• Journal of the Korean Crystal Growth and Crystal Technology
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• v.30 no.6
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• pp.220-225
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• 2020

Gallium oxide nano-powder, the key starting material for IGZO target, is fabricated by gas phase synthesis using a new apparatus consist of reaction, transportation, and collection parts. As a result of gallium metal evaporation above 1150℃, Ga2O3 nano-powders, are successfully synthesized. The SEM images of the synthesized powders displace the spherical shaped powders without severe agglomeration. X-ray diffraction and PSA analysis show that the higher temperature at the reaction part results in the better crystallinity and larger powder size of the synthesized Ga2O3. To see the applicability to IGZO target, Ga2O3 nano-powders synthesized at 1250℃ are mixed with indium oxide and zinc oxide (In2O3 : Ga2O3 : ZnO = 1 : 1 : 1), and then sintered at 1400~1500℃. The highest sintered density of 5.83 g/㎤ (= 91 % of relative density) is achieved when sintered at 1450℃, showing better sinterability compared to the commercially available Ga2O3 powder, which has 5.61 g/㎤ of sintered density at the same condition.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.3
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• pp.308-310
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• 2022

Ultrawide bandgap gallium oxide (Ga₂O₃) semiconductors are known to have excellent photocatalytic properties due to their high redox potential. In this study, CO₂ reduction is demonstrated using nanostructured Ga₂O₃ photocatalyst under ultraviolet (254 nm) light source conditions. After the CO₂ reduction, C₂H₄ remained as a by-product in this work. Nanostructured Ga₂O₃ photocatalyst also showed an excellent endurance characteristic. Photogenerated electron-hole pairs boosted the CO₂ reduction to C₂H₄ via nanostructured Ga₂O₃ photocatalyst, which is attributed to the ultrawide and almost direct bandgap characteristics of the gallium oxide semiconductor. The findings in this work could expedite the realization of CO₂ reduction and a simultaneous C₂H₄ production using a low cost and high performance photocatalyst.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.169.1-169.1
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• 2015

최근 디스플레이 기술은 급속도로 발전해 가고 있다. 디스플레이 산업의 눈부신 성장에 발맞추어 초고화질, 초고선명, 고속 구동 및 대형화 등을 포함하는 최신 기술의 디스플레이 구동이 필요하다. 이러한 요구사항을 만족하기 위해서는 각 픽셀에 영상정보를 기입하는 충전시간을 급격히 감소시켜야 하고 따라서 픽셀 트랜지스터(TFT)의 이동도는 급격히 증가해야 한다. 따라서 차세대 디스플레이 실현을 위해서 고이동도 특성을 구현 할 수 있는 신물질의 개발이 매우 중요하다. 현재 산화물박막트랜지스터는 차세대 디스플레이 실현을 위해 가장 주목받고 있으며, 실제로 산화물박막 트랜지스터의 핵심소재인 In-Ga-Zn-O(a-IGZO) 산화물의 경우 국내외에서 디스플레이에 적용되어 생산이 시작되고있다. 그러나 a-IGZO 산화물의 경우 이동도가 $5-10cm^2V{\cdot}s$ 수준이어서 향후 개발 되어질 초고해상도/고속구동 디스플레이 실현(이동도 $50cm^2V{\cdot}s$)에는 한계가 있다. 따라서 본 연구에서는 이를 해결 할 수 있는 'post-IGZO' 개발을 위해 In2O3에 Ga2O3를 조성별로 고용시켜 박막의 구조적, 전기적, 광학적 특성 및 TFT를 제작하여 특성 연구를 진행하였다. 조성은 In2O3에 Ga2O3를 7.5%~15% 도핑 하였으며, Sputtering을 이용하여 indium gallium oxide(IGO) 박막을 제작하였다. 박막은 상온 및 $300^{\circ}C$에서 증착 하였으며 증착 된 IGO 박막은 Ga=12.5% 까지는 In2O3에 Ga이 모두 고용되어 cubic In2O3 poly crystalline을 나타내는 것을 확인하였으며 Ga=15%에서 Gallium 관련 2차상이 확인되었다. Ga양이 변화함에 따라 박막의 전기적 특성이 조절 가능하였으며 이를 이용하여 IGO 박막을 30 nm 두께로 증착 하여 IGO 박막을 channel layer로 사용하는 bottom gate structured TFTs를 제작 하였다. IGO TFTs는 Ga=10%에서 on/off ratio ${\sim}10^8$, 그리고 field-effect mobility $84.8cm^2/V{\cdot}S$를 나타내며 초고화질, 초고선명 차세대 디스플레이 적용 가능성을 보여 준다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.1
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• pp.8-14
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• 2014

In this study, we investigated synthesis and characteristics of gallium oxide ($Ga_2O_3$) powders prepared by precipitation method. $Ga_2O_3$ powders were synthesized using $Ga(NO_3)_3$ as a starting material and $NH_4OH$ as a precipitant. The oxidation temperature of $Ga(OH)_3$ and phase transition temperature of $Ga_2O_3$ was revealed using TG-DSC analysis. The crystal structural change of $Ga_2O_3$ powders was investigated by XRD analysis. The morphologies and size distributions of $Ga_2O_3$ particles were analyzed using SEM.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.6
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• pp.626-630
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• 2022

