• Title/Summary/Keyword: Electronic device

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A Thermal Model for Electrothermal Simulation of Power Modules

  • Meng, Jinlei;Wen, Xuhui;Zhong, Yulin;Qiu, Zhijie
    • Journal of international Conference on Electrical Machines and Systems
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    • v.2 no.4
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    • pp.441-446
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    • 2013
  • A thermal model of power modules based on the physical dimension and thermal properties is proposed in this paper. The heat path in the power module is considered as a one-dimensional heat transfer in the model. The method of the parameters extraction for the model is given in the paper. With high speed and accuracy, the thermal model is suit for electrothermal simulation. The proposed model is verified by experimental results.

N-Type Carbon-Nanotube MOSFET Device Profile Optimization for Very Large Scale Integration

  • Sun, Yanan;Kursun, Volkan
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.2
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    • pp.43-50
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    • 2011
  • Carbon-nanotube metal oxide semiconductor field effect transistor (CN-MOSFET) is a promising future device candidate. The electrical characteristics of 16 nm N-type CN-MOSFETs are explored in this paper. The optimum N-type CN-MOSFET device profiles with different number of tubes are identified for achieving the highest on-state to off-state current ratio ($I_{on}/I_{off}$). The influence of substrate voltage on device performance is also investigated in this paper. Tradeoffs between subthreshold leakage current and overall switch quality are evaluated with different substrate bias voltages. Technology development guidelines for achieving high-speed, low-leakage, area efficient, and manufacturable carbon nanotube integrated circuits are provided.

Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering

  • Han, Seung Ho;Kang, So Hee;Kim, Hyeongkeun;Yoon, Dae Ho;Yang, Woo Seok
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.23 no.5
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    • pp.224-229
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    • 2013
  • Vanadium oxide thin films were deposited on $c-Al_2O_3$ (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic $VO_2$ phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like $V_2O_5$ grains were changed into round-shape $VO_2$ grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of $VO_2$ thin films was analyzed.

Phenomenological monte carlo simulation model for predicting B, $BF_2$, As, P and Si implant profiles in silicon-based semiconductor device

  • Kwon, Oh-Kuen;Son, Myung-Sik;Hwang, Ho-Jung
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.1
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    • pp.1-9
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    • 1999
  • This paper presents a newly enhanced damage model in Monte Carlo (MC) simulation for the accurate prediction of 3-Dimensional (3D) as-implanted impurity and point defect profiles induced by ion implantation in (100) crystal silicon. An empirical electronic energy loss model for B, BF2, As, P and Si self implant over the wide energy range has been proposed for the ULSI device technology and development. Our model shows very good agreement with the SIMS data over the wide energy range. In the damage accumulation, we considered the self-annealing effects by introducing our proposed non-linear recomvination probability function of each point defect for the computational efficiency. For the damage profiles, we compared the published RBS/channeling data with our results of phosphorus implants. Our damage model shows very reasonable agreement with the experiments for phosphorus implants.

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PRAM Switching Device By Using Current Pulse Modulation

  • Lee, Seong-Hyun;Gil, Gyu-Hyun;Lee, Jung-Min;Song, Yun-Heup
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.384-384
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    • 2012
  • PRAM switching device by using current pulse modulation was investigated to verify its possibility for 3D architecture. In this work, two phase change materials connected in series having a different crystallization temperature are used. Its structural for different phase change material was evaluated by electrical resistance. We confirmed that Germanium-Antimony-Tellurium (GST) alloy and Germanium- Copper-Tellurium (GCT) alloy material were selected according to crystallization temperature, ${\sim}180^{\circ}C$ for switching and ${\sim}240^{\circ}C$ for memory devices, respectively. From this research, it is expected that phase change switching device could have advantages of process in terms of material similarity and structural simplification.

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A Study on the Dielectric Phenomenon of PBDG (PBDG의 유전현상에 관한 연구)

  • Song, Jin-Won;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.362-365
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    • 2002
  • This paper, experiment manufactures device of Metal/Poly-${\gamma}$ Benzyl $_D$-GlutamateOrganic Films/Metal structure using PBDG and I-V properties and C-F properties. The I-V characteristic is measured that approve voltage from 0 to +2[V] of device and the distance between electrode is larger, could know that small current flow and thin film could know that had insulation property. C-F characteristic has each other affinity between the polarization amount and frequency. Permittivity of MIM device could know by dipole that is voluntary polarization of LB film that polarization is happened. The capacitor properties of a thin film is better as the distance between electrodes is smaller.

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Development of spacer formation techni4ue for high-voltage FED application (고 전압 FED용 Spacer형성 기술 개발)

  • Kang, M.S.;Ju, B.K.;Lee, Y.H.;Yu, K.H.;Oh, M.H.
    • Proceedings of the KIEE Conference
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    • 1999.07g
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    • pp.3274-3275
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    • 1999
  • This paper presents a new method of spacer assembly using anodic bonding method which is very simple and clean. The spacer having $100{\mu}m(W){\times}2.1{\mu}m(H)$ was bonded on amorphous silicon film of anode plate. Then, the vertical-type electrode was used for assembling of spacer in high voltage field emission display. In these results, we suggested that the vertical-type electrode provided spacer alignment for high aspect ratio and more simple batch process than conventional method.

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Design of A/D Converter for CMOS Image Sensor (CMOS 이미지 센서를 위한 A/D 변환기의 설계)

  • Paek, K.K.;Ju, B.K.;Shin, K.S.;Lee, Y.S.;Kim, K.S.;Lee, Y.H.;O, M.H.
    • Proceedings of the KIEE Conference
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    • 1999.11c
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    • pp.706-708
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    • 1999
  • In recent years, analog to digital converter is significant component in high frame rate system. But, in the future. as long as minimum line width is reduced, matching between speed and resolution may be worse. In this paper, first-order $\Sigma-\Delta$ analog to digital converter is adopted and designed as its solutions. Hspice simulation is performed, using $0.65{\mu}m$ CMOS 2-poly 2-metal model parameter.

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Low on Resistance Characteristic with 2500V IGBTs (낮은 온-저항 특성을 갖는 2500V급 IGBTs)

  • Shin, Samuell;Son, Jung-Man;Ha, Ka-San;Won, Jong-Il;Jung, Jun-Mo;Koo, Yong-Seo
    • Proceedings of the IEEK Conference
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    • 2008.06a
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    • pp.563-564
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    • 2008
  • This paper presents a new Insulated Gate Bipolar Transistor(IGBT) for power switching device based on Non Punch Through(NPT) IGBT structure. The proposed structure has adding N+ beside the P-base region of the conventional IGBT structure. The proposed device has faster turn-off time and lower forward conduction loss than the conventional IGBT structure.

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