• 제목/요약/키워드: Nanocrystal

검색결과 185건 처리시간 0.026초

Annealing temperature dependence on the positive bias stability of IGZO thin-film transistors

  • Shin, Hyun-Soo;Ahn, Byung-Du;Rim, You-Seung;Kim, Hyun-Jae
    • Journal of Information Display
    • /
    • 제12권4호
    • /
    • pp.209-212
    • /
    • 2011
  • The threshold voltage shift (${\Delta}V_{th}$) under positive-voltage bias stress (PBS) of InGaZnO (IGZO) thin-film transistors (TFTs) annealed at different temperatures in air was investigated. The dramatic degradation of the electrical performance was observed at the sample that was annealed at $700^{\circ}C$. The degradation of the saturation mobility (${\mu}_{sat}$) resulted from the diffusion of indium atoms into the interface of the IGZO/gate insulator after crystallization, and the degradation of the subthreshold slope (S-factor) was due to the increase in the interfacial and bulk trap density. In spite of the degradation of the electrical performance of the sample that was annealed at $700^{\circ}C$, it showed a smaller ${\Delta}V_{th}$ under PBS conditions for $10^4$ s than the samples that were annealed at $500^{\circ}C$, which is attributed to the nanocrystal-embedded structure. The sample that was annealed at $600^{\circ}C$ showed the best performance and the smallest ${\Delta}V_{th}$ among the fabricated samples with a ${\mu}_{sat}$ of $9.38cm^2/V$ s, an S-factor of 0.46V/decade, and a ${\Delta}V_{th}$ of 0.009V, which is due to the passivation of the defects by high thermal annealing without structural change.

Scanning Probe Microscopy를 이용한 국소영역에서의 실리콘 나노크리스탈의 전기적 특성 분석 (Characterization of Electrical Properties of Si Nanocrystals Embedded in a SiO$_{2}$ Layer by Scanning Probe Microscopy)

  • 김정민;허현정;강치중;김용상
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제54권10호
    • /
    • pp.438-442
    • /
    • 2005
  • Si nanocrystal (Si NC) memory device has several advantages such as better retention, lower operating voltage, reduced punch-through and consequently a smaller cell area, suppressed leakage current. However, the physical and electrical reasons for this behavior are not completely understood but could be related to interface states of Si NCs. In order to find out this effect, we characterized electrical properties of Si NCs embedded in a SiO$_{2}$ layer by scanning probe microscopy (SPM). The Si NCs were generated by the laser ablation method with compressed Si powder and followed by a sharpening oxidation. In this step Si NCs are capped with a thin oxide layer with the thickness of 1$\~$2 nm for isolation and the size control. The size of 51 NCs is in the range of 10$\~$50 m and the density around 10$^{11}$/cm$^{2}$ It also affects the interface states of Si NCs, resulting in the change of electrical properties. Using a conducting tip, the charge was injected directly into each Si NC, and the image contrast change and dC/dV curve shift due to the trapped charges were monitored. The results were compared with C-V characteristics of the conventional MOS capacitor structure.

Solution-Processed Inorganic Thin Film Transistors Fabricated from Butylamine-Capped Indium-Doped Zinc Oxide Nanocrystals

  • Pham, Hien Thu;Jeong, Hyun-Dam
    • Bulletin of the Korean Chemical Society
    • /
    • 제35권2호
    • /
    • pp.494-500
    • /
    • 2014
  • Indium-doped zinc oxide nanocrystals (IZO NCs), capped with stearic acid (SA) of different sizes, were synthesized using a hot injection method in a noncoordinating solvent 1-octadecene (ODE). The ligand exchange process was employed to modify the surface of IZO NCs by replacing the longer-chain ligand of stearic acid with the shorter-chain ligand of butylamine (BA). It should be noted that the ligand-exchange percentage was observed to be 75%. The change of particle size, morphology, and crystal structures were obtained using a field emission scanning electron microscope (FE-SEM) and X-ray diffraction pattern results. In our study, the 5 nm and 10 nm IZO NCs capped with stearic acid (SA-IZO) were ligand-exchanged with butylamine (BA), and were then spin-coated on a thermal oxide ($SiO_2$) gate insulator to fabricate a thin film transistor (TFT) device. The films were then annealed at various temperatures: $350^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$, and $600^{\circ}C$. All samples showed semiconducting behavior and exhibited n-channel TFT. Curing temperature dependent on mobility was observed. Interestingly, mobility decreases with the increasing size of NCs from 5 to 10 nm. Miller-Abrahams hopping formalism was employed to explain the hopping mechanism insight our IZO NC films. By focusing on the effect of size, different curing temperatures, electron coupling, tunneling rate, and inter-NC separation, we found that the decrease in electron mobility for larger NCs was due to smaller electronic coupling.