A 100 mm × 50 mm-sized (100) gallium oxide (Ga₂O₃) single crystal ingot was successfully grown by edge-defined film-fed growth (EFG). The preferred orientation and the quality of grown Ga₂O₃ ingot were compatible with a commercial Ga₂O₃ substrate by showing strong (100) orientation behaviors and 246 arcsec in X-ray rocking curve. Raman characterization was also performed for both samples; thereby providing various Raman-active characteristics of Ga₂O₃ crystals. In particular, we observed A_g(5) and A_g(10) peaks of Raman active mode, directly related to the impurity of the grown Ga₂O₃ crystal. Hence, the comparison of the crystal quality and Raman analysis might be useful for further enhancement of Ga₂O₃ single crystal quality in the future.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.32 no.4
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• pp.121-127
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• 2022

β-Gallium oxide (Ga₂O₃), an ultra-wide bandgap semiconductor, has attracted great attention due to its promising applications for high voltage power devices. The most stable phase among five different polytypes, β-Ga₂O₃ has the wider bandgap of 4.9 eV and higher breakdown electric field of 8 MV/cm. Furthermore, it can be grown from melt source, implying higher growth rate and lower fabrication cost than other wide bandgap semiconductors such as SiC, GaN and diamond for the power device applications. In this study, β-Ga₂O₃ bulk crystals were grown by the edge-defined film-fed growth (EFG) process. The growth direction and the principal surface were set to be the [010] direction and the (100) plane of the β-Ga₂O₃ crystal, respectively. The spectra measured by Raman an alysis could exhibit the crystal phase an d impurity dopin g in the β-Ga₂O₃ ingot, and the crystallinity quality and crystal direction were analyzed using high-resolution X-ray diffraction (HRXRD). The crystal quality and various properties of as-grown β-Ga₂O₃ ribbon was systematically analyzed in order to investigate the spatial variation in entire crystal grown by EFG method.

• Journal of the Korean Electrochemical Society
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• v.12 no.2
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• pp.189-195
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• 2009

$\beta-Ga_{2}O_{3}$ nanorods were synthesized by chemical vapor deposition method using nickel-oxide nanoparticle as a catalyst and gallium metal powder as a source material. The average diameter of nanorods was around 160 nm and the average length was $4{\mu}m$. Also, we confirmed that the synthesis of nanorods follows the vapor-solid growth mechanism. From the results of X-ray diffraction and HR-TEM observation, it can be found that the synthesized nanorods consisted of a typical core-shell structure with single-crystalline $\beta-Ga_{2}O_{3}$ core with a monoclinic crystal structure and an outer amorphous gallium oxide layer. Li/$\beta-Ga_{2}O_{3}$ nanorods cell delivered capacity of 867 mAh/g-$\beta-Ga_{2}O_{3}$ at first discharge. Although the Li/$\beta-Ga_{2}O_{3}$ nanorods cell showed low coulombic efficiency at first cycle, the cell exhibited stable cycle life property after fifth cycle.

• Journal of the Korean Society for Heat Treatment
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• v.35 no.2
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• pp.51-56
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• 2022

In this study, we controlled the shape of a carbon layer on gallium oxide templates. Gallium oxide layers were deposited on sapphire substrates using mist chemical vapor deposition. Subsequently, carbon layers were formed using radio frequency plasma chemical vapor deposition. Various shapes of carbon structures appeared according to the fraction of methane gas, used as a precursor. As methane gas concentration was adjusted from 1 to 100%, The shapes of carbon structures varied to diamonds, nanowalls, and spheres. The growth of carbon isotope structures on Ga₂O₃ templates will give rise to improving the electrical and thermal properties in the next-generation electronic applications.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.120-120
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• 2003

The metallic oxide nanomaterials including ZnO, Ga$_2$O$_3$, TiO$_2$, and SnO$_2$ have been synthesized by a number of methods including laser ablation, arc discharge, thermal annealing procedure, catalytic growth processes, and vapor transport. We have been interested in preparing the nanomaterials of Ga$_2$O$_3$, which is a wide band gap semiconductor (E$_{g}$ =4.9 eV) and used as insulating oxide layer for all gallium-based semiconductor. Ga$_2$O$_3$ is stable at high temperature and a transparent oxide, which has potential application in optoelectronic devices. The Ga$_2$O$_3$ nanoparticles and nanobelts were produced using GaN single crystals, which were grown by flux method inside SUS$^{TM}$ cell using a Na flux and exhibit plate-like morphologies with 4 ~ 5 mm in size. In these experiments, the conventional electric furnace was used. GaN single crystals were pulverized in form of powder for the growth of Ga$_2$O$_3$ nanomaterials. The structure, morphology and composition of the products were studied mainly by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and high-resolution transmission electron microscopy (HRTEM).).

• Electronics and Telecommunications Trends
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• v.33 no.6
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• pp.12-23
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• 2018

In this paper, we review the technical trends of diamond and gallium oxide ($Ga_2O_3$) semiconductor technologies among ultra-wide bandgap semiconductor technologies for harsh environments. Diamond exhibits some of the most extreme physical properties such as a wide bandgap, high breakdown field, high electron mobility, and high thermal conductivity, yet its practical use in harsh environments has been limited owing to its scarcity, expense, and small-sized substrate. In addition, the difficulty of n-type doping through ion implantation into diamond is an obstacle to the normally-off operation of transistors. $Ga_2O_3$ also has material properties such as a wide bandgap, high breakdown field, and high working temperature superior to that of silicon, gallium arsenide, gallium nitride, silicon carbide, and so on. In addition, $Ga_2O_3$ bulk crystal growth has developed dramatically. Although the bulk growth is still relatively immature, a 2-inch substrate can already be purchased, whereas 4- and 6-inch substrates are currently under development. Owing to the rapid development of $Ga_2O_3$ bulk and epitaxy growth, device results have quickly followed. We look briefly into diamond and $Ga_2O_3$ semiconductor devices and epitaxy results that can be applied to harsh environments.