한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제29권5호
  • /
  • Pages.294-297
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  • 2016
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  • 1226-7945(pISSN)
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  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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자기세정을 위한 스퍼터링 TiO2 박막의 산소 표면처리에 따른 특성

Effects of Oxygen Surface Treatment on the Properties of TiO2 Thin Film for Self-cleaning Application

  • Kim, Nam-Hoon (Department of Electrical Engineering, Chosun University) ;
  • Park, Yong Seob (Department of Electronics, Chosun College of Science and Technology)
  • 투고 : 2016.04.19
  • 심사 : 2016.04.24
  • 발행 : 2016.05.01
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초록

Titanium oxide ($TiO_2$) thin films were fabricated by unbalanced magnetron (UBM) sputtering. The fabricated $TiO_2$ films were treated by oxygen plasma under various RF powers. We investigated the characteristics of oxygen plasma treatment on the surface, structural, and physical properties of $TiO_2$ films prepared at various plasma treatment RF powers. UBM sputtered $TiO_2$ films exhibited higher contact angle value, smooth surface, and amorphous structure. However, the rms surface roughness $TiO_2$ films were rough, and the contact angle value was decreased with the increase of the plasma treatment RF power Also, the hardness value of $TiO_2$ film as physical properties was slightly increased with the increase of the plasma treatment RF power. In the results, the performance of $TiO_2$ films for self cleaning critically depended on the with the plasma treatment RF power.

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참고문헌

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