• Title/Summary/Keyword: Junction field

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The Fabrication of Super Junction IGBT with 3,000 V Class Super Junction Field Rings (3,000 V급 초접합 필드링을 갖는 초접합 IGBT 제작에 관한 연구)

  • Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.9
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    • pp.551-554
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    • 2015
  • This paper was analyzed electrical characteristics of super junction IGBT with super junction field rings. As a result of super junction IGBT with super junction field rings, we obtained 3,300 V breakdown voltage and good thermal characteristics. we obtained shrinked chip size because field ring was decreased than field ring for conventional IGBT, too. And we fabricated super junction IGBT with super junction field rings. As a result of measuring fabricated chip, we obtained 3,300 V breakdown voltage. The fabricated devices were replaced thyristos using high voltage conversion, sufficiently.

A Study on the Electrical Characteristics according to Growth of Trench SiO2 Inside Super Junction IGBT Pillar (Super Junction IGBT 필러 내부 Trench SiO2성장에 따른 전기적 특성에 관한 연구)

  • Lee, Geon Hee;Ahn, Byoung Sup;Kang, Ey Goo
    • Journal of IKEEE
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    • v.25 no.2
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    • pp.344-349
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    • 2021
  • This paper proposes a structure in which Trench SiO2 is grown inside of Super Junction IGBT P-Pillar. When observing the electric field in 3D, we checked the region where the electric field have not affected inside of the P-Pillar. The pillar region's portion resistance is varied by the breakdown voltage and size of each pillar, which reduces the size by growing SiO2 after trenching has no field effect inside of that. At 4.5kV the same breakdown voltage, it was confirmed that the On-state voltage drop improved by about 58%, 19% compared to Field Stop IGBT and conventional Super Junction IGBT.

Field-in-Field Technique to Improve Dose Distribution in the Junction of the Field with Head & Neck Cancer (Field-in-Field Technique을 이용한 두경부암의 접합부위 선량개선에 관한 고찰)

  • Kim, Seon-Myeong;Lee, Yeong-Cheol;Jeong, Deok-Yang;Kim, Young-Bum
    • The Journal of Korean Society for Radiation Therapy
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    • v.21 no.1
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    • pp.17-23
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    • 2009
  • Purpose: In treating head and neck cancer, it is very important to irradiate uniform dose on the junction of the bilateral irradiation field of the upper head and neck and the anterior irradiation field of the lower neck. In order to improve dose distribution on the junction, this study attempted to correct non uniform dose resulting from under dose and over dose using the field-in-field technique in treating the anterior irradiation field of the lower neck and to apply the technique to the treatment of head and neck cancer through comparison with conventional treatment. Materials and Methods: In order to examine dose difference between the entry point and the exit point where beam diffusion happens in bilateral irradiation on the upper head and neck, we used an anthropomorphic phantom. Computer Tomography was applied to the anthropomorphic phantom, the dose of interest points was compared in radiation treatment planning, and it was corrected by calculating the dose ratio at the junction of the lower neck. Dose distribution on the junction of the irradiated field was determined by placing low-sensitivity film on the junction of the lower neck and measuring dose distribution on the conventional bilateral irradiation of the upper head and neck and on the anterior irradiation of the lower neck. In addition, using the field-in-field technique, which takes into account beam diffusion resulting from the bilateral irradiation of the upper head and neck, we measured difference in dose distribution on the junction in the anterior irradiation of the lower neck. In order to examine the dose at interest points on the junction, we compared and analyzed the change of dose at the interest points on the anthropomorphic phantom using a thermoluminescence dosimeter. Results: In case of dose sum with the bilateral irradiation of the upper head and neck when the field-in-field technique is applied to the junction of the lower neck in radiation treatment planning, The dose of under dose areas increased by 4.7~8.65%. The dose of over dose areas also decreased by 2.75~10.45%. Moreover, in the measurement using low-sensitivity film, the dose of under dose areas increased by 11.3%, and that of over dose areas decreased by 5.3%. In the measurement of interest point dose using a thermoluminescence dosimeter, the application of the field-in-field technique corrected under dose by minimum 7.5% and maximum 17.6%. Thus, with the technique, we could improve non.uniform dose distribution. Conclusion: By applying the field-in-field technique, which takes into account beam divergence in radiation treatment planning, we could reduce cold spots and hot spots through the correction of dose on the junction and, in particular, we could correct under dose at the entry point resulting from beam divergence. This study suggests that the clinical application of the field-in-field technique may reduce the risk of lymph node metastasis caused by under dose on the cervical lymph node.

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Investigation of Junction-less Tunneling Field Effect Transistor (JL-TFET) with Floating Gate

  • Ali, Asif;Seo, Dongsun;Cho, Il Hwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.1
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    • pp.156-161
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    • 2017
  • This work presents a novel structure for junction-less tunneling field effect transistor (JL-TFET) with a floating gate over the source region. Introduction of floating gate instead of fixed metal gate removes the limitation of fabrication process suitability. The proposed device is based on a heavily n-type-doped Si-channel junction-less field effect transistor (JLFET). A floating gate over source region and a control-gate with optimized metal work-function over channel region is used to make device work like a tunnel field effect transistor (TFET). The proposed device has exhibited excellent ID-VGS characteristics, ION/IOFF ratio, a point subthreshold slope (SS), and average SS for optimized device parameters. Electron charge stored in floating gate, isolation oxide layer and body doping concentration are optimized. The proposed JL-TFET can be a promising candidate for switching performances.

