• Title/Summary/Keyword: Integrated photonics

Search Result 197, Processing Time 0.02 seconds

Photorealistic Ray-traced Visualization Approach for the Interactive Biomimetic Design of Insect Compound Eyes

  • Nguyen, Tung Lam;Trung, Hieu Tran Doan;Lee, Wooseok;Lee, Hocheol
    • Current Optics and Photonics
    • /
    • v.5 no.6
    • /
    • pp.699-710
    • /
    • 2021
  • In this study, we propose a biomimetic optical structure design methodology for investigating micro-optical mechanisms associated with the compound eyes of insects. With these compound eyes, insects can respond fast while maintaining a wide field of view. Also, considerable research attention has been focused on the insect compound eyes to utilize these benefits. However, their nano micro-structures are complex and challenging to demonstrate in real applications. An effectively integrated design methodology is required considering the manufacturing difficulty. We show that photorealistic ray-traced visualization is an effective method for designing the biomimetic of a micro-compound eye of an insect. We analyze the image formation mechanism and create a three-dimensional computer-aided design model. Then, a ray-trace visualization is applied to observe the optical image formation. Finally, the segmented images are stitched together to generate an image with a wide-angle; the image is assessed for quality. The high structural similarity index (SSIM) value (approximately 0.84 to 0.89) of the stitched image proves that the proposed MATLAB-based image stitching algorithm performs effectively and comparably to the commercial software. The results may be employed for the understanding, researching, and design of advanced optical systems based on biological eyes and for other industrial applications.

Numerical Research on Suppression of Thermally Induced Wavefront Distortion of Solid-state Laser Based on Neural Network

  • Liu, Hang;He, Ping;Wang, Juntao;Wang, Dan;Shang, Jianli
    • Current Optics and Photonics
    • /
    • v.6 no.5
    • /
    • pp.479-488
    • /
    • 2022
  • To account for the internal thermal effects of solid-state lasers, a method using a back propagation (BP) neural network integrated with a particle swarm optimization (PSO) algorithm is developed, which is a new wavefront distortion correction technique. In particular, by using a slab laser model, a series of fiber pumped sources are employed to form a controlled array to pump the gain medium, allowing the internal temperature field of the gain medium to be designed by altering the power of each pump source. Furthermore, the BP artificial neural network is employed to construct a nonlinear mapping relationship between the power matrix of the pump array and the thermally induced wavefront aberration. Lastly, the suppression of thermally induced wavefront distortion can be achieved by changing the power matrix of the pump array and obtaining the optimal pump light intensity distribution combined using the PSO algorithm. The minimal beam quality β can be obtained by optimally distributing the pumping light. Compared with the method of designing uniform pumping light into the gain medium, the theoretically computed single pass beam quality β value is optimized from 5.34 to 1.28. In this numerical analysis, experiments are conducted to validate the relationship between the thermally generated wavefront and certain pumping light distributions.

Holographic Recording Versus Holographic Lithography

  • Seungwoo Lee
    • Current Optics and Photonics
    • /
    • v.7 no.6
    • /
    • pp.638-654
    • /
    • 2023
  • Holography is generally known as a technology that records and reconstructs 3D images by simultaneously capturing the intensity and phase information of light. Two or more interfering beams and illumination of this interference pattern onto a photosensitive recording medium allow us to control both the intensity and phase of light. Holography has found widespread applications not only in 3D imaging but also in manufacturing. In fact, it has been commonly used in semiconductor manufacturing, where interference light patterns are applied to photolithography, effectively reducing the half-pitch and period of line patterns, and enhancing the resolution of lithography. Moreover, holography can be used for the manufacturing of 3D regular structures (3D photonic crystals), not just surface patterns such as 1D or 2D gratings, and this can be broadly divided into (i) holographic recording and (ii) holographic lithography. In this review, we conceptually contrast two seemingly similar but fundamentally different manufacturing methods: holographic recording and holographic lithography. We comprehensively describe the differences in the manufacturing processes and the resulting structural features, as well as elucidate the distinctions in the diffractive optical properties that can be derived from them. Lastly, we aim to summarize the unique perspectives through which each method can appear distinct, with the intention of sharing information about this field with both experts and non-experts alike.

