• Proceedings of the IEEK Conference
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• 2000.11b
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• pp.17-20
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• 2000

We have enhanced the yield of 0.25 ${\mu}{\textrm}{m}$ T-gate $Al_{0.25}$G $a_{0.75}$As/I $n_{0.2}$G $a_{0.8}$As P-HEMT using three-layer E-beam lithography process and selective etching process. The three-layer resist structure (PMMA/copolymer/ PMMA=2000 $\AA$/3000 $\AA$/2000 $\AA$) and three developers (Benzene：IPA=1：1,Methanol：IPA =1：1,MIBK：IPA=1：3) were used for fabrication of a wide-head T-gate by the conventional double E-beam exposure technology. Also 1 wt% citric acid： $H_2O$$_2$：N $H_{4}$OH(200m1：4ml：2.2ml) solution were used for uniform gate recess. The etching selectivity of GaAs over $Al_{0.25}$G $a_{0.75}$As is measured to be 80. So these P-HEMT processes can be used in X-band MMIC LNA fabrication.ion.ion.ion.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.24 no.11
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• pp.1081-1090
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• 2013

In this paper, a C-band 10 W power amplifier with internally matched input and output matching circuit is designed and fabricated. The used power transistor for the power amplifier is GaAs pHEMT bare-chip. The wire bonding analysis considering the size of the capacitor and the position of transistor pad improves the accurate design. The matching circuit design with the package effect using EM simulation is performed. To reduce the unsymmetry of IMD3 in 2-tone measurement due to the memory effect, the bias circuit minimizing the memory effect is proposed and employed. The measured $P_{1dB}$, power gain, and power added efficiency are 39.8~40.4 dBm, 9.7~10.4 dB, and 33.4~38.0 %, respectively. Adopting the proposed bias circuit, the difference between the upper and lower IMD3 is less than 0.76 dB.

• JSTS:Journal of Semiconductor Technology and Science
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• v.6 no.3
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• pp.136-145
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• 2006

Two major processing technologies of GaAs HBT and pHEMT have been released in production at Win Semiconductors corp. to address the strong demands of power amplifiers and switches for both handset and WLAN communications markets. Excellent performance with low processing cost and die shrinkage features is reported from the manufactured MMICs. With the stringent tighter manufacturing quality control WIN has successfully become one of the major pure open foundry house to serve the communication industries. The advancing of both technologies to include E/D-pHEMTs and BiHEMTs likes for multifunctional integration of PA, LNA, switch and logics is also highlighted.

• JSTS:Journal of Semiconductor Technology and Science
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• v.13 no.4
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• pp.342-354
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• 2013

The aim of this work is to investigate and study the quantum effects in the modeling of nanoscale symmetric double-gate InAlAs/InGaAs/InP HEMT (High Electron Mobility Transistor). In order to do so, the carrier concentration in InGaAs channel at gate lengths ($L_g$) 100 nm and 50 nm, are modelled by a density gradient model or quantum moments model. The simulated results obtained from the quantum moments model are compared with the available experimental results to show the accuracy and also with a semi-classical model to show the need for quantum modeling. Quantum modeling shows major variation in electron concentration profiles and affects the device characteristics. The two triangular quantum wells predicted by the semi-classical model seem to vanish in the quantum model as bulk inversion takes place. The quantum effects thus become essential to incorporate in nanoscale heterostructure device modeling.

• Proceedings of the Korean Vacuum Society Conference
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• 2008.02a
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• pp.117-117
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• 2008

• Proceedings of the Korean Magnestics Society Conference
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• 2007.12a
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• pp.102-102
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• 2007

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.476-477
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• 2013

