• Journal of the Institute of Electronics Engineers of Korea SD
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• v.43 no.10 s.352
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• pp.61-67
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• 2006

We developed a constant current source which is insensitive to threshold voltage variation caused by irregular grain boundary distribution in polycrystalline silicon. The proposed current source has superior saturation characteristics over wide range of input voltages as well as small current error compared to the previously reported Vth compensated sources. We measured the circuit performance and error in current due to parameter variation by using HSPICE.

• Journal of Information Display
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• v.11 no.1
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• pp.12-16
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• 2010

The effect of the crystallization and activated annealing of Si films using an excimer laser and the new CW blue laser are described and compared with furnace annealing for application in advanced TFTs and for future applications. Pulsed excimer laser annealing (ELA) is currently being used extensively as a low-temperature poly-silicon (LTPS) process on glass substrates as its efficiency is high in the ultra-violet (UV) region for thin Si films with thickness of 40-60 nm. ELA enables extremely low resistivity relating to high crystallinity for both the n- and p-type Si films. On the other hand, CW blue laser diode annealing (BLDA) enables the smooth Si surface to have arbitral crystal grains from micro-grains to an anisotropic huge grain structure only by controlling its power density. Both annealing techniques are expected to be applied in the future advanced TFT systems.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1267-1268
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• 2008

The two-shot SLS method has recently been successfully implemented in volume manufacturing of advanced LTPS-based LCDs. In this presentation, we discuss how the approach is also well suited for being implemented in high-throughput and high-yield manufacturing of large AMOLED displays on large glass substrates.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.911-913
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• 2008

In this work, nonvolatile memory (NVM) devices for system on panel of flat panel display (FPD) were fabricated using low temperature polycrystalline silicon (LTPS) thin film transistor (TFT) technology with an oxide-nitride-oxynitride (ONOn) stack structure on glass. The results demonstrate that the NVM devices fabricated using the ONOn stack structure on glass have suitable switching characteristics for data storage with a low operating voltage, a threshold voltage window of more than 1.8 V between the programming and erasing (P/E) states after 10 years and its initial threshold voltage window (${\Delta}V_{TH}$) after $10^5$ P/E cycles.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.109-112
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• 2008

The grain size of JIC poly-Si can be varied from few tens of nanometers to the one having the larger grain size exceeding that of excimer laser crystallized (ELC) poly-Si according transmission electron microscopy. JIC poly-Si exhibits an excellent uniformity with regards to the grain size. We report here the blanket crystallization of the large area using the $2^{nd}$ generation glass substrate.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.399-402
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• 2006

A new voltage-scaled compensation pixel which employs 3 p-type poly-Si TFTs and 2 capacitors without additional control line has been proposed and verified. The proposed pixel does not employ the $V_{TH}$ memorizing and cancellation, but scales down the inevitable $V_{TH}$ variation of poly-Si TFT. Also the troublesome narrow input range of $V_{DATA}$ is increased and the $V_{DD}$ supply voltage drop is suppressed. In our experimental results, the OLED current error is successfully compensated by easily controlling the proposed voltage scaling effects.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.451-458
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• 2006

The Chair of Display Technology at the University of Stuttgart develops various technologies for active matrix applications. Last year we presented an LTPS active matrix process without the need for ion implantation. This process is compared to other AM processes and the technological demands for different applications are discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1283-1286
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• 2006

A holding latch with level shifting function is proposed for power and cost effectiveness with low temperature polycrystalline silicon technology on the glass backplane. Layout area and power consumption of the proposed circuit are reduced by 10% and 52% compared with those of the typical structure which combines a static D-latch and a cross coupled level shifter for 2.2" qVGA panel, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1287-1290
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• 2006

A high speed analog buffer using polycrystalline silicon (poly-Si) thin film transistors (TFT) is proposed for 2.2-inch quarter video graphic adapter (qVGA) TFT-LCD panel. Simulation results show that the settling time of the proposed circuit is $10{\mu}sec$ in 2.2-inch qVGA and the power consumption of proposed analog buffer is $25{\mu}W$.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.56-57
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• 2003

Sequential lateral solidification has recently become an option for manufacturing LTPS TFT LCDs owing to the availability of production equipment. Compared to the currently established ELA crystallization method, it is characterized by its low running costs and the high quality microstructures that can be obtained. In this presentation, we will review the production-related developments as well as elaborate on recent research activities that deal with a number of crystallization schemes that can be beneficial for future active-matrix display products.