Compact Design and Fabrication of 'Improved QS-MMI' Demultiplexer (Improved QS-MMI' 1.31/1.55μm 파장분리기의 최적화 설계 및 제작)

  • Kim, Nam-Kook;Kim, Jang-Kyum;Choi, Chul-Hyun;O, Beom-Hoan;Lee, Seung-Gol;Park, Se-Gun;Lee, El-Hang
    • Korean Journal of Optics and Photonics
    • /
    • v.16 no.3
    • /
    • pp.248-253
    • /
    • 2005
  • We designed and fabricated a compact multi-mode interference (MMI) wavelength demultiplexer using the concept of 'Improved Quasi-State' modes. The output power and extinction ratio were improved by utilizing modal phase error which is specially occurred in low-index contrast. For a designed demultiplexer, the mode propagation analysis with effective index approximation shows significant improvement of extinction ratio to -25 dB for both $1.31{\mu}m\;and\;1.51{\mu}m$ wavelength region and the split-length was reduced about 1/5 of other MMI devices. The fabricated device shows successful characteristics for both 1.31 and $1.55{\mu}m$ wavelengths. These results demonstrate the potential of low-index materials system and the embossing process for photonic integrated circuits.

Non-ablative Fractional Thulium Laser Irradiation Suppresses Early Tumor Growth

  • Yoo, Su Woong;Park, Hee-Jin;Oh, Gyungseok;Hwang, Soonjoo;Yun, Misun;Wang, Taejun;Seo, Young-Seok;Min, Jung-Joon;Kim, Ki Hean;Kim, Eung-Sam;Kim, Young L.;Chung, Euiheon
    • Current Optics and Photonics
    • /
    • v.1 no.1
    • /
    • pp.51-59
    • /
    • 2017
  • In addition to its typical use for skin rejuvenation, fractional laser irradiation of early cancerous lesions may reduce the risk of tumor development as a byproduct of wound healing in the stroma after the controlled injury. While fractional ablative lasers are commonly used for cosmetic/aesthetic purposes (e.g., photorejuvenation, hair removal, and scar reduction), we propose a novel use of such laser treatments as a stromal treatment to delay tumorigenesis and suppress carcinogenesis. In this study, we found that non-ablative fractional laser (NAFL) irradiation may have a possible suppressive effect on early tumor growth in syngeneic mouse tumor models. We included two syngeneic mouse tumor models in irradiation groups and control groups. In the irradiation group, a thulium fiber based NAFL at 1927 nm was used to irradiate the skin area including the tumor injection region with 70 mJ/spot, while no laser irradiation was applied to the control group. Numerical simulation with the same experimental condition showed that thermal damage was confined only to the irradiation spots, sparing the adjacent tissue area. The irradiation groups of both tumor models showed smaller tumor volumes than the control group at an early tumor growth stage. We also detected elevated inflammatory cytokine levels a day after the NAFL irradiation. NAFL treatment of the stromal tissue could potentially be an alternative anticancer therapeutic modality for early tumorigenesis in a minimally invasive manner.

Adiabatic Optical-fiber Tapers for Efficient Light Coupling between Silicon Waveguides and Optical Fibers (실리콘 도파로와 광섬유 사이의 효율적인 광 결합을 위한 아디아바틱 광섬유 테이퍼)

  • Son, Gyeongho;Choi, Jiwon;Jeong, Youngjae;Yu, Kyoungsik
    • Korean Journal of Optics and Photonics
    • /
    • v.31 no.5
    • /
    • pp.213-217
    • /
    • 2020
  • In this study we report a wet-etching-based fabrication method for adiabatic optical-fiber tapers (OFTs), and describe their adiabaticity and HE11 mode evolution at a wavelength of 1550 nm. The profile of the fabricated system satisfies the adiabaticity properties well, and the far-field pattern from the etched OFT shows that the fundamental HE11 mode is maintained without a higher-order mode coupling throughout the tapers. In addition, the measured far-field pattern agrees well with the simulated result. The proposed adiabatic OFTs can be applied to a number of photonic applications, especially fiber-chip packages. Based on the fabricated adiabatic OFT structures, the optical transmission to the inversely tapered silicon waveguide shows large spatial-dimensional tolerances for 1 dB excess loss of ~60 ㎛ (silicon waveguide angle of 1°) and insertion loss of less than 0.4 dB (silicon waveguide angle of 4°), from the numerical simulation. The proposed adiabatic coupler shows the ultrabroadband coupling efficiency over the O- and C-bands.