반도체의 성능은 최근 10년 사이에 급격하게 발전했고 아날로그 및 디지털 회로 소자들에 있어 저전력/고속 특성 요구가 커지고 있다 [1]. 상온에서 30,000 $cm^2$/Vs 이상의 전자 이동도를 가지며 큰 conduction band offset을 갖는 InAs/AlSb 2차원전자가스(2DEG) 소자는 Spinorbit-interaction의 값이 매우 커서 SPIN-FET 소자로 크게 주목받고 있다 [2]. 본 발표자들은 GaAs 기판위에 성장한 InAs 2DEG HEMT 소자의 전/자기적인 특성과 고속반응 물질로 주목 받는 InSb 박막소자의 doping 특성에 따른 전기적/물리적인 특성의 평가에 대해 그 결과를 소개하고자 한다. 격자정합과 Semi-insulating 기판의 부재로 상용화되어 있는 GaAs와 InP 기판위에 물질차이에 따른 고유의 한계 특성을 줄이기 위한 Pseudomorphic이라 불리는 특별한 박막 성장 기법을 적용하여 높은 전자 이동도를 가지며 spin length가 길어 Spin-FET로서 크게 주목받고 있는 InAs 2DEG HEMT 소자를 완성시켰다. 60,000 ($cm^2$/Vs) 이상의 높은 전자 이동도를 갖는 소자의 구현을 목표로 연구를 진행하였으며 1.8 K에서 측정된 Spin-orbit interaction의 값은 6.3e-12 (eVm)이다. InAs/InGaAs/InAlAs 및 InGaAs/InAlAs 구조의 InP 기반의 소자에서 보다 큰 값으로 향후 Spin-FET 응용에 크게 기대하고 있다. 또한, GaAs 기판위에 구현된 InSb 소자는 격자부정합 감소를 위해 InAs 양자점을 사용하여 약 $2.6{\mu}m$ 두께로 구현된 InSb 박막 소자는 상온에서 약 60,400 ($cm^2$/Vs)의 상온 전자이동도를 보였으며 현재 동일 두께에서 세계 최고결과(~50,000 $cm^2$/Vs)에 비해 월등하게 높은 값을 보이고 있다. Hall bar pattern 공정을 거쳐 완성된 소자는 측정 결과 10~20% 이상 향상된 전자 이동도를 보였다. 2e18/$cm^3$ 미만의 p-doping의 경우, 상온에서 n-type 특성을 보이나, 저온에서 p-type으로 변하는 특성을 보였고 n-doping의 경우 5e17/$cm^3$까지는 전자 이동도만 감소하고, doping에 의한 효과는 크게 없었다. 1e18/$cm^3$의 높은 doping을 할 경우 carrier가 증가하는 것을 확인했다. 이상의 측정 결과로 Spin-FET 소자로서 아주 우수하다는 것을 확인할 수 있었고 n-/p- type이 특성을 고려한 high quality InSb 박막소자의 응용을 위한 중요한 정보를 얻을 수 있었다.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.21 no.3
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• pp.29-34
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• 2021

For the purpose of Application to the small radar sensor, the MMIC Chips, which are the core component of the W-band, was designed in Korea according to the characteristics of the transceiver and manufactured by 60nm GaN and 0.1㎛ GaAs pHEMT process. The output power of PA is 28 dBm at center frequency of W-band and Noise figure is 6.7 dB of switch and LNA MMIC. Output power and Noise figure of MMIC chips developed in domestic was applied to the transmitter and receiver module through W-band waveguide low loss transition structure design and impedance matching to verify the performance after the fabrication are 26.1~27.7 dBm and 7.85~10.57 dB including thermal testing, and which are close to the analysis result. As a result, these are judged that the PA and Switch and LNA MMICs can be applied to the small radar sensor.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.18 no.6
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• pp.195-200
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• 2018

A W-band frequency octupler is implemented on 100-nm GaAs pHEMT process. The fabricated octupler can be used as a local oscillator or a signal source of W-band transceivers. Three common-source doublers are connected in cascade to multiply an input signal of 10.75 GHz to 83 GHz. A common-source amplifier is followed for each doubler to improve the conversion gain and suppress the unwanted harmonics. The fabricated octupler showes high output of more than 6 dBm in the 80 - 84 GHz band and achieved excellent spurious suppression performance over 20 dBc.

• Proceedings of the Korean Vacuum Society Conference
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• 1996.02a
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• pp.28-29
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• 1996