• 제목/요약/키워드: Optimization of Deposition Rate

검색결과 50건 처리시간 0.024초

신경망과 유전 알고리즘을 이용한 광소자용 ZnO 박막 특성 공정 모델링 및 최적화 (Process Modeling and Optimization for Characteristics of ZnO Thin Films using Neural Networks and Genetic Algorithms)

  • 고영돈;강홍성;정민창;이상렬;명재민;윤일구
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
    • /
    • pp.33-36
    • /
    • 2004
  • The process modeling for the growth rate in pulsed laser deposition(PLD)-grown ZnO thin films is investigated using neural networks(NNets) and the process recipes is optimized via genetic algorithms(GAs). D-optimal design is carried out and the growth rate is characterized by NNets based on the back-propagation(BP) algorithm. GAs is then used to search the desired recipes for the desired growth rate. The statistical analysis is used to verify the fitness of the nonlinear process model. This process modeling and optimization algorithms can explain the characteristics of the desired responses varying with process conditions.

  • PDF

HDP-CVD로 증착된 실리콘 산화막 공정조건 최적화를 위한 신경망 모델링 (Neural Network Modeling for HDP-CVD Process Optimization of $SiO_2$ Thin Film Deposition)

  • 박인혜;유경한;서동선;홍상진
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2006년도 추계학술발표회 초록집
    • /
    • pp.2-3
    • /
    • 2006
  • 본 논문에서는 신경망 모델링을 통하여 HDP-CVD를 이용한 실리콘 산화막 형성에 영향을 주는 다섯 가지 공정 장비 변수와 그에 따른 두 가지 출력 파라미터 Deposition rate과 Uniformity와의 관계를 동시에 고려한 특성결과를 분석하고, 최적의 recipe를 Genetic Algorithm을 통해 제시하였다. 실험계획법을 사용하여, 필요한 실험의 횟수를 최소화 하였으며 그 실험결과를 신경망 모델링을 통하여 입력변수와 출력파라미터의 관계를 3차원의 반응표면 곡선으로 분석하였다. 이 과정을 통해 Deposition rate과 Uniformity을 동시에 고려한 두 출력파라미터를 만족하는 최적의 입력변수 값들을 제시하였다.

  • PDF

실험 계획법을 이용한 점착방지막용 플라즈마 증착 공정변수의 최적화 연구 (Optimizing the Plasma Deposition Process Parameters of Antistiction Layers Using a DOE (Design of Experiment))

  • 차남구;박창화;조민수;박진구;정준호;이응숙
    • 한국재료학회지
    • /
    • 제15권11호
    • /
    • pp.705-710
    • /
    • 2005
  • NIL (nanoimprint lithography) technique has demonstrated a high potential for wafer size definition of nanometer as well as micrometer size patterns. During the replication process by NIL, the stiction between the stamp and the polymer is one of major problems. This stiction problem is moi·e important in small sized patterns. An antistiction layer prevents this stiction ana insures a clean demolding process. In this paper, we were using a TCP (transfer coupled plasma) equipment and $C_4F_8$ as a precursor to make a Teflon-like antistiction layer. This antistiction layer was deposited on a 6 inch silicon wafer to have nanometer scale thicknesses. The thickness of deposited antistiction layer was measured by ellipsometry. To optimize the process factor such as table height (TH), substrate temperature (ST), working pressure (WP) and plasma power (PP), we were using a design of experimental (DOE) method. The table of full factorial arrays was set by the 4 factors and 2 levels. Using this table, experiments were organized to achieve 2 responses such as deposition rate and non-uniformity. It was investigated that the main effects and interaction effects between parameters. Deposition rate was in proportion to table height, working pressure and plasma power. Non-uniformity was in proportion to substrate temperature and working pressure. Using a response optimization, we were able to get the optimized deposition condition at desired deposition rate and an experimental deposition rate showed similar results.