A Study on Users' Resistance toward ERP in the Pre-adoption Context (ERP 도입 전 구성원의 저항)

  • Park, Jae-Sung;Cho, Yong-Soo;Koh, Joon
    • Asia pacific journal of information systems
    • /
    • v.19 no.4
    • /
    • pp.77-100
    • /
    • 2009
  • Information Systems (IS) is an essential tool for any organizations. The last decade has seen an increasing body of knowledge on IS usage. Yet, IS often fails because of its misuse or non-use. In general, decisions regarding the selection of a system, which involve the evaluation of many IS vendors and an enormous initial investment, are made not through the consensus of employees but through the top-down decision making by top managers. In situations where the selected system does not satisfy the needs of the employees, the forced use of the selected IS will only result in their resistance to it. Many organizations have been either integrating dispersed legacy systems such as archipelago or adopting a new ERP (Enterprise Resource Planning) system to enhance employee efficiency. This study examines user resistance prior to the adoption of the selected IS or ERP system. As such, this study identifies the importance of managing organizational resistance that may appear in the pre-adoption context of an integrated IS or ERP system, explores key factors influencing user resistance, and investigates how prior experience with other integrated IS or ERP systems may change the relationship between the affecting factors and user resistance. This study focuses on organizational members' resistance and the affecting factors in the pre-adoption context of an integrated IS or ERP system rather than in the context of an ERP adoption itself or ERP post-adoption. Based on prior literature, this study proposes a research model that considers six key variables, including perceived benefit, system complexity, fitness with existing tasks, attitude toward change, the psychological reactance trait, and perceived IT competence. They are considered as independent variables affecting user resistance toward an integrated IS or ERP system. This study also introduces the concept of prior experience (i.e., whether a user has prior experience with an integrated IS or ERP system) as a moderating variable to examine the impact of perceived benefit and attitude toward change in user resistance. As such, we propose eight hypotheses with respect to the model. For the empirical validation of the hypotheses, we developed relevant instruments for each research variable based on prior literature and surveyed 95 professional researchers and the administrative staff of the Korea Photonics Technology Institute (KOPTI). We examined the organizational characteristics of KOPTI, the reasons behind their adoption of an ERP system, process changes caused by the introduction of the system, and employees' resistance/attitude toward the system at the time of the introduction. The results of the multiple regression analysis suggest that, among the six variables, perceived benefit, complexity, attitude toward change, and the psychological reactance trait significantly influence user resistance. These results further suggest that top management should manage the psychological states of their employees in order to minimize their resistance to the forced IS, even in the new system pre-adoption context. In addition, the moderating variable-prior experience was found to change the strength of the relationship between attitude toward change and system resistance. That is, the effect of attitude toward change in user resistance was significantly stronger in those with prior experience than those with no prior experience. This result implies that those with prior experience should be identified and provided with some type of attitude training or change management programs to minimize their resistance to the adoption of a system. This study contributes to the IS field by providing practical implications for IS practitioners. This study identifies system resistance stimuli of users, focusing on the pre-adoption context in a forced ERP system environment. We have empirically validated the proposed research model by examining several significant factors affecting user resistance against the adoption of an ERP system. In particular, we find a clear and significant role of the moderating variable, prior ERP usage experience, in the relationship between the affecting factors and user resistance. The results of the study suggest the importance of appropriately managing the factors that affect user resistance in organizations that plan to introduce a new ERP system or integrate legacy systems. Moreover, this study offers to practitioners several specific strategies (in particular, the categorization of users by their prior usage experience) for alleviating the resistant behaviors of users in the process of the ERP adoption before a system becomes available to them. Despite the valuable contributions of this study, there are also some limitations which will be discussed in this paper to make the study more complete and consistent.

