• Title/Summary/Keyword: Ion effect

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Main Factors that Effect on the Ion-Migration of PCB (PCB의 이온-마이그레이션에 영향을 미치는 주요요인)

  • Jang, In-Hyeok;Kim, Jeong-Ho;Oh, Gil-Gu;Lee, Young-Joo;Lim, Hong-Woo;Choi, Youn-Ok
    • Journal of Applied Reliability
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    • v.16 no.3
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    • pp.202-207
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    • 2016
  • Purpose: The purpose of this study is main factors (environmental conditions, pattern spacing, pattern material) that effect the ion-migration of PCB. Methods: Recently, the electronic components are becoming more high density of electronic device, so that electronic circuits have smaller pitches between the patten and more vulnerable to insulation failure. so the reliability of electric insulation of device has become an ever important issue as device contact pitches of pattern. Usually, ion-migration occurs in high temperature and high humidity environment as voltage is applied to the circuit. Under high temperature and high humidity, voltage applied electronic components respond to applied voltages by metals's electrochemical ionization and a conducting filament forms between the anode and cathode across a nonmetallic medium. This leads to short-circuit failure of the electronic component. Results: we studied ion-migration that occurs in accordance with the main factors (environmental conditions, pitches, pattern material). The PCB pattern material was made by two different types of material (free solder, OSP) for this research and pitches of pattern is 0.15mm, 0.3mm, 0.5mm. PCB was experimented in the environmental conditions (high temperature $120^{\circ}C$, high temperature and high humidity $85^{\circ}C$, 85%RH) and was analyzed for ion-migration through the experiment results. Conclusion: We confirmed that environmental condition, pitches of pattern, pattern material had effect on ion-migration of PCB.

Improvement of Photoheterotrophic $H_2$ production of Rhodobacter sphaeroides by Removing Ammonium Ion Effect Exerted on Nitrogenase (Rhodobacter sphaeroides의 질소고정효소에 미치는 암모니움 이온 효과 제거를 통한 수소생성 증진)

  • Jin, Sang-Hoon;Kim, Mi-Sun;Lee, Jeong-Kug
    • KSBB Journal
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    • v.20 no.6
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    • pp.418-424
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    • 2005
  • Photoheterotrophic evolution of molecular hydrogen by Rhodobacter sphaeroides is mediated by nitrogenase that is regulated transcriptionally and post-translationally by ammonium ion. Two PII-like proteins, GlnB and GlnK, play key roles in mediating inhibition and repression of nitrogenase in the presence of ammonium ion. glnB and glnK of R. sphaeroides were interrupted to abolish the ammonium ion effect controlling nitrogenase. Ammonium ion effect was still observed in mutant having an interruption in either glnB or glnK. However, the nitrogenase activity of glnB-glnK double mutant is not affected by ammonium ion. $H_2$ evolution was improved by increasing gene dosages of nitrogenase-coding genes, nifHDK in trans in glnB-glnK double mutant.

Experimental Study on Effect of Furnace Temperature on TiN-Coating by Arc Ion Plating (AIP 코팅법에서 로의 온도가 TiN 코팅에 미치는 영향에 관한 실험적 연구)

  • Kim H. J.;Lee S. W.;Joun M. S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.401-406
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    • 2005
  • In this paper, both effect of TiN-coating and effect of temperature in TiN-coating by arc ion plating on surface characteristics of TiN coated SKH51 steel are investigated by experiments. Hardness, surface roughness, TiN coating thickness and adsorption force are measured in order to evaluate the effects. For evaluation of the experimental data, the two-way ANOVA method is used. It is concluded that the furnace temperature in the rang of $400^{\circ}C\~500^{\circ}C$ in AIP processing has very little influence on the TiN coating of the SKH51 steels.

