• Journal of Sensor Science and Technology
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• v.17 no.2
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• pp.147-150
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• 2008

Multiple ZnO nanorod device detecting $NO_2$ gas was fabricated by sol-gel growth method and gas response characteristics were measured as a chemical gas sensor. The device is mainly composed of sensing electrode and sensing nano material. To acquire high sensitivity of the device for $NO_2$ gas it was heated by a heat chuck up to $400^{\circ}C$ The sensing part was easily made using the CMOS compatible process, for example, the large area and low temperature nano material growth process, etc. The sensors were successfully demonstrated and showed high sensitive response for $NO_2$ gas sensing.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.317-318
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• 2012

현재의 반도체 산업에서 Hafnium oxide와 Hafnium silicates같은 high-k 물질은 CMOS gate와 DRAM capacitor dielectrics로 사용하기 위한 대표적인 물질에 속한다. MOSFET (metal oxide semiconductor field effect transistor)구조에서 gate length는 16 nm 이하로 계속 미세화가 연구 중이고, 또한 gate는 기존구조에서 Multi-gate구조로 다변화가 일어나고 있다. 이를 통해 게이트 절연막은 그 구조와 활용범위가 다양해지게 될 것이다. 동시에 leakage current와 dielectric break-down을 감소시키는 연구가 중요해지고 있다. 그러나 나노 영역에서의 기계적 특성에 대한 연구는 전무한 상태이다. 따라서 복잡한 회로 공정, 다양한 Multi-gate 구조, 신뢰도의 향상을 위해서는 유전박막 물질자체와 계면에서의 물리적, 기계적인 특징의 측정이 상당히 중요해지고 있다. 이에 본 연구는 Nano-indenter의 통해 경도(Hardness)와 탄성계수(Elastic modulus) 등의 측정을 통하여 시료 표면의 나노영역에서의 기계적 특성을 연구하고자 하였다. $HfO_2$게이트 절연막은 rf magnetron sputter를 이용해 Si (silicon) (100)기판위에 박막형태로 증착하였고, 이후 furnace에서 질소분위기로 온도(400, 450, $500^{\circ}C$)를 달리하여 20분 열처리를 하였다. 또한 Weibull distribution을 이용해 박막의 characteristic value를 계산하였으며, 실험결과 열처리 온도가 $400^{\circ}C$에서 $500^{\circ}C$로 증가함에 따라 경도와 탄성계수는 7.4 GPa에서 10.65 GPa으로 120.25 GPa에서 137.95 GPa으로 각각 증가하였다. 이는 재료적 측면으로 재료의 구조적 우수성이 증가된 것으로 판단된다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.31-32
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• 2005

Ge 농도가 30%인 SiGe 위에 Ni-Pd 합금을 이용한 새로운 Ni-Germanosilicide의 방법을 제안하여 열안정성 향상에 대해 연구하였다. 새롭게 제안한 Ni-Pd 합금을 이용하여 3 가지 구조 (Ni-Pd, Ni-Pd/TiN, Ni-Pd/Co/TiN) 중 Cobalt 다층구조를 사용한 구조 (Ni-Pd/Co/TiN)가 면저항이 가장 낮고 안정한 silicide 특성을 갖는 것을 나타냈으며, 고온열처리 $700^{\circ}C$, 30분에서도 낮고 안정한 면저항 특성을 유지시켜 열안정성을 개선하였다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.17 no.7
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• pp.42-48
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• 2016

In this paper, a high-precision peak detector circuit that detects the output voltage information of a fly-back converter is proposed. The proposed design consists of basic analog elements with only one operational amplifier and three transistors. Because of its simple structure, the proposed circuit can minimize the delay time of the detection process, which has a strong impact on the precision of the regulation aspect of the fly-back converter. Furthermore, by using an amplifier and several transistors, the proposed detector can be fully integrated on-chip, instead of using discrete circuit elements, such as capacitors and diodes, as in conventional designs, which reduces the production cost of the fly-back converter module. In order to verify the performance of the proposed scheme, the peak detector was simulated and implemented by using a 0.35 m MagnaChip process. The gained results from the simulation with a sinusoidal stimulus signal show a very small detection error in the range of 0.3~3.1%, which is much lower than other reported detecting circuits. The measured results from the fabricated chip confirm the simulation results. As a result, the proposed peak detector is recommended for designs of high-performance fly-back converters in order to improve the poor regulation aspect seen in conventional designs.

