Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2005.05a
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- Pages.229-229
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- 2005
Inductively coupled plasma reactive ion etching of ZnO using C2F6 gas
($C_2F_6$ 유도결합플라즈마(ICP)를 이용한 산화아연(ZnO) 식각에 관한 연구
- Published : 2005.05.26
Abstract
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