• 제목/요약/키워드: GATE simulation

검색결과 956건 처리시간 0.037초

스위칭 손실을 줄인 1700 V 4H-SiC Double Trench MOSFET 구조 (A Novel 1700V 4H-SiC Double Trench MOSFET Structure for Low Switching Loss)

  • 나재엽;정항산;김광수
    • 전기전자학회논문지
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    • 제25권1호
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    • pp.15-24
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    • 2021
  • 본 논문에서는 CDT(Conventional Double Trench) MOSFET보다 스위칭 시간과 손실이 적은 1700 V EPDT(Extended P+ shielding floating gate Double Trench) MOSFET 구조를 제안하였다. 제안한 EPDT MOSFET 구조는 CDT MOSFET에서 소스 Trench의 P+ shielding 영역을 늘리고 게이트를 N+와 플로팅 P- 폴리실리콘 게이트로 나누었다. Sentaurus TCAD 시뮬레이션을 통해 두 구조를 비교한 결과 온 저항은 거의 차이가 없었으나 Crss(게이트-드레인 간 커패시턴스)는 게이트에 0 V 인가 시에는 CDT MOSFET 대비 32.54 % 줄었고 7 V 인가 시에는 65.5 % 감소하였다. 결과적으로 스위칭 시간 및 손실은 각각 45 %, 32.6 % 줄어 스위칭 특성이 크게 개선되었다.

치수능력 증대에 따른 저수지시스템 분석 (Analysis of Small reservoir system by Flood control ability augmentation)

  • 박기범;이순탁
    • 한국환경과학회지
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    • 제14권11호
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    • pp.995-1004
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    • 2005
  • As a research establish reservoir safety operation for small dam systems. This study presents hydrologic analysis conducted in the Duckdong and Bomun dam watershed based on various rainfall data and increase inflow. Especially the Duckdong dam without flood control feature are widely exposed to the risk of flooding, thus it is constructed emergency gate at present. In this study reservoir routing program was simulation for basin runoff estimating using HEC-HMS model, the model simulation the reservoir condition of emergency Sate with and without. At the reservoir analysis results is the Duckdong dam average storage decrease $20\%$ with emergency gate than without emergency gate. Also, the Bomun dam is not affected by the Duckdong flood control augmentation.

사출성형 설계에서 캐비티 충전 균형을 위한 수지 주입구의 최적 위치 결정에 관한 연구 (A Study on Determining Optimal Gate Positions for Cavity Fill-Uniformity in Injection Molding Design)

  • 박종천;성영규
    • 한국기계가공학회지
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    • 제9권6호
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    • pp.21-28
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    • 2010
  • This study shows an optimization procedure for an automatic determination on the gate position to ensure the fill-uniformity within a part cavity by using the injection molding simulation. For an optimization, the maximum pressure-difference within a part cavity induced at the stage of filling is used to evaluate degree of fill-uniformity. In addition, a direct search scheme based on the reduction of design space is developed and applied in the optimization problem. This corresponding proposed methodology was applied in the optimization on the gate location for a CD-tray molding, as a result, showed the improvement of the fill-uniformity within the cavity.

대면적 고화질의 TFT-LCD 화소 설계 최적화 및 어레이 시뮬레이션 특성 (Array Simulation Characteristics and TFT-LCD Pixel Design Optimization for Large Size, High Quality Display)

  • 이영삼;윤영준;정순신;최종선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 추계학술대회 논문집
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    • pp.137-140
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    • 1998
  • An active-matrix LCD using thin film transistors (TFT) has been widely recognized as having potential for high-quality color flat-panel displays. Pixel-Design Array Simulation Tool (PDAST) was used to profoundly understand the gate si후미 distortion and pixel charging capability. which are the most critical limiting factors for high-quality TFT-LCDs. Since PDAST can simulate the gate, data and pixel voltages of a certain pixel on TFT array at any time and at any location on an array, the effect of the resistivity of gate line material on the pixel operations can be effectively analyzed. The gate signal delay, pixel charging ratio and level-shift of the pixel voltage were simulated with varying the parameters. The information obtained from this study could be utilized to design the larger area and finer image quality panel.

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설계 및 공정 변수에 따른 600 V급 IGBT의 전기적 특성 분석 (Analysis of The Electrical Characteristics of Power IGBT According to Design and Process Parameter)

  • 강이구
    • 한국전기전자재료학회논문지
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    • 제29권5호
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    • pp.263-267
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    • 2016
  • In this paper, we analyzed the electrical characteristics of NPT planar and trench gate IGBT after designing these devices according to design and process parameter. To begin with, we have designed NPT planar gate IGBT and carried out simulation with T-CAD. Therefore, we extracted design and process parameter and obtained optimal electrical characteristics. The breakdown voltage was 724 V and The on state voltage drop was 1.746 V. The next was carried out optimal design of trench gate power IGBT. We did this research by same drift thickness and resistivity of planar gate power IGBT. As a result of experiment, we obtain 720 V breakdown voltage, 1.32 V on state voltage drop and 4.077 V threshold voltage. These results were improved performance and fabrication of trench gate power IGBT and planar gate Power IGBT.