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Preparation and Characterization of Water-Soluble Glass Through Melting Process(II) : Dissolution Characteristics, Bactericidal Effects and Cytotoxicity (용융법에 의한 수용성 유리의 제조 및 특성(II) : 용해 특성, 살균 효과 및 세포 독성)

  • 오승한;조종호;최세영;오영제
    • Journal of the Korean Ceramic Society
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    • v.34 no.1
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    • pp.13-22
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    • 1997
  • Water-soluble phosphate glasses containing Ag and Cu ion were prepared through melting process. Dis-solution characteristics, bactericidal effect and cytotoxicity were investigated with composition and time in D. I. water using the powdered sample. Surface change were observed with increasing dissolution time us-ing the bulk specimen. Dissolution amount was maximum at the molar Ag:Cu ratio of 1 and increased with increasing time. The behavior of dissolution was total dissolution from the early stage. But no new layer was observed at the glass surface during dissolution. The bactericidal effect for pseudomonas sp, e. coli, sta-phylococcus aureus, and salmonella increased with increasing dissolution amount and therefore great bac-tericidal effect appeared. The result of cytotoxicity experiment to L929 showed that solution with more than 10 ppm of Ag ion had strong cytotoxicity.

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A hardening model considering grain size effect for ion-irradiated polycrystals under nanoindentation

  • Liu, Kai;Long, Xiangyun;Li, Bochuan;Xiao, Xiazi;Jiang, Chao
    • Nuclear Engineering and Technology
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    • v.53 no.9
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    • pp.2960-2967
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    • 2021
  • In this work, a new hardening model is proposed for the depth-dependent hardness of ion-irradiated polycrystals with obvious grain size effect. Dominant hardening mechanisms are addressed in the model, including the contribution of dislocations, irradiation-induced defects and grain boundaries. Two versions of the hardening model are compared, including the linear and square superposition models. A succinct parameter calibration method is modified to parametrize the models based on experimentally obtained hardness vs. indentation depth curves. It is noticed that both models can well characterize the experimental data of unirradiated polycrystals; whereas, the square superposition model performs better for ion-irradiated materials, therefore, the square superposition model is recommended. In addition, the new model separates the grain size effect from the dislocation hardening contribution, which makes the physical meaning of fitted parameters more rational when compared with existing hardness analysis models.

THE EFFECT OF DUST PARTICLES ON ION ACOUSTIC SOLITARY WAVES IN A DUSTY PLASMA

  • Choi, Cheong-Rim;Lee, Dae-Young;Kim, Yong-Gi
    • Journal of Astronomy and Space Sciences
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    • v.21 no.3
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    • pp.201-208
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    • 2004
  • In this paper we have examined the effect of dust charge density on nonlinear ion acoustic solitary wave which propagates obliquely with respect to the external magnetic field in a dusty plasma. For the dusty charge density below a critical value, the Sagdeev potential $\Psi1(n)$ has a singular point in the region n < 1, where n is the ion number density divided by its equilibrium number density. If there exists a dust charge density over the critical value, the Sagdeev potential becomes a finite function in the region n < 1, which means that there may exist the rarefactive ion acoustic solitary wave. By expanding the Sagdeev potential in the small amplitude limit up to on4 near n=1, we find the solution of ion acoustic solitary wave. Therefore we suggest that the dust charge density plays an important role in generating the rarefactive solitary wave.

Three-dimensional monte carlo modeling and simulation of point defect generation and recombination during ion implantation (이온 주입 시의 점결함 발생과 재결합에 관한 3차원 몬테 카를로 모델링 및 시뮬레이션)

  • 손명식;황호정
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.5
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    • pp.32-44
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    • 1997
  • A three-dimensional (3D) full-dynamic damage model for ion implantation in crystalline silicon was proposed to calculate more accurately point defect distributions and ion-implanted concentration profiles during ion implantation process. The developed model was based on the physical monte carlo approach. This model was applied to simulate B and BF2 implantation. We compared our results for damage distributions with those of the analytical kinchin-pease approach. In our result, the point defect distributions obtained by our new model are less than those of kinchin-pease approach, and the vacancy distributions differ from the interstitial distributions. The vacancy concentrations are higher than the interstitial ones before 0.8 . Rp to the silicon surface, and after the 0.8 . Rp to the silicon bulk, the interstitial concentrations are revesrsely higher than the vacancy ones.The fully-dynamic damage model for the accumulative damage during ion implantation follows all of the trajectories of both ions and recoiled silicons and, concurrently, the cumulative damage effect on the ions and the recoiled silicons are considered dynamically by introducing the distributon probability of the point defect. In addition, the self-annealing effect of the vacancy-interstitial recombination during ion implantation at room temperature is considered, which resulted in the saturation level for the damage distribution.