육방정 질화붕소 나노입자 합성 및 열전도성 복합체 응용 (Synthesis of Hexagonal Boron Nitride Nanocrystals and Their Application to Thermally Conductive Composites)

  • 정재용;김양도;신평우;김영국
    • 한국분말재료학회지
    • /
    • 제23권6호
    • /
    • pp.414-419
    • /
    • 2016
  • Much attention has been paid to thermally conductive materials for efficient heat dissipation of electronic devices to maintain their functionality and to support lifetime span. Hexagonal boron nitride (h-BN), which has a high thermal conductivity, is one of the most suitable materials for thermally conductive composites. In this study, we synthesize h-BN nanocrystals by pyrolysis of cost-effective precursors, boric acid, and melamine. Through pyrolysis at $900^{\circ}C$ and subsequent annealing at $1500^{\circ}C$, h-BN nanoparticles with diameters of ~80 nm are synthesized. We demonstrate that the addition of small amounts of Eu-containing salts during the preparation of melamine borate precursors significantly enhanced the crystallinity of h-BN. In particular, addition of Eu assists the growth of h-BN nanoplatelets with diameters up to ~200 nm. Polymer composites containing both spherical $Al_2O_3$ (70 vol%) and Eu-doped h-BN nanoparticles (4 vol%) show an enhanced thermal conductivity (${\lambda}{\sim}1.72W/mK$), which is larger than the thermal conductivity of polymer composites containing spherical $Al_2O_3$ (70 vol%) as the sole fillers (${\lambda}{\sim}1.48W/mK$).

실리콘산화막의 광루미니센스 변화에 관한 연구 (Changes of photoluminescence in silicon-oxide films)

  • 이재희
    • 한국진공학회지
    • /
    • 제9권3호
    • /
    • pp.216-220
    • /
    • 2000
  • 실리콘이온 주입 후 $1100^{\circ}C$에서 열처리된 실리콘 산화막에서 Si+ dose 량의 변화에 대한 광루미니센스의 변화를 관찰하였다. 모든 시료에서 가시광과 적외선영역의 광루미니센스를 관찰할 수 있었다. 광루미니센스의 peak는 7000 $\AA$, 7400 $\AA$, 그리고 8400 $\AA$ 근처에 있었으며, $Si^+$ dose량이 변함에 따라 peak의 위치와 강도가 변하였다. 이온 주입되는 $Si^+$ dose량이 $1\times10^{17}\textrm{cm}^2$일 때 광루미니센스에서 특이하게 3개의 peak를 가지고 있었으며 다른 $Si^+$ dose량의 시료에 비하여 큰 강도를 보여준다. 주입된 $Si^+$ 이온들이 실리콘 산화막내에 서 결함을 생성하여서 광루미니센스에 기여를 한다. $Si^+$ dose량과 열처리 시간 등을 변화시키면 높은 에너지의 Si 위주 radiative defect, 낮은 에너지의 Si 위주 radiative defect, 그리고 nonradiative defect들이 관계하는 것으로 생각되어져 왔으나 적절한 $Si^+$ dose량으로 더 많은 radiative defect를 생성시킬 수 있음을 확인하였다. $Si^+$ dose량을 조절함으로서 광루미니센스의 peak의 위치와 강도를 제어할 수 있을 것이다.