RF/DC Magnetron Sputtering을 이용한 Acoustic Bragg Reflector 최적 증착조건에 관한 연구 (A Study on the Deposition Condition of Acoustic Bragg Reflector Using RF/DC Magnetron Sputtering)

  • 임문혁;;채동규;윤기완
    • 한국정보통신학회:학술대회논문집
    • /
    • 한국해양정보통신학회 2002년도 추계종합학술대회
    • /
    • pp.143-147
    • /
    • 2002
  • 본 논문에서는 FBAR소자에서 중요한 역할을 하는 Reflector의 최적 증착조건을 RF/DC마그네트론 스퍼터링을 이용하여 조사하였다. Reflector를 구성하는 SiO$_2$와 W박막의 증착속도, 결정성, 표면거칠기 둥을 다양한 증착조건에서 관찰한 결과 빠른 증착속도를 보이면서 치밀하고 결정성이 좋은 박막을 얻을 수 있는 조건을 찾을 수 있었고, 이 조건으로 5층의 Acoustic Bragg Reflector 구조를 제작하였다.

  • PDF

원통형 화학증착로에서 균일한 박막형성을 위한 입구 농도분포의 최적화 (Optimization of inlet concentration condition for uniform film growth in a cylindrical CVD chamber)

  • 조원국;최도형;김문언
    • 대한기계학회논문집B
    • /
    • 제22권2호
    • /
    • pp.173-183
    • /
    • 1998
  • An optimization procedure to find the inlet concentration profile that yields the most uniform deposition rate in a cylindrical CVD chamber has been developed. Assuming that the chemical reaction time is negligibly small, a SIMPLE based finite-volume method is adopted to solve the fully elliptic equations for momentum, temperature, and concentration. The inlet concentration profile is expressed by a linear combination of Chebyshev polynomials and the coefficients of which are determined by the local random search technique. It is shown that the present method is very effective in improving the uniformity of the deposition rate, especially when Re is high and/or the wafer is placed close to the inlet. The optimal profiles have been obtained for various Re, Gr, and geometry combinations.

다층박막 $Fe(50{\AA}/[Co(17{\AA})/Cu(24{\AA})]_20$의 증착률 및 열처리가 자기저항에 미치는 효과 (Effect of Deposition Rate and Annealing Temperature on Magnetoresistance in Fe$Fe(50{\AA}/[Co(17{\AA})/Cu(24{\AA})]_20$Multilayers)

  • 김미양;최수정;최규리;송은영;오미영;이장로;이상석;황도근;박창만
    • 한국자기학회지
    • /
    • 제8권5호
    • /
    • pp.282-287
    • /
    • 1998
  • 유리 기판위에 dc magnetron sputtering 방법으로 제작한Fe(50 $\AA$)/[Co(17 $\AA$)/Cu(24 $\AA$)]20 다층박막에 관하여 자기저항비의 기저층, 자성층, 비자성층의 증착률 및 열처리 의존성을 살펴보았다. 낮은 base 압력 중에서의 막의 증착은 Co/Cu 계면의 산화를 억제하여 자기저항비를 장가시켰다. 극대 자기저항비를 얻기위해 요구되는 증착률은 Fe는 1$\AA$)/s 이상, Cu는 2.8 $\AA$)/s 이었으며 Co는 증착률이 2 $\AA$/s 보다 높은 경우에 평탄한 자구형성을 이루어 자기적 향비가 높아지는 경향을 보였다. 40$0^{\circ}C$까지의 시료에 대한 역처리는 다층박막의 주기성을 유지한채 더 큰 결정립을 형성시켜 반강자성적으로 결합한 막의 부분이 증가함으로써 자기저항비를 증가시켰다.

  • PDF

CVD 장비 Up Time 향상을 위한 기판 지지대의 재질 및 구조 최적화 (Material and Structure Optimization of Substrate Support for Improving CVD Equipment Up Time)

  • 우람;김원경
    • 한국재료학회지
    • /
    • 제29권11호
    • /
    • pp.670-676
    • /
    • 2019
  • We study substrate support structures and materials to improve uptime and shorten preventive maintenance cycles for chemical vapor deposition equipment. In order to improve the rolling of the substrate support, the bushing device adopts a ball transfer method in which a large ball and a small ball are mixed. When the main transfer ball of the bushing part of the substrate support contacts the substrate support, the small ball also rotates simultaneously with the rotation of the main ball, minimizing the resistance that can be generated during the vertical movement of the substrate support. As a result of the improvement, the glass substrate breakage rate is reduced by more than 90 ~ 95 %, and the equipment preventive maintenance and board support replacement cycles are extended four times or more, from once a month to more than four months, and the equipment uptime is at least 15 % improved. This study proposes an optimization method for substrate support structure and material improvement of chemical vapor deposition equipment.

