And as the resonance area of shunt resonator was increased, insertion loss was degraded a little but out-of-band rejection was improved even without adding stages. We, also, changed the shape of the resonance area from square shape to rectangle shape to examine the effects of the resonator shape on the characteristics of the BPF. The best performances were observed when the sizes of series and shunt resonator are $150{\mu}m{\times}l50{\mu}m\;and\;5{\mu}m{\times}50{\mu}m$, respectively. Out-of-band rejection was improved about 10dB and bandwidth was broadened from 30MHz to 100MHz utilizing inductor tuning on $2{\times}2\;and\; 4{\times}2$ ladder-type BPFs.