  • PDF

Improved Uniformity in Resistive Switching Characteristics of GeSe Thin Film by Ag Nanocrystals

  • Park, Ye-Na;Shin, Tae-Jun;Lee, Hyun-Jin;Lee, Ji-Soo;Jeong, Yong-Ki;Ahn, So-Hyun;Lee, On-You;Kim, Jang-Han;Nam, Ki-Hyun;Chung, Hong-Bay
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
    • /
    • pp.237.2-237.2
    • /
    • 2013
  • ReRAM cell, also known as conductive bridging RAM (CBRAM), is a resistive switching memory based on non-volatile formation and dissolution of conductive filament in a solid electrolyte [1,2]. Especially, Chalcogenide-based ReRAM have become a promising candidate due to the simple structure, high density and low power operation than other types of ReRAM but the uniformity of switching parameter is undesirable. It is because diffusion of ions from anode to cathode in solid electrolyte layer is random [3]. That is to say, the formation of conductive filament is not go through the same paths in each switching cycle which is one of the major obstacles for performance improvement of ReRAM devices. Therefore, to control of nonuniform conductive filament formation is a key point to achieve a high performance ReRAM. In this paper, we demonstrated the enhanced repeatable bipolar resistive switching memory characteristics by spreading the Ag nanocrystals (Ag NCs) on amorphous GeSe layer compared to the conventional Ag/GeSe/Pt structure without Ag NCs. The Ag NCs and Ag top electrode act as a metal supply source of our devices. Excellent resistive switching memory characteristics were obtained and improvement of voltage distribution was achieved from the Al/Ag NCs/GeSe/Pt structure. At the same time, a stable DC endurance (>100 cycles) and an excellent data retention (>104 sec) properties was found from the Al/Ag NCs/GeSe/ Pt structured ReRAMs.

  • PDF

Tribological Performance of Ni-Cr Composite Coating Sprayed onto AISI 4340 (SNCM439) Steel by High Velocity Oxygen Fuel

  • Umarov, Rakhmatjon;Pyun, Young-Sik;Amanov, Auezhan
    • Tribology and Lubricants
    • /
    • 제34권6호
    • /
    • pp.217-225
    • /
    • 2018
  • In this study, we spray a Ni-Cr composite powder onto AISI 4340 steel using the high velocity oxygen fuel method. We subsequently subject the Ni-Cr coating (as-sprayed) to ultrasonic nanocrystal surface modification (UNSM) process to improve the tribological performance. This study aims at increasing the wear resistance and durability of the Ni-Cr coating by altering the surface integrity and microstructure via the UNSM process. The UNSM process reduces the surface roughness of the as-sprayed coating by about 64%, which is explained by observing the elimination of high peaks and valleys and filling up micro-pores. Furthermore, a change in the microstructure of the coating due to continuous high-frequency strikes to the surface by a tip can lead to an increase in hardness from about 48 to 60 HRC. Furthermore, we investigate the characterization of the friction and wear behavior of Ni-Cr coating by a ball-on-disc tribometer in the dry conditions. We determine that after the UNSM process, there is a significant reduction in the friction coefficient of the as-sprayed coating from approximately 1.1 to 0.75. This is owing to the increased hardness and smoothed surface roughness. In addition, we investigate the surface morphology and wear track of the coatings before and after the UNSM process using a scanning electron microscope, energy dispersive spectrometer, and three-dimensional laser scanning microscope. We observe that the wear track of the Ni-Cr coating after the UNSM process is lower than that of the as-sprayed one. Thus, we confirm that the UNSM process has a significant influence on the improvement of the tribological performance of the Ni-Cr composite coating.

