Optimizing the Plasma Deposition Process Parameters of Antistiction Layers Using a DOE (Design of Experiment) |
Cha Nam-Goo
(Division of Materials and Chemical Engineering, Micro Biochip Center, Hanyang University)
Park Chang-Hwa (Division of Materials and Chemical Engineering, Micro Biochip Center, Hanyang University) Cho Min-Soo (Division of Materials and Chemical Engineering, Micro Biochip Center, Hanyang University) Park Jin-Goo (Division of Materials and Chemical Engineering, Micro Biochip Center, Hanyang University) Jeong Jun-Ho (Precision Machining Group, Korea Institute of Machinery & Materials) Lee Eung-Sug (Precision Machining Group, Korea Institute of Machinery & Materials) |
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