• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.5
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• pp.294-297
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• 2016

Titanium oxide ($TiO_2$) thin films were fabricated by unbalanced magnetron (UBM) sputtering. The fabricated $TiO_2$ films were treated by oxygen plasma under various RF powers. We investigated the characteristics of oxygen plasma treatment on the surface, structural, and physical properties of $TiO_2$ films prepared at various plasma treatment RF powers. UBM sputtered $TiO_2$ films exhibited higher contact angle value, smooth surface, and amorphous structure. However, the rms surface roughness $TiO_2$ films were rough, and the contact angle value was decreased with the increase of the plasma treatment RF power Also, the hardness value of $TiO_2$ film as physical properties was slightly increased with the increase of the plasma treatment RF power. In the results, the performance of $TiO_2$ films for self cleaning critically depended on the with the plasma treatment RF power.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.309-309
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• 2010

We have investigated the effect of $H_2$ plasma treatment on the BZO (ZnO:B, Boron doped ZnO) thin films. The BZO thin films are prepared by LP-MOCVD (Low Pressure Metal Organic Chemical Vapor Deposition) technique and the samples of BZO thin film are performed with $H_2$ plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. After exposing $H_2$ plasma treatment, measurement of transmittance, reflectance and haze spectra in 300~1100 nm, electrical properties as resistivity, mobility and carrier concentration and work function was analysed. Regarding the results of the $H_2$ plasma treatment on the BZO thin films are application to the TCO for solar cells, such as the a-Si thin films solar cell.

• Journal of the Semiconductor & Display Technology
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• v.6 no.1 s.18
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• pp.23-26
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• 2007

The effects of plasma treatment on the ITO/glass substrate before deposition of organic materials were investigated in the fabrication of green light emitting organic devices with $Alq_3-C545T$ fluorescent system. In our experiments, the optimum plasma treatment was obtained at the power and time of 150W and 2 minutes under the $Ar(50%)/O_2$ ambient of 1 mTorr. The green OLED with plasma treatment at 150W for 2 minutes showed the luminance and efficiency of $4700\;cd/m^2$ and 8 lm/W at 10V, respectively. On the contrary, the same structured device without plasma treatment showed much lower performance with the luminance of $2600\;cd/m^2$ and the efficiency of 3.6 lm/W at 10 V.

• Journal of Adhesion and Interface
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• v.14 no.3
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• pp.111-116
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• 2013

In this study, we studied surface and adhesion properties with plasma treatment for substitution of buffing and solvent-cleaning in footwear adhesion process. The distance between nozzle and rubber parts was decreased with decreasing the contact angle. And when a speed of plasma treatment increased, the contact angle increased. The result of surface roughness, Ra and Rz increased in 20% and 16% after the plasma treatment. The distance of between nozzle and rubber parts was decreased with decreasing the peel strength. And the speed of plasma treatment was increased with decreasing the peel strength.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.436-437
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• 2006

In this work, impedance Spectroscopic analysis was applied to study the effect of plasma treatment on the surface of indum-tin oxide (ITO) anodes using $O_2$ gas and to model the equivalent circuit for organic light emitting diodes (OLEDs) with the $O_2$ plasma treatment of ITO surface at the anodes. This device with ITO/TPD/Alq3/LiF/Al structure can be modeled as a simple combination of a resistor and a capacitor. The $O_2$ plasma treatment on the surface of ITO shifts the vacuum level of the ITO as a result of which the barrier height for hole injection at the ITO/organic interface is reduced. The impedance spectroscopy measurement of the devices with the $O_2$ plasma treatment on the surface of ITO anodes shows change of values in parallel resistance ($R_p$) and parallel capacitance ($C_p$).

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.454-454
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• 2010

In order to achieve a high efficient a-Si solar cell, the TCO (transparent conductive oxide) substrates are required to be a low sheet resistivity, a high transparency, and a textured surface with light trapping effect. Recently, a zinc oxide (ZnO) thin film attracts our attention as new coating material having a good transparent and conductive for TCO of solar cells. In this paper the optical properties of $H_2$ post-treated BZO (boron doped ZnO, ZnO:B) thin film are investigated with $O_2$-plasma treatment. The BZO thin films by MOCVD (Metal Organic Chemical Vapor Deposition) are investigated and the samples of $H_2$ post-treated BZO thin film are tested with $O_2$-plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. We measured the optical properties and surface morphology of BZO thin film with and without $O_2$-plasma treatment. The optical properties such as transmittance, reflectance and haze are measured with integrating sphere and ellipsometer. This result of the BZO thin film with and without $O_2$-plasma treatment is application to the TCO for solar cells.

