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http://dx.doi.org/10.6111/JKCGCT.2013.23.5.224

Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering  

Han, Seung Ho (Electronic Materials & Device Research Center, Korea Electronics Technology Institute)
Kang, So Hee (Electronic Materials & Device Research Center, Korea Electronics Technology Institute)
Kim, Hyeongkeun (Electronic Materials & Device Research Center, Korea Electronics Technology Institute)
Yoon, Dae Ho (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
Yang, Woo Seok (Electronic Materials & Device Research Center, Korea Electronics Technology Institute)
Abstract
Vanadium oxide thin films were deposited on $c-Al_2O_3$ (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic $VO_2$ phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like $V_2O_5$ grains were changed into round-shape $VO_2$ grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of $VO_2$ thin films was analyzed.
Keywords
$VO_2$; Thermochromic; Optical properties; Crystal structure; Microstructure; Thin Films;
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