Electrode Charging Effect on Ion Energy Distribution of Dual-Frequency Driven Capacitively Coupled Plasma Etcher |
Choi, Myung-Sun
(Department of Energy Systems Engineering, Seoul National University)
Jang, Yunchang (Department of Energy Systems Engineering, Seoul National University) Lee, Seok-Hwan (Department of Energy Systems Engineering, Seoul National University) Kim, Gon-Ho (Department of Energy Systems Engineering, Seoul National University) |
1 | H.H. Goto, H.-D. Lowe, T. Ohmi, IEEE Trans. Semicond. Manuf., Vol.6, pp58-64, 1993. DOI ScienceOn |
2 | H.C. Kim, Journal of KSDET, Vol.4, No.2, pp.11-14, 2005. |
3 | R. Tsui, Phys. Rev., Vol.168, pp.107-108, 1968. DOI |
4 | E. Kawamura, V. Vahedi, Plasma Sources Sci. Technol., Vol.8, pp.R45-R64, 1999. DOI ScienceOn |
5 | R. Farouki, S. Hamaguchi, M. Dalvie, Phys. Rev. A., Vol.45, pp.5913-5929, 1992. DOI ScienceOn |
6 | P. Benoit-Cattin, J. Appl. Phys., Vol.39, pp.5723, 1968. DOI |
7 | J.W. Coburn, J. Appl. Phys., Vol.43, pp.4965, 1972. DOI ScienceOn |
8 | A. Metze, D. Ernie, H. Oskam, J. Appl. Phys., Vol.60, pp.3081-3087, 1986. DOI |
9 | S.-B. Wang, A. E. Wendt, J. Appl. Phys., Vol.88, pp.643-646, 2000. DOI ScienceOn |
10 | S. Rauf, J. Appl. Phys., Vol.87, pp.7647-7651, 2000. DOI ScienceOn |
11 | A. Agarwal, M.J. Kushner, J. Vac. Sci. Technol. A Vacuum, Surfaces, Film., Vol.23, pp.1440-1449, 2005. DOI ScienceOn |
12 | J.S. Han, J.P. McVittie, J. Zheng, J. Vac. Sci. Technol. B Microelectron. Nanom. Struct., Vol.13, pp.1893-1899, 1995. DOI |