• 제목/요약/키워드: Ion beam machining

검색결과 37건 처리시간 0.034초

집속이온빔을 이용한 마이크로 노즐의 제작 (Machining of The Micro Nozzle Using Focused Ion Beam)

  • 김규환;민병권;이상조;박철우;이종항
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1194-1197
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    • 2005
  • Micro nozzle is employed as a dynamic passive valve in micro fluidic devices. Micro nozzle array is used in micro droplet generation in bio-medical applications and propulsion device for actuating satellite and aerospace ship in vacuum environments. Aperture angle and the channel length of the micro nozzle affect its retification efficiency, and thus it is needed to produce micro nozzle precisely. MEMS process has a limit on making a micro nozzle with high-aspect ratio. Reactive ion etching process can make high-aspect ratio structure, but it is difficult to make the complex shape. Focused ion beam deposition has advantage in machining of three-dimensional complex structures of sub-micron size. Moreover, it is possible to monitor machining process and to correct defected part at simultaneously. In this study, focused ion beam deposition was applied to micro nozzle production.

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이온 스파터 가공에 의하 금속표면의 표면거칠기에 관한 연구 (A Study on The Surface Roughness Of Metal Workpieces Machined by Ion Sputtering)

  • 한응교;노병옥;박재민
    • 대한기계학회논문집
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    • 제14권3호
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    • pp.747-754
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    • 1990
  • 본 연구에서는 장시간 가공하는 경우 가공량과 가공물에 입사되는 이온 빔의 입사각도에 따라 이온 스파터 가공이 표면거칠기에 미치는 영향에 대해서 연구해 보았 다.

다구찌 기법을 이용한 FIB-Sputtering 가공 특성 분석 (Analysis on FIB-Sputtering Process using Taguchi Method)

  • 이석우;최병열;강은구;홍원표;최헌종
    • 한국공작기계학회논문집
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    • 제15권6호
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    • pp.71-75
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    • 2006
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its usage in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. The target of this paper is the analysis of FIB sputtering process according to tilt angle, dwell time and overlap for application of 3D micro and pattern fabrication and to find the effective beam scanning conditions using Taguchi method. Therefore we make the conclusions that tilt angle is dominant parameter for sputtering yield. Burr size is reduced as tilt angle is higher.

집속이온빔장치에서의 이온빔축 얼라인먼트 (Alignment Method of Ion Beam Axis in Focused Ion Beam System)

  • 박철우;이종항;강승언
    • 대한기계학회논문집A
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    • 제30권9호
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    • pp.1166-1172
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    • 2006
  • This paper describes an alignment method of the ion column which is used for a focused-ion-beam machining system. The alignment parameters for mechanical and electrical components are introduced, and also sample images are used for evaluating the experiments. The experimental results show that geometrical positions of mechanical components have an influence on the quality of emitted ion beam. In addition, we can successfully align the traveling axis of ions by using mechanical and electrical methods.

FIB 가공 공정 특성 분석 (The analysis of sputtering characteristics using Focused Ion Beam according to Focal Length)

  • 최병열;최우천;강은구;홍원표;이석우;최헌종
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1518-1521
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    • 2005
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its usage in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries This paper focus to apply the sputtering technology accumulated by experiments to 3d structure fabrication with high resolution. Therefore some verifications and discussions of the characteristics of FIB sputtering results according to focal length were described in this paper. And we suggested the definition of rectangular pattern profile and made the verifications of sputtering results based on definition of it.

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SIMION 시뮬레이터를 이용한 정전렌즈의 빔 집속 성능 (Beam Focusing Performance of Electrostatic Lens using SIMION Simulator)

  • 오맹호;정인승;이종항
    • 한국정밀공학회지
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    • 제26권4호
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    • pp.128-133
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    • 2009
  • Focused-ion-beam (FIB) system is capable of both machining and measuring in nano-scale; hence nano-scale focusing quality is important. This paper investigates design parameters of two electrostatic lenses in order to achieve the best ion beam focusing performance. Commercial SIMION simulator is used to optimize the dimensions of the condenser and objective lenses and investigate the influence of assembly error on focusing quality The simulation results show that the beam focusing quality is not influenced by angle deviation within ${\pm}0.02\;deg$ and geometrical eccentricity within ${\pm}50$ micrometers.