• JSTS:Journal of Semiconductor Technology and Science
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• v.4 no.4
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• pp.269-274
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• 2004

Current delivery system, in which the analog current produced by a unique DAC circuit is stored into a current-memory circuit and delivered in a time-divided sequence, shows variation of output current as low as 4% in a current source data-driver IC for AM-OLED driven by a current-programmed method without any fuse repairing after fabrication. This driver IC has 54 outputs and can sink constant current as low as 3 ${\mu}A$ with 6-bit analog levels. Such a low current level without variation can hardly be obtained by an ordinary MOS transistor because the current level is in the sub-threshold region and changes exponentially with threshold voltage variation. Thus we adopted a current mirror circuit composed of bipolar transistors to supply well-controlled current within a nano-ampere range.

• JSTS:Journal of Semiconductor Technology and Science
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• v.11 no.3
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• pp.198-206
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• 2011

This paper presents a new programmable compensation circuit (PCC) for a System-on-Chip (SoC). The PCC is integrated with $0.18-{\mu}m$ BiCMOS SiGe technology. It consists of RF Design-for-Testability (DFT) circuit, Resistor Array Bank (RAB) and digital signal processor (DSP). To verify performance of the PCC we built a 5-GHz low noise amplifier (LNA) with an on-chip RAB using the same technology. Proposed circuit helps it to provide DC output voltages, hence, making the RF system chain automatic. It automatically adjusts performance of an LNA with the processor in the SoC when it goes out of the normal range of operation. The PCC also compensates abnormal operation due to the unusual PVT (Process, Voltage and Thermal) variations in RF circuits.

• JSTS:Journal of Semiconductor Technology and Science
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• v.6 no.3
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• pp.131-135
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• 2006

High electron mobility transistors with InAs channels and antimonide barriers were grown on Si and GaAs substrates by means of molecular beam epitaxy. While direct growth of Sb materials on Si substrate generates disordered and coalescences 3-D growth, smooth and mirror-like 2D growth can be repeatedly obtained by inserting AlSb QD layers between them. Room-temperature electron mobilities of over 10,000 $cm^2/V-s$ and 20,000 $cm^2/v-s$ can be routinely obtained on Si and GaAs substrates, respectively, after optimizing the buffer structure as well as maintaining InSb-like interface.

• Proceedings of the IEEK Conference
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• 2006.06a
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• pp.589-590
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• 2006

A novel Triple-Well P-type Triggered Silicon Controlled Rectifier (TWPTSCR) for on-chip ESD protection implemented with a triple-well CMOS technology is presented. Unlike conventional SCR devices, the proposed TWPTSCR offers a reduced triggering voltage level as well as the enhanced ESD performance of the SCR devices. From the experimental results, the TWPTSCR with a device width of 20um has the triggering voltage of 1.1V.

• Transactions on Electrical and Electronic Materials
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• v.7 no.4
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• pp.173-179
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• 2006

Due to the limitations of the channel length, the lateral spread for two-dimensional impurity distributions is critical for the analysis of devices including the integrated complementary metal oxide semiconductor (CMOS) circuits and high frequency semiconductor devices. The developed codes were then compared with the two-dimensional implanted profiles measured by transmission electron microscope (TEM) as well as simulated by a commercial TSUPREM4 for verification purposes. The measured two-dimensional TEM data obtained by chemical etching-method was consistent with the results of the developed analytical model, and it seemed to be more accurate than the results attained by a commercial TSUPREM4. The developed codes can be applied on a wider energy range $(1KeV{\sim}30MeV)$ than a commercial TSUPREM4 of which the maximum energy range cannot exceed 1MeV for the limited doping elements. Moreover, it is not only limited to diffusion process but also can be applied to implantation due to the sloped and nano scale structure of the mask.

• Journal of the Microelectronics and Packaging Society
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• v.17 no.4
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• pp.1-9
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• 2010

Three-dimensional (3-D) integration is an emerging technology, which vertically stacks and interconnects multiple materials, technologies, and functional components such as processor, memory, sensors, logic, analog, and power ICs into one stacked chip to form highly integrated micro-nano systems. Since CMOS device scaling has stalled, 3D integration technology allows extending Moore's law to ever high density, higher functionality, higher performance, and more diversed materials and devices to be integrated with lower cost. The potential benefits of 3D integration can vary depending on approach; increased multifunctionality, increased performance, increased data bandwidth, reduced power, small form factor, reduced packaging volume, increased yield and reliability, flexible heterogeneous integration, and reduced overall costs. It is expected that the semiconductor industry's paradiam will be shift to a new industry-fusing technology era that will offer tremendous global opportunities for expanded use of 3D based technologies in highly integrated systems. Anticipated applications start with memory, handheld devices, and high-performance computers and extend to high-density multifunctional heterogeneous integration of IT-NT-BT systems. This paper attempts to introduce new 3D integration technologies of the chip self-assembling stacking and 3D heterogeneous opto-electronics integration for realizng the super-chip.