대한기계학회논문집B (Transactions of the Korean Society of Mechanical Engineers B)

  • 제22권2호
  • /
  • Pages.173-183
  • /
  • 1998
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  • 1226-4881(pISSN)
  • /
  • 2288-5324(eISSN)
대한기계학회 (The Korean Society of Mechanical Engineers)
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원통형 화학증착로에서 균일한 박막형성을 위한 입구 농도분포의 최적화

Optimization of inlet concentration condition for uniform film growth in a cylindrical CVD chamber

  • 조원국 (한국과학기술원 기계공학과) ;
  • 최도형 (한국과학기술원 기계공학과) ;
  • 김문언 (한국과학기술원 기계공학과)
  • Jo, Won-Guk (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology) ;
  • Choe, Do-Hyeong (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology) ;
  • Kim, Mun-Eon (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology)
  • 발행 : 1998.02.01
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초록

An optimization procedure to find the inlet concentration profile that yields the most uniform deposition rate in a cylindrical CVD chamber has been developed. Assuming that the chemical reaction time is negligibly small, a SIMPLE based finite-volume method is adopted to solve the fully elliptic equations for momentum, temperature, and concentration. The inlet concentration profile is expressed by a linear combination of Chebyshev polynomials and the coefficients of which are determined by the local random search technique. It is shown that the present method is very effective in improving the uniformity of the deposition rate, especially when Re is high and/or the wafer is placed close to the inlet. The optimal profiles have been obtained for various Re, Gr, and geometry combinations.

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