• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 디스플레이 광소자 분야
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• pp.69-72
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• 2002

We establish a visible light emission from porous polycrystalline silicon nano structure(PPNS). The PPNS layer are formed on heavily doped n-type Si substrate. 2um thickness of undoped polycrystalline silicon deposited using LPCVD (Low Pressure Chemical Vapor Deposition) anodized in a HF: ethanol(=1:1) as functions of anodizing conditions. And then a PPNS layer thermally oxidized for 1 hr at $900^{\circ}C$. Subsequently, thin metal Au as a top electrode deposited onto the PPNS surface by E-beam evaporator and, in order to establish ohmic contact, an thermally evaporated Al was deposited on the back side of a Si-substrate. When the top electrode biased at +6V, the electron emission observed in a PPNS which caused by field-induces electron emission through the top metal. Among the PPNSs as functions of anodization conditions, the PPNS anodized at a current density of $10mA/cm^{2}$ for 20 sec has a lower turn-on voltage and a higher emission current. Furthermore, the behavior of electron emission is uniformly maintained.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 추계학술대회 논문집
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• pp.106-108
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• 1994

Electromigration(EM) tests were carried out on Al and Cu films in HV systems to study surface migration. The Al films were made on oxidized silicon wafers by thermal evaporation, in-situ annealed at 300$^{\circ}C$, patterned, and EM tested at 260$^{\circ}C$ and 4.5MA/$\textrm{cm}^2$. SEM observation with back scattered electron mode on the EM tested Al films disclosed that thinning took place under the native Al oxide. In the case of Cu films, tested using in-situ TEM, thinning was also observed at the early stage of void formation even though the thinned areas were much less than those of the Al films.

• Bulletin of the Korean Chemical Society
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• 제28권11호
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• pp.2079-2082
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• 2007

Photonic crystals containing rugate structure result in a mirror with high reflectivity in a specific narrow spectral region and are prepared by applying a computer-generated pseudo-sinusoidal current waveform. Well defined 1-dimentional photonic polymer replicas showing a reflectivity at 534 nm have been successfully obtained by the removal of rugate porous silicon (PSi) template from the polystyrene composite film. XRD measurement indicates that the oxidized rugate PSi has been completely removed from the composite films. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replicas indicate that the surface of polymer film has a negative structure of rugate PSi. These replicas are stable in aqueous solutions for several days without any degradation. The methods have been provided for the construction of photonic structures with polymers.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.80-80
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• 2017

Titanium and its alloys that have a good biocompatibility, corrosion resistance, and mechanical properties such as hardness and wear resistance are widely used in dental and orthopedic implant applications. However, they do not form a chemical bond with bone tissue. Plasma electrolytic oxidation (PEO) that combines the high voltage spark and electro-chemical oxidation is a novel method to form ceramic coatings on light metals such as tita-nium and its alloys. This is an excellent re-producibility and economical, because the size and shape control of the nano-structure is relatively easy. Silicon (Si), manganese (Mn), and magne-sium (Mg) have a useful to bone. Particularly, Si has been found to be essential for normal bone, cartilage growth, and development. Mn influences regulation of bone remodeling be-cause its low content in body is connected with the rise of the concentration of calcium, phosphates and phosphatase out of cells. Pre-studies have shown that Mg plays very im-portant roles in essential for normal growth and metabolism of skeletal tissue in verte-brates and can be detected as minor constitu-ents in teeth and bone. In this study, Electrochemical behavior of plasma electrolytic oxidized films formed in solution containing Mn, Mg and Si ions were researched using various experimental in-struments. A series of Si-Mn-Mg coatings are produced on Ti dental implant using PEO, with the substitution degree, respectively, at 5 and 10%. The potentiodynamic polarization and AC impedance tests for corrosion behav-iors were carried out in 0.9% NaCl solution at similar body temperature using a potentiostat with a scan rate of 1.67mV/s and potential range from -1500mV to + 2000mV. Also, AC impedance was performed at frequencies anging from 10MHz to 100kHz for corrosion resistance.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2008년도 하계종합학술대회
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• pp.489-490
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• 2008

As anodizing method using poly-Si (polycrystalline silicon) grown by LPCVD (Low Pressure Chemical Vapor Deposition), a ballistic electron emitter was made. An OPPS (Oxidized Porous Poly-Si) structure can generate ballistic electron which can pass through without scattering owing to electric field of oxide layer wrapped around nanocrystal due to applied voltage of between surface and bottom electrode. As electrode, (Al, Au and Pt/ti) were used. In this case, there were the better characteristics in Al and Pt/ti than in Al and Au.

• Journal of Magnetics
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• 제6권1호
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• pp.1-4
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• 2001

We have used acetic acids ethanol and distilled water as a solvent to synthesize $La_{2/3}Sr_{1/3}Mn_{0.99}{^{57}}Fe_{0.01}O_3$(LSMFO) precursor. Crack-free LSMFO granular polycrystalline thin films have been deposited on thermally oxidized silicon substrates by spin coaling. The dependence of crystallization, surface morphology, magnetic and transport properties on annealing temperature was investigated. With increasing annealing temperature, the metal-semiconductor (insulator) transition temperature and the magnetic moment decrease while the resistivity increases. The lattice constants remain almost unchanged. For LSMFO thin films, spin-dependent interfacial tunneling and/or scattering magnetoresistance were observed. Our results indicate that the annealing temperature is very important in determining the intrinsic and extrinsic magnetotransport properties.