이중게이트 구조의 Junctionless FET 의 성능 개선에 대한 연구 (Development of Gate Structure in Junctionless Double Gate Field Effect Transistors)

  • 조일환;서동선
    • 전기전자학회논문지
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    • 제19권4호
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    • pp.514-519
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    • 2015
  • 본 논문에서는 이중 게이트 junctionless MOSFET 의 성능 최적화를 위하여 다중 게이트 형태를 적용하여 평가한다. 금속 게이트들 사이의 일함수가 서로 다르므로 다중 게이트 구조를 적용할 경우 금속게이트 길이에 따라 소스와 드레인 주변의 전위를 조절할 수 있다. 동작 전류와 누설 전류 그리고 동작 전압은 게이트 구조에 의해 조절이 가능하며 이로 인한 동작 특성 최적화가 가능하다. 본 연구에서는 반도체 소자 시뮬레이션을 통하여 junctionless MOSFET 의 최적화를 구현하고 분석하는 연구를 수행 한다.

저전력 분야 응용을 위한 32nm 금속 게이트 전극 MOSFET 소자의 게이트 workfunction 의 최적화 (Gate Workfunction Optimization of a 32 nm Metal Gate MOSFET for Low Power Applications)

  • 오용호;김영민
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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    • pp.1974-1976
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    • 2005
  • The feasibility of a midgap metal gate is investigated for 32nm MOSFET low power applications. The midgap metal gate MOSFET is found to deliver a driving current as high as a bandedge gate one for the low power applications if a proper retrograde channel is used. An adequate design of the retrograde channel is essential to achieve the performance requirement given in ITRS roadmap. In addition, a process simulation is run using halo implants and thermal processes to evaluate the feasibility of the necessary retrograde profile in manufacturing environments. From the thermal budget point of view, the bandedge metal gate MOSFET is more vulnerable to the following thermal process than the midgap metal gate MOSFET since it requires a steeper retrograde doping profile. Based on the results, a guideline for the gate workfunction and the channel profile in the 32 nm MOSFET is proposed.

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게이트 및 기능 레벨 논리 시뮬레이터 (A Gate and Functional Level Logic Simulator)

  • 박홍준;김종성;조순복;신용철;임인칠
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(II)
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    • pp.1577-1580
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    • 1987
  • This paper proposes a gate and functional level logic simulator which can be run on XENIX O.S. The simulator has hierarchical structure including Hardware Description Language compiler, Waveform Description Language compiler, and Simulation Command Language compiler. The Hardware Description Language compiler generates data structure composed of gate structure, wire structure, condition structure, and event structure. Simulation algorithm is composed of selective trace and event-driven methods. To improve simulation speed, Cross Referenced Linked List Structure ia defined in building the data structure of circuits.

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하상오염물 제거에 의한 수질개선효과 수치모델링 (Numerical Simulation of Water Quality Enhancement by Removal of Contaminated Bed Material)

  • 이남주
    • 상하수도학회지
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    • 제25권3호
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    • pp.349-357
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    • 2011
  • This study has an objective to estimate effect on water-quality enhancement by removal of contaminated river-bed material using a two-dimensional numerical modeling in the Seonakdong River, the Pyunggang River and the Maekdo River. RMA2 and RMA4 models were used for flow and contaminant transport simulation, respectively. After the analysis of the effects of flow restoration plan for the Seonakdong River system made by Lee et al (2008), simulation have been performed about scenarios which contains operations of the Daejeo Gate, the Noksan Gate, the Makdo Gate (on planning), and the Noksan Pumping Station. Because there is no option for elution from bed sediment in the RMA4 model, a simple technique has been used for initial condition modification for elution. The analyses revealed that the effect on water quality improvement due to dredging of bed sediment seemed to be less than 10 % of the total effect. The most efficient measure for the water quality improvement of the river system was the linked operation of water-gates and pumping station.

Analytical Surface Potential Model with TCAD Simulation Verification for Evaluation of Surrounding Gate TFET

  • Samuel, T.S. Arun;Balamurugan, N.B.;Niranjana, T.;Samyuktha, B.
    • Journal of Electrical Engineering and Technology
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    • 제9권2호
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    • pp.655-661
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    • 2014
  • In this paper, a new two dimensional (2D) analytical modeling and simulation for a surrounding gate tunnel field effect transistor (TFET) is proposed. The Parabolic approximation technique is used to solve the 2-D Poisson equation with suitable boundary conditions and analytical expressions for surface potential and electric field are derived. This electric field distribution is further used to calculate the tunneling generation rate and thus we numerically extract the tunneling current. The results show a significant improvement in on-current characteristics while short channel effects are greatly reduced. Effectiveness of the proposed model has been confirmed by comparing the analytical results with the TCAD simulation results.