A Study on Field Ring Design of 600 V Super Junction Power MOSFET (600 V급 Super Junction MOSFET을 위한 Field Ring 설계의 관한 연구)

  • Hong, Young-Sung;Jung, Eun-Sik;Kang, Ey-Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.4
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    • pp.276-281
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    • 2012
  • Power semiconductor devices are widely used as high voltage applications to inverters and motor drivers, etc. The blocking voltage is one of the most important parameters for power semiconductor devices. Generally most of field effect concentrations shows on the edge of power devices. Can be improve the breakdown characteristic using edge termination technology. In this paper, considering the variables that affect the breakdown voltage and optimization of parameters result for 600 V Super Junction MOSFET Field ring.

The Junction Termination Design Employing Shallow Trench and Field Limiting Ring for 1200 V-Class Devices (얕은 트렌치와 전계 제한 확산 링을 이용한 접합 마감 설계의 1200 V급 소자에 적용)

  • 하민우;오재근;최연익;한민구
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.6
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    • pp.300-304
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    • 2004
  • We have proposed the junction termination design employing shallow trench filled with silicon dioxide and field limiting ring (FLR). We have designed trenches between P+ FLRs to decrease the junction termination radius without sacrificing the breakdown voltage characteristics. We have successfully fabricated and measured improved breakdown voltage characteristics of the Proposed device for 1200 V-class applications. The junction termination radius of the proposed device has decreased by 15%-21% compared with that of the conventional FLR at the identical breakdown voltage. The junction termination area of the proposed device has decreased by 37.5% compared with that of the conventional FLR. The breakdown voltage of the proposed device employing 7 trenches was 1156 V, which was 80% of the ideal parallel-plane .junction breakdown voltage.

Study on Insulation Prediction of Triple Junction in $SF_6$ ($SF_6$ 가스 중의 삼중점 절연파괴 예측기술에 관한 연구)

  • Cho, Yong-Sung;Chong, Jin-Kyo;Lee, Woo-Young
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.58 no.5
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    • pp.989-993
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    • 2009
  • Triple junction which consists of three media(electrode, insulator, and gas) should be considered in designing of high voltage equipments due to the electric field enhancement. In this paper, positive lightning impulse breakdown voltage is predicted based on the streamer theory for simplified insulator models and 72.5kV spacer with varying the triple junction geometry and gas pressure, and the results are compared to the experimental results. The electric field coefficient concept is also applied in order to evaluate the partial discharge inception voltage and the surface flashover voltage from the streamer inception voltage. The application of this method using the constant electric field coefficient of 1.3 and 0.66 is possible for evaluating the triple-junction insulation of the simplified insulator and the 72.5kV spacer respectively. The error rate is under 10%.

Junction termination technology for 4H-SiC devices (Junction termination 기법에 따른 4H-SiC 소자의 항복전압 특성 분석)

  • Kim, H.Y.;Bahng, W.;Song, G.H.;Kim, N.K.;Kim, E.D.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.286-289
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    • 2003
  • In the case of high voltage devices, junction termination plays an important role in determining the breakdown voltage of the device. The mesa junction termination has been demonstrated to yield nearly ideal breakdown voltage for 6H-SiC p-n junctions. However, such an approach may not be attractive because of the nonplanar surface, which is difficult to passivate. Moreover, In case of 4H-SiC, ideal breakdown voltage could not be achieved using mesa junction termination. For 4H-SiC planar junction termination technique is more useful one rather than mesa junction termination. In this paper, breakdown characteristics of the 4H-SiC device with planar junction termination, such as FLR(Field Limiting Ring), FP(Field Plate) and JTE(Junction Termination Extension), is presented. In the case of the FLR, breakdown voltage of 1800V is obtained. And breakdown voltage of 1000V and 1150V is also obtained for the case of FP and JTE case, respectively.

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Magnetic tunnel junctions with thin free layer

  • 임우창;박병국;배지영;이택동
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.68-69
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    • 2002
  • Magnetic tunnel junctions은 최근 자기저항용 재료나 MRAM용 소자로 사용하기 위한 연구가 활발하게 진행되고 있다. Magnetic tunnel junction을 저자계, 저전력용 소자로 사용되기 위해서는, 작은 switching field 값과 uniform한 switching field 분포를 가져야 한다. Micromagnetic simulation을 통하여 free layer의 두께와 포화 자화 값이 감소함에 따라서 switching field가 감소함을 알 수 있었다. 본 연구에서는 얇은 free layer를 사용하여 magnetic tunnel junction을 제조하고, 얇은 free layer가 자기저항에 미치는 영향에 대하여 알아보았다. (중략)

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The Research of Deep Junction Field Ring using Trench Etch Process for Power Device Edge Termination

  • Kim, Yo-Han;Kang, Ey-Goo;Sung, Man-Young
    • Journal of IKEEE
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    • v.11 no.4
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    • pp.235-238
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    • 2007
  • The planar edge termination techniques of field-ring and deep junction field-ring were investigated and optimized using a two-dimensional device simulator TMA MEDICI. By trenching the field ring site which would be implanted, a better blocking capability can be obtained. The results show that the p-n junction with deep junction field-ring can accomplish near 30% increase of breakdown voltage in comparison with the conventional field-rings. The deep junctionfield-rings are easy to design and fabricate and consume same area but they are relatively sensitive to surface charge. Extensive device simulations as well as qualitative analyses confirm these conclusions.

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