• Journal of Powder Materials
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• v.28 no.2
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• pp.97-102
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• 2021

Powder quality, including high flowability and spherical shape, determines the properties of additively manufactured products. Therefore, the cheap production of high-quality powders is critical in additive manufacturing. Radio frequency plasma treatment is an effective method to fabricate spherical powders by melting the surface of irregularly shaped powders; in the present work, mechanically milled Zr powders are spheroidized by radio frequency plasma treatment and their properties are compared with those of commercial Zircaloy-2 alloy powder. Spherical Zr particles are successfully fabricated by plasma treatment, although their flowability and impurity contents are poorer than those of the commercial Zircaloy-2 alloy powder. This result shows that radio-frequency plasma treatment with mechanically milled powders requires further research and development for manufacturing low-cost powders for additive manufacturing.

• Macromolecular Research
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• v.10 no.5
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• pp.291-295
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• 2002

Atomic force microscopy(AFM) was used to study the polyethylene(PE) surfaces grafted and immobilized with acrylic acid by Ar plasma treatment. The topographical images and parameters including RMS roughness and Rp-v value provided an appropriate means to characterize the surfaces. The plasma grafting and immobilization method were a useful tool for the preparation of surfaces with carboxyl group. However, the plasma immobilization method turned out to have a limitation to use as a means of preparation of PE surface with specific functionalities, due to ablation effect during the Ar plasma treatment process.

• International Journal of Industrial Entomology and Biomaterials
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• v.38 no.2
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• pp.25-30
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• 2019

Atmospheric-pressure plasma technique is a technology for sterilizing agricultural product. In this study, dielectric barrier discharge plasma was applied to silkworm powder for 1 to 5 h with less than 2 ppm of $O_3$ and $NO_2$. Quantitative compositions including proximate contents, mineral and heavy metal contents, fatty acids, vitamins, and DNJ contents were measured. Proximate contents of silkworm powder were protein (57.2%), fat (9.9%), fiber (4.6%), ash (10.1%), and moisture (5.7%). These compositions were not affected by the treatment of plasma. Silkworm powder has 5 abundant minerals potassium (K), phosphorus (P), sulfur (S), calcium (Ca), and magnesium (Mg). Among these minerals, plasma treatment decreased the contents of P and S sharply from 732.3 to 176.8, and 492.7 to 185.2 mg/100g, respectively. Heavy metal contents including lead (Pb), cadmium (Cd), arsenic (As), and mercury (Hg) were not detected in the silkworm powder. Five vitamins such as ascorbic acid (13.6 mg/100g), riboflavin (5.4 mg/100g), ${\beta}$-carotene (1.8 mg/100g), niacin (0.6 mg/100g), and thiamine (0.4 mg/100g) were not significantly changed by plasma treatment. Silkworm powder is composed of 30 parts saturated fatty acids and 70 parts unsaturated ones. The fatty acid composition was not significantly changed by plasma treatment. The DNJ content of silkworm powder (3.72 mg/g) was also nearly constant within the experimental condition of plasma treatment.

• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.35-40
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• 2010

We have investigated the effects of hydrogen injection via in-situ gas addition ($O_2$, $H_2$, or $O_2$ + $H_2$ gas) and plasma post-treatment (Ar or Ar + H plasma) on material properties of ZnO that is considered to be as a channel layer in transparent thin film transistors. The variations in the electrical resistivity, optical transmittance and bandgap energy, and crystal quality of ZnO thin films were characterized in terms of the methods and conditions used in hydrogen injection. The resistivity was significantly decreased by injection of hydrogen; approximately $10^6\;{\Omega}cm$ for as-grown, $1.2\;{\times}\;10^2\;{\Omega}cm$ for in-situ with $O_2/H_2\;=\;2/3$ addition, and $0.1\;{\Omega}cm$ after Ar + H plasma treatment of 90 min. The average transmittance of ZnO films measured at a wavelength of 400-700 nm was gradually increased by increasing the post-treatment time in Ar + H plasma. The optical bandgap energy of ZnO films was almost monotonically increased by decreasing the $O_2/H_2$ ratio in in-situ gas addition or by increasing the post-treatment time in Ar + H plasma, while the post-treatment using Ar plasma hardly affected the bandgap energy. The role of hydrogen in ZnO was discussed by considering the creation and annihilation of oxygen vacancies as well as the formation of shallow donors by hydrogen.