SM45C재의 UNSM 처리에 의한 트라이볼러지 특성 변화 (Variations in Tribology Factors of SM45C by UNSM Modification)

  • 심현보;서창민;서민수;아마노브;편영식
    • 한국해양공학회지
    • /
    • 제32권6호
    • /
    • pp.492-501
    • /
    • 2018
  • The following results were obtained from a series of studies to accumulate data to reduce the coefficient of friction for press dies by performing tribological tests before and after the UNSM treatment of SM45C. The UNSM-treated material had a nano-size surface texture, high surface hardness, and large and deep compressive residual stress formation. Even when the load was doubled, the small amount of abrasion, small weight of the abrasion, and width and depth of the abrasion did not increase as much as those for untreated materials. When loads of 5 N, 7.5 N, and 10 N were applied to the untreated material of SM45C, the coefficient of friction was approximately 0.76-0.78. With the large specimen, a value of 0.72-0.78 was maintained at a load of 50 N despite the differences in the size of the wear specimen and working load. Tribological tests of large specimens of SM45C treated with UNSM under tribological conditions of 100 N and 50 N showed that the frictional coefficient and time constant stably converged between 0.7 and 0.8. The friction coefficients of the small specimens treated with UNSM showed values between 0.78 and 0.75 under 5 N, 7.5 N, and 10 N. The friction coefficients of the SM45C treated with UNSM were comparable to each other.

SM45C재의 PVD코팅과 필름에 의한 트라이볼러지 특성 (Variations in Tribological Characteristics of SM45C by PVD Coating and Thin Films)

  • 심현보;서창민;김종형;서민수
    • 한국해양공학회지
    • /
    • 제32권6호
    • /
    • pp.502-510
    • /
    • 2018
  • In order to accumulate data to lower the friction coefficient of a press mold, tribological tests were performed before and after coating SM45C with a PVC/PO film and plasma coating (CrN, concept). The ultrasonic nanocrystal surface modification (UNSM)-treated material had a nano-size surface texture, high surface hardness, and large and deep compressive residual stress formation. Even when the load was doubled, the small amount of abrasion, small weight of the abrasion, and width and depth of the abrasion did not increase as much as those of untreated materials. A comparison of the weight change before and after the tribological test with the CrN and the concept coating material and that of the untreated material showed that the wear loss of the concept coating material and P-UNSM treated material (that is, the UNSM treated material treated with the concept coating) showed a tendency to decrease by approximately 55-75%. Concept 100N had a lower friction coefficient of about 0.6, and P-UNSM-30-100N showed almost the same curve as concept 100N and had a low coefficient of friction of about 0.6. The concept multilayer coating had a thickness of $5.32{\mu}m$. In the beginning, the coefficient of friction decreased because of the plasma coating, but it started to increase from about 250-300 s. After about 350 s, the coefficient of friction tended to approach the friction coefficient of the SM45C base metal. The SGV-280F film-attached test specimen was slightly pushed back and forth, but the SM45C base material was not exposed due to abrasion. The friction coefficient was 0.22, which was the lowest, and the tribological property was the best in this study.

SLM 방식으로 출력된 STS 316L의 기계적 및 마찰·마모 특성에 미치는 UNSM처리 후 영향에 관한 연구 (A Study on the Effect of UNSM Treatment on the Mechanical and Tribological Properties of STS 316L Printed by Selective Laser Melting)

  • 노준석;산성충호;우마로프 라크마트전;편영식;아마노프 아웨즈한
    • Tribology and Lubricants
    • /
    • 제34권6호
    • /
    • pp.270-278
    • /
    • 2018
  • STS 316L prepared by additive manufacturing (AM) exhibits deterioration of mechanical properties and wear resistance due to the presence of defects such as black-of-fusion defects, internal porosity, residual stress, and anisotropy. In addition, high surface roughness (integrity) of AM products remains an issue. This study aimed to apply ultrasonic nanocrystal surface modification (UNSM) technology to STS 316L prepared by AM to increase the surface hardness, to reduce the surface roughness, and to improve the friction and wear behavior to the level achieved by bulk material manufactured using traditional processes. Herein, the as-received and polished specimens were treated by UNSM technology and their resulting properties were compared and discussed. The results showed that UNSM technology increased the surface hardness and reduced the surface roughness of the as-received and polished specimens. These results can be attributed to grain size refinement and pore elimination from the surface. Moreover, the friction of the as-received and polished specimens after UNSM technology was lower compared to those of the as-received and polished specimens, but no significant differences in wear resistance were found.