• 한국진공학회지
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• 제16권2호
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• pp.99-104
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• 2007

[ $Febry-P{\acute{e}}rot$ ] 프린지 패턴 (fringe pattern)과 광발광성 (photoluminescence, PL)의 광학적 성질을 동시에 가지고 있는 다공성 실리콘을 이용하여 가스센서를 개발하였다. 다공성 실리콘 샘플은 p-type 실리콘 웨이퍼 (boron-doped, <100> orientation, resistivity $1{\sim}10{\Omega}$)를 이용하여 전기화학적 식각을 통하여 만들어 졌다. 다공성 실리콘 샘플들은 열적 산화 방법과 hydrosilylation 방법을 통하여 그 표면이 수소로 종결된 다공성 실리콘 (Si-H)과 산화된 다공성 실리콘(Si-OH), 두 가지 각각 다른 표면 성질을 갖는 다공성 실리콘을 제작 하였다. 준비된 두 가지 다른 다공성 실리콘 칩들은 메탄올, 아세톤, 헥산, 그리고 톨루엔의 증기에 노출 시켰을 때 Febry-P rot 프린지 패턴의 변화나 PL의 변화를 관측하여 다공성 실리콘을 이용한 VOCs (volatile organic compounds) 센서로서의 응용에 대하여 연구하였다. $Febry-P{\acute{e}}rot$ 프린지 패턴은 유기 물질의 증기압이 클수록 단파장으로 이동하는 폭이 컸고, 광 발광성은 극성도가 큰 물질일수록 소강현상이 크게 일어나는 것을 알 수 있었다.

• 한국표면공학회지
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• 제35권6호
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• pp.415-421
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• 2002

Ti-Si-N coating layers were codeposited on silicon wafer substrates by a DC reactive magnetron sputtering technique using separate titanium and silicon targets in $N_2$/Ar gas mixtures. The oxidation behavior of Ti-Si-N coating layers containing 4.0 at.%, 10.0 at.%, and 27.3 at.% Si was investigated at temperatures ranging from 600 to $960^{\circ}C$. The coating layers containing 4.0 at.% Si became fast oxidized from $600^{\circ}C$ while the coating layers containing 10.0 at.% Si had oxidation resistance up to $800^{\circ}C$. It was concluded that an increase in Si content to a level of 10.0 at.% led to the formation of finer TiN grains and a uniformly distributed amorphous Si3N4 phase along grain boundaries, which acted as efficient diffusion barriers against oxidation. However, the coating layers containing 27.3 at.% Si showed relatively low oxidation resistance compared with those containing 10.0 at.% Si. This phenomenon would be explained by the existence of free Si which was not nitrified in the coating layers containing 27.3 at.% Si.

• 한국추진공학회지
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• 제26권6호
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• pp.21-27
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• 2022

C_f/SiC 복합재는 저밀도, 높은 기계적 강도, 우수한 열 안정성을 가지고 있어 로켓 추진기관, 항공 및 군사 분야 등의 고온 응용 산업에 유망한 재료이다. 그러나 용융 실리콘 함침(Liquid Silicon Infiltration, LSI) 공정을 통해 제작된 복합재는 잔존하는 Si에 의하여 물리적, 열적 특성이 저하된다. 본 논문에서는 LSI 공정을 통해 제작된 C_f/SiC 복합재의 내부 Si을 제거하기 위한 방안으로 탈규소화(de-siliconization) 공정을 도입하였다. 최대 5분 동안 옥시아세틸렌 토치 테스트를 진행하고 시편의 산화된 표면과 단면은 3D scanning, X-ray diffraction(XRD), 광학현미경(OM), 전자주사현미경(SEM)으로 분석하였다.

• 한국세라믹학회지
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• 제31권7호
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• pp.753-758
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• 1994

(100) Si and 4$^{\circ}$off (100) Si were oxidized in dry oxygen, and the differences in thermal oxidation behavior and electrical characteristics between two specimens were investigated. Ellipsometer measurements of the oxide thickness produced by oxidation in dry oxygen from 1000 to 120$0^{\circ}C$ showed that the oxidation rates of the 5$^{\circ}$ off (100) Si were more rapid than those of the (100) Si and the differences between them decreased as the oxidation temperature increased. The activation energies based on the parabolic rate constant, B for (100) and 4$^{\circ}$off (100) Si were 25.8, 28.6 kcal/mol and those on the linear rate constant, B/A were 56.8, 54.9 kcal/mol, respectively. Variation of C-V characteristics with the oxidation temperature showed that the flat band voltages were shifted positively and surface state charge densities decreased as the oxidation temperature increased, and the surface state charge density of the 4$^{\circ}$off (100) Si was lower than that of the (100) Si. Also considerable decrease in the density of oxidation induced stacking faults (OSF) for the 4$^{\circ}$off (100) Si was observed through optical microscopy after preferentially etching off the oxide layer.