• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.05a
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• pp.248-254
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• 2002

The most controversial topics in plasma sprayed ceramic coating system are recently mechanical properties such as bond strength, cohesive strength, toughness and so on. Determination of bond strength of coatings is one of the most important problems. In the industry, the bond strength of coating system has been estimated by Pull-off test(ASTM standard C633-79). But, without a fixed jig and specimen, it is impossible to obtain the bond strength. Therefore, it is necessary to study the critical fracture load on interface of the coating by indentation test. Because the critical fracture load plays an important role in evaluating the bond strength for plasma sprayed ceramic coating system. So, we have estimated critical fracture load in plasma sprayed ceramic coating system, and it was shown that inverse relationship between the cross-section hardness of coating and the critical fracture load(Pc). In case of the high load(1kgf, 2kgf) in $Al_{2}O_{3}+13%TiO_{2}$, it was found that the critical point(Pco), which the coating was broken on.

• Applied Science and Convergence Technology
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• v.25 no.4
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• pp.73-76
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• 2016

Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

• Journal of Power System Engineering
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• v.21 no.4
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• pp.94-99
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• 2017

Single walled carbon nanotubes were mixed with various metal powders by mechanical ball milling and sintered by spark plasma sintering processes. Two compositional (0.1 and 1 vol%) of the single walled carbon nanotubes were dispersed onto the pure aluminum, 5052 aluminum alloy, pure titanium, Ti6Al4Vanadium alloy, pure copper, and stainless steel 316L. Each composite powders were spark plasma sintered at $600^{\circ}C$ and well synthesized regardless of the matrices. Vickers hardness of the composite materials was measured and they exhibited higher values regardless of the carbon nanotubes composition than those of the pure materials. Moreover, single walled carbon nanotubes reinforced copper matrix composites showed highest enhancement between the other metal matrices system. We believe that low energy mechanical ball milling and spark plasma sintering processes are useful tool for fabricating of the carbon nanotubes-reinforced various metal matrices composite materials. The single walled carbon nanotubes-reinforced various metal matrices composite materials could be used as an engineering parts in many kind of industrial fields such as aviation, transportation and electro technologies etc. However, detail strengthening mechanism should be carefully investigated.

• The Transactions of the Korean Institute of Power Electronics
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• v.24 no.3
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• pp.153-160
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• 2019

This study proposes a current source-type pulse generator to improve output voltage and current waveforms under a capacitively coupled plasma (CCP) system. The proposed circuit comprises two parallel-connected current source-type converters. These converters can satisfy the required output waveforms of plasma processing. The parallel-connected converters operate without reverse current fault by applying a time-delay control technique. Conventional voltage source converters based on pulse power supply exhibit drawbacks in short-circuit current, and problems occur when they are applied to a CCP system. The proposed pulse power supply based on a current source converter fundamentally solves the short-circuit current problem. Therefore, this topology can improve the voltage and current accuracy of a CCP system.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.155.1-155.1
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• 2013

The goals of this study are to elucidate the plasma effects on DNA molecules to apply some plasma based applications and also to find out the mechanisms of plasma-induced DNA damage in biomolecule. Nonthermal atmospheric pressure plasma has much potential for medical, agricultural and food applications for the future. The atmospheric pressure plasma jet (APPJ) contains radicals, charged particles, low energy electrons, excited molecules and UV light. It has been started doing experiments using APPJ at the early 21th. And some recent results showed that APPJ has a possibility to apply to new fields like mentioned above. But it is kind of at the very early stages of plasma based application. It is definitely necessary much of theoretical and experimental studies to further understanding to use nonthermal atmospheric pressure plasma in biomedical, agriculture and food parts. Here we introduce a new experimental system to study plasma effects on biomolecules. And we will show some recent results of LEE-induced DNA damage using electron irradiation apparatus under ultra-high vacuum.

• Particle and aerosol research
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• v.16 no.1
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• pp.1-8
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• 2020

Nano-pulse plasma technology has great potential as the process simplicity, high efficiency and low energy consumption for SO₂ removal. The research on the gas-to-particle conversion is required to achieve higher efficiency of SO₂ gas removal. Thus, we studied the effect of the relative humidity, NH₃ concentration and applied voltage of the nano-pulse plasma system in the gas to particle conversion of SO₂. The particles from the conversions were increased from 10 to 100 nm in diameter as relative humidity, NH₃ concentration, applied voltage increases. With these results, nano-pulse plasma system can be used to more efficient removal of SO₂ gas by controlling above parameters.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.1-6
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• 2002

Plasma processing of semiconductor materials plays a dominant role in microelectronic technology. During last century, plasma have gone a way from laboratory phenomena to industrial applications due to intensive progress in both scientific and industrial trends. Improvement and development of new experience together with development of plasma theory and plasma diagnostics methods. A most parameters (pressure, flow rate, power density) and various levels of plasma system (energy distribution, volume gas chemistry, transport, heterogeneous effects) to understand the whole process mechanism. It will allow us to choose a correct ways for processes optimization.

• Nuclear Engineering and Technology
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• v.44 no.1
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• pp.9-20
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• 2012

A brief review on the thermal plasma synthesis of nano-sized powders is presented according to the application materials, such as, metals, ceramics, glasses, carbonaceous materials and other functional composites, such as, supported metal catalyst and core-shell structured nano materials. As widely adopted plasma sources available for thermal plasma synthesis of nanosized powders, three kinds of plasma torches, such as transferred and non-transferred DC and RF plasma torches, are introduced with the main features of each torch system. In the basis of the described torch features and the properties of suggested materials, application results including synthesis mechanism are reviewed in this paper.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.7
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• pp.611-614
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• 2007

The changes in the work $function({\Phi}_w)$ in the MgO protective layers after $plasma(Ar,\;H_2)$ treatment have been studied using ${\Upsilon}-focused$ ion beam $({\Upsilon}-FIB)$ system. The ${\Phi}_w$ was determined as follows: Ar-plasma $treatment({\Phi}_w=4.52eV)$, $H_2-plasma$ $treatment({\Phi}_w=5.65eV)$, and non-plasma $treatment({\Phi}_w=4.64eV)$. The results indicated that the H-plasma could not make any effective physical etching due to the small masses of hydrogen atoms and molecules while the hydration of H-plasma could grow some contaminating materials on the surface of MgO.

• Journal of the Semiconductor & Display Technology
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• v.16 no.2
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• pp.75-78
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• 2017

We reports improved monitoring performance of Self plasma-optical emission spectroscopy (SP-OES) by augmenting a by-pass tube to a conventional straight (or single) tube type self plasma reactor. SP-OES has been used as a tool for the monitoring of plasma chemistry indirectly in plasma process system. The benefits of SP-OES are low cost and easy installation, but some semiconductor industries who adopted commercialized SP-OES product experiencing less sensitivity and slow sensor response. OH out-gas chemistry monitoring was performed to have a direct comparison of a conventional single type tube and a by-pass type tube, and fluid dynamic simulation on the improved hardware design was also followed. It is observed faster pumping out of OH from the chamber in the by-pass type SP-OES.