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Liquid Crystal Alignment Effect on Polyimide Surface by Ion-beam Irradiation (이온빔을 이용한 폴리이미드 표면의 액정배향효과)

  • Park, Hong-Gyu;Oh, Byeong-Yun;Kim, Young-Hwan;Kim, Byoung-Yong;Han, Jeong-Min;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.330-330
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    • 2008
  • It is widely investigated to liquid crystal (LC) alignment using non-contact alignment method such as ion-beam (IB) irradiation, UV alignment, and oblique deposition. Because conventional rubbing method has some drawbacks. These include defects from dust and electrostatic charges and rubbing scratch during rubbing process. In addition, rubbing method needs additional process to remove these defects. Therefore rubbing-free methods like ion-beam irradiation are strongly required. We studied LC alignment effect on poly imide surface by IB irradiation and electro-optical (EO) characteristics of twisted nematic liquid crystal display (TN-LCD). In this experiment, a good uniform alignment of the nematic liquid crystal (NLC) with the ion-beam exposure on the polyimide (PI) (SE-150 from Nissan Chemical) surface was observed. We also achieved low pretilt angle as a function of ion-beam irradiation intensity. In addition, it can be obtained the good EO properties of the IB-aligned TN-LCD on PI surface. Some other experiments results and discussion will be included in the poster.

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Electrode Charging Effect on Ion Energy Distribution of Dual-Frequency Driven Capacitively Coupled Plasma Etcher (이중 주파수 전원의 용량성 결합 플라즈마 식각장비에서 전극하전에 의한 입사이온 에너지분포 변화연구)

  • Choi, Myung-Sun;Jang, Yunchang;Lee, Seok-Hwan;Kim, Gon-Ho
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.3
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    • pp.39-43
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    • 2014
  • The effect of electrode charging on the ion energy distribution (IED) was investigated in the dual-frequency capacitively coupled plasma source which was powered of 100 MHz RF at the top electrode and 400 kHz bias on the bottom electrode. The charging property was analyzed with the distortion of the measured current and voltage waveforms. The capacitance and the resistance of electrode sheath can change the property of ion and electron charging on the electrode so it is sensitive to the plasma density which is controlled by the main power. The ion energy distribution was estimated by equivalent circuit model, being compared with the measured distribution obtained from the ion energy analyzer. Results show that the low frequency bias power changes effectively the low energy population of ion in the energy distribution.

Effect of $NH_4^{+}$ Ion on the Transpot System of Amino Acids (아미노산의 능동 수송계에 미치는 $NH_4^{+}$ 이온의 영향)

  • 조봉희
    • Korean Journal of Plant Tissue Culture
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    • v.26 no.2
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    • pp.99-102
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    • 1999
  • Glucose - induced arginine transport system was induced by a exogenous application of NH$_4$^+ ion. The uptake rate of arginine (Arg) depended on the external NH$_4$^+ ion concentration. The uptake rate was inhibited by the presence of NH$_4$^+ ion within 1 min, whereas it increased maximally after 30 min. Glucose and NH$_4$^+ ion induced the same arginine transport system. Km value of Arg transport systems was 2 $\mu$M, and V_(max) was 60 $\mu$mol^(-1) . h . g fresh weight^(-1) for NH$_4$^+ ion and 174 $\mu$mol^(-1) . h . g fresh weight^(-1) for glucose induced transport system. But, the transport system of Glu for glucose and NH$_4$^(-1) ion induced had different Km values. Km value of Glu was 285 $\mu$M for glucose - and 58 $\mu$M for NH$_4$^+ ion induced transport system. Thus, NH$_4$^+ ions play a important role as inducer for the glutamine transport system. NH$_4$^+ ion induced glutamine system was inhibited over 90% by cycloheximide. We concluded that a new carrier protein for glutamine was induced by NH$_4$^+ ion.

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