HFCVD에 의한 증착압력 변화에 따른 Single Crystal Diamond 합성 (Synthesis of Single Crystal Diamond by Variation of Deposition Pressure by HFCVD)

  • 김민수;배문기;김성우;김태규
    • 열처리공학회지
    • /
    • 제33권1호
    • /
    • pp.20-24
    • /
    • 2020
  • Single crystal diamonds are in great demand in such fields as mechanical, electronic applications and optoelectronics. Large area single crystal diamonds are attracting attention in future industries for mass production and low cost. In this study, hot filament CVD (HFCVD) is used to grow large area single crystal diamond. However, the growth rate of large area single crystal diamond using HFCVD is known to be very low. The goal of this study is to use single crystal diamond substrates in HFCVD with methane-hydrogen gas mixtures to increase the growth rate of single crystal diamond and to optimize the conditions by analysing the effects of deposition conditions for high quality crystallinity. The deposition pressure, the ratio of CH4/H2 gas, the substrate temperature and the distance between the filament and the substrate were optimized. The sample used a 4×4 (mm2) size single crystal diamond substrate (100), the CH4/H2 gas ratio was fixed at 5%, the substrate temperature was synthesized to about 1000℃. At this time, the deposition pressure was changed to three types of 50, 75, 85 Torr and deposited. Finally, optimization was investigated under pressure conditions to analyse the growth rate and quality of single crystal diamond.

Improvement and validation of aerosol models for natural deposition mechanism in reactor containment

  • Jishen Li ;Bin Zhang ;Pengcheng Gao ;Fan Miao ;Jianqiang Shan
    • Nuclear Engineering and Technology
    • /
    • 제55권7호
    • /
    • pp.2628-2641
    • /
    • 2023
  • Nuclear safety is the lifeline for the development and application of nuclear energy. In severe accidents of pressurized water reactor (PWR), aerosols, as the main carrier of fission products, are suspended in the containment vessel, posing a potential threat of radioactive contamination caused by leakage into the environment. The gas-phase aerosols suspended in the containment will settle onto the wall or sump water through the natural deposition mechanism, thereby reducing atmospheric radioactivity. Aiming at the low accuracy of the aerosol model in the ISAA code, this paper improves the natural deposition model of aerosol in the containment. The aerosol dynamic shape factor was introduced to correct the natural deposition rate of non-spherical aerosols. Moreover, the gravity, Brownian diffusion, thermophoresis and diffusiophoresis deposition models were improved. In addition, ABCOVE, AHMED and LACE experiments were selected to validate and evaluate the improved ISAA code. According to the calculation results, the improved model can more accurately simulate the peak aerosol mass and respond to the influence of the containment pressure and temperature on the natural deposition rate of aerosols. At the same time, it can significantly improve the calculation accuracy of the residual mass of aerosols in the containment. The performance of improved ISAA can meet the requirements for analyzing the natural deposition behavior of aerosol in containment of advanced PWRs in severe accident. In the future, further optimization will be made to address the problems found in the current aerosol model.

에너지 밀도 및 분말 증착 밀도를 고려한 직접 에너지 증착법 기반 Ti-6Al-4V 합금의 적층공정 최적화 (Additive Manufacturing Optimization of Directed Energy Deposition-Processed Ti-6Al-4V Alloy using Energy Density and Powder Deposition Density)

  • 이유경;김은성;천세호;설재복;성효경;오정석;김형섭;이태경;남태현;김정기
    • 한국분말재료학회지
    • /
    • 제28권6호
    • /
    • pp.491-496
    • /
    • 2021
  • The process optimization of directed energy deposition (DED) has become imperative in the manufacture of reliable products. However, an energy-density-based approach without a sufficient powder feed rate hinders the attainment of an appropriate processing window for DED-processed materials. Optimizing the processing of DED-processed Ti-6Al- 4V alloys using energy per unit area (Eeff) and powder deposition density (PDDeff) as parameters helps overcome this problem in the present work. The experimental results show a lack of fusion, complete melting, and overmelting regions, which can be differentiated using energy per unit mass as a measure. Moreover, the optimized processing window (Eeff = 44~47 J/mm2 and PDDeff = 0.002~0.0025 g/mm2) is located within the complete melting region. This result shows that the Eeff and PDDeff-based processing optimization methodology is effective for estimating the properties of DED-processed materials.