Development of Indocyanine Green and 5-Aminolevulinic Acid Detection System for Surgical Microscope (수술현미경용 다중형광 관측 시스템 연구)

  • Kim, Hong Rae;Lee, Hyun Min;Yoon, Woong Bae;Kim, Young Jae;Kim, Seok Ki;Yoo, Heon;Joo, Jae Young;Kim, Kwang Gi;Lee, Seung-Hoon
    • Journal of Biomedical Engineering Research
    • /
    • v.36 no.1
    • /
    • pp.16-21
    • /
    • 2015
  • Indocyanine green(ICG) and 5-aminolevulinic acid(5-ALA) have been widely used to mark blood vessels or tumors. However, fluorescent dye detection systems were designed to use one type of dyes only. In this study, we proposed a detection system capable of detecting Indocyanine green and 5-aminolevulinic acid. Multiple filters and light sources are integrated into a single system. In this study, we performed analysis of fluorescent dyes and configured a detection system. During the analysis, it was found that Indocyanine green and 5-aminolevulinic acid have the maximum intensity at $40{\mu}M$. We designed light source for fluorescent dyes and conducted compatibility test using a commercial surgical microscope. The fluorescent dye detection system was configured based on the experimental results. The developed system successfully detects Indocyanine green and 5-aminolevulinic acid. Therefore, more efficient surgical operations can be achieved using both fluorescent dyes at the same time. We expect that the developed system can increase the survival rate of patients.

1.55 μm polarization mode splitter utilizing two mode interference of Ti:LiNbO3 optical waveguides (1.55 μm Ti:LiNbO3 광도파로의 두 모드 간섭을 이용한 편광모드 분리기)

  • 김정희;정기조;정홍식;이한영
    • Korean Journal of Optics and Photonics
    • /
    • v.13 no.1
    • /
    • pp.32-37
    • /
    • 2002
  • Passive polarization mode splitters at λ= 1.55 ${\mu}{\textrm}{m}$ were designed and fabricated based on Ti:x-cut LiNbO$_3$ single-mode optical waveguide and two-mode interference theory. The splitting ratio with waveguide width 8 ${\mu}{\textrm}{m}$, branching angle 0.55$^{\circ}$ and interfering length 470 ${\mu}{\textrm}{m}$ showed 16.18 dB, 21.25 dB for TE and TM input polarization modes, respectively. Polarization cross-talk of -16.28 dB and -21.28 dB for TE and TM modes was achieved. Total insertion losses of 2.24 dB/cm (TE) and 2.41 dB/cm (TM) were also measured. The devices operated nearly wavelength independently over a range or 30 nm.

Point-diffraction interferometer for 3-D profile measurement of light scattering rough surfaces (광산란 거친표면의 고정밀 삼차원 형상 측정을 위한 점회절 간섭계)

  • 김병창;이호재;김승우
    • Korean Journal of Optics and Photonics
    • /
    • v.14 no.5
    • /
    • pp.504-508
    • /
    • 2003
  • We present a new point-diffraction interferometer, which has been devised for the three-dimensional profile measurement of light scattering rough surfaces. The interferometer system has multiple sources of two-point-diffraction and a CCD camera composed of an array of two-dimensional photodetectors. Each diffraction source is an independent two-point-diffraction interferometer made of a pair of single-mode optical fibers, which are housed in a ceramic ferrule to emit two spherical wave fronts by means of diffraction at their free ends. The two spherical wave fronts then interfere with each other and subsequently generate a unique fringe pattern on the test surface. A He-Ne source provides coherent light to the two fibers through a 2${\times}$l optical coupler, and one of the fibers is elongated by use of a piezoelectric tube to produce phase shifting. The xyz coordinates of the target surface are determined by fitting the measured phase data into a global model of multilateration. Measurement has been performed for the warpage inspection of chip scale packages (CSPs) that are tape-mounted on ball grid arrays (BGAs) and backside profile of a silicon wafer in the middle of integrated-circuit fabrication process. When a diagonal profile is measured across the wafer, the maximum discrepancy turns out to be 5.6 ${\mu}{\textrm}{m}$ with a standard deviation of 1.5 ${\mu}{\textrm}{m}$.