Browse > Article

Analysis on FIB-Sputtering Process using Taguchi Method  

Lee, Seok-Woo (한국생산기술연구원)
Choi, Byoung-Yeol (한국생산기술연구원 e가공공정팀)
Kang, Eun-Goo (한국생산기술연구원 e가공공정팀)
Hong, Won-Pyo (한국생산기술연구원 e가공공정팀)
Choi, Hon-Zong (한국생산기술연구원 e가공공정팀)
Publication Information
Transactions of the Korean Society of Machine Tool Engineers / v.15, no.6, 2006 , pp. 71-75 More about this Journal
Abstract
The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its usage in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. The target of this paper is the analysis of FIB sputtering process according to tilt angle, dwell time and overlap for application of 3D micro and pattern fabrication and to find the effective beam scanning conditions using Taguchi method. Therefore we make the conclusions that tilt angle is dominant parameter for sputtering yield. Burr size is reduced as tilt angle is higher.
Keywords
Focused Ion Beam; FIB Sputtering; Micro Pattern; Taguchi Method; Redeposition;
Citations & Related Records
연도 인용수 순위
  • Reference
1 Fujita, J., Ishida, M., Ichihashi, T., Ochiai, Y., Kaito, T. and Matsui, S., 2003, 'Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties,' Nucl. Inst. and Methods in Physics Res., B206, pp. 472-477
2 Tseng, A. A, 2004, 'Recent developments in micromilling using focused ion beam technology,' J. Micromech. Microeng., Vol. 14, R15-R34   DOI   ScienceOn
3 Watanabe, K, Morita, T. and Kometani, R., 2004, 'Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition,' J. Vac. Sci. Technol., B22(1), pp. 22-26
4 Choi, B. Y., Kang, E. G., Hong, W. P., Lee, S. W. and Choi, H. Z., 2005, 'Analysis on FIB Machining Process using the Taguchi Approach,' Proceedings of the KSMTE Autumn Conference, pp. 26-30
5 Kometani, R., Morita, T., Watanabe, K., Hoshino, T., Kondo, K., Kanda, K., Haruyama, Y., Kaito, T., Fujita, J., Ishida, M., Ochiai, Y. and Matsui, S., 2004, 'Manomanipulator and actuator fabrication on glass capillary by focused-ion-beam-chemical vapor deposition,' J. Vac. Sci, Technol., B22(1), Jan/Feb, pp. 257-263
6 Yamaguchi, H. Shimase, A., Haraichi, S. and Miyauchi, T., 1985, 'Characteristics of Silicon Removal by Fine Focused Gallium Ion Beam,' Journal of Vacuum Science and Technology B, Vol. 3, No. 1, pp. 71-74   DOI
7 Watanabe, K., Hoshino, T., Kodo, K., Kanda, K., Haruyama, Y., Kaito, T., Fujita, J., Ishida, M., Ochiai, Y., Tajima, T. and Matsui, S., 2004, 'Nanoimprint using three-dimensional microlens mold made by focused -ion-beam chemical vapor deposition,' J. Vac. Sci. Technol., B22(1), Jan/Feb, pp. 22-26