Inductively coupled plasma reactive ion etching of ZnO using C2F6 gas
(($C_2F_6$ 유도결합플라즈마(ICP)를 이용한 산화아연(ZnO) 식각에 관한 연구)
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- Proceedings of the Materials Research Society of Korea Conference
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- 2005.05a
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- pp.229-229
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- 2005