• Title/Summary/Keyword: EWMA Control

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A Simulation study of EWMA control using dynamic control parameter (동적 모수를 사용한 EWMA 제어의 시뮬레이션 연구)

  • Kang, Seok-Chan;Hwang, Ji-Bin;Kim, Sung-Shick;Kim, Ji-Hyun
    • Journal of the Korea Society for Simulation
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    • v.16 no.2
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    • pp.37-44
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    • 2007
  • EWMA is one of the most popular controller method used in Run-to-Run control system for semiconductor manufacturing. The value of the control parameter in EWMA has major effect on the result. Therefore, it is important to use control parameter value fitting for the process state. When the process is unstable, it is more efficient to change EWMA control parameter dynamically to compensate for the changing process state than using fixed control parameter. In this paper, we review previous studies using dynamic EWMA control parameter and propose a new algorithm complementing the weaknesses of the previous studies. The performance of the proposed algorithm is validated using simulation.

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Evolution of Performance for Bootstrap EWMA Control Chart under Non-normal Process (비정규 공정하에 붓스트랩 EWMA관리도의 수행도 평가)

  • 이만웅;송서일
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.25 no.2
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    • pp.50-56
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    • 2002
  • In this study, we establish bootstrap control limits for EWMA chart by applying the bootstrap method, called resampling, which could not demand assumptions about pre-distribution when the process is skewed and/or the normality assumption is doubt. The results obtained in this study are summarized as follows : bootstrap EWMA control chart is developed for applying bootstrap method to EWMA chart, which is more sensitive to small shifts of process. With the purpose of eliminating a skewness of the resampling distribution, the bootstrap control limits are established by using a modified residual, and its performance is analyzed by ARL. It is shown that the bootstrap EWMA control chart developed in this study includes the properties of standard EWMA control chart that is sensitive to a small shift, and detects process in out of control more quickly than standard EWMA chart.

A Study of Semiconductor Process Control using Dual Damping EWMA (Dual Damping EWMA를 이용한 효율적인 반도체 공정 제어에 관한 연구)

  • Kim, Seon-Eok;Ko, Hyo-Heon;Kim, Jih-Yun;Kim, Sung-Shick
    • IE interfaces
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    • v.21 no.2
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    • pp.141-150
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    • 2008
  • In this paper, an efficient control method for semiconductor fabrication process is presented. Generally, control is performed with data which is under the influence of process disturbance. EWMA is one of the most popular control methods in semiconductor fabrication that effectively deals with varying process condition. A new method using EWMA, called the Dual Damping EWMA, is presented in this study to reduce over-control by separating weight factor of input and output. The goal is to reflect Drift but reduce the effects of White noise in run to run control. Simulation is performed to evaluate the performance of DPEWMA and to compare with EWMA and Double EWMA.

FIR CV-EWMA Control Chart (FIR CV-EWMA 관리도)

  • Hong, Eui-Pyo;Kang, Hae-Woon;Kang, Chang-Wook;Baek, Jae-Won
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.33 no.3
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    • pp.146-153
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    • 2010
  • When the production run is short and process parameters change frequently, it is difficult to monitor the process using traditional control charts. In such a case, the coefficient of variation (CV) is very useful for monitoring the process variability. The CV control chart is an effective tool to control the mean and variability of process simultaneously. The CV control chart, however, is not sensitive at small shifts in the magnitude of CV. The CV-EWMA(exponentially weighted moving average) control chart which was developed recently is effective in detecting a small shifts of CV. Since the CV-EWMA control chart scheme can be viewed as a weighted average of all past and current CV values, it is very sensitive to small change of mean and variability of the process. In this paper, we propose an FIR(Fast initial response) CV-EWMA control chart to improve the sensitivity of a CV-EWMA scheme at process start-up or out-of-control process. Moreover, we suggest the values of design parameters and show the results of the performance study of FIR CV-EWMA control chart by the use of average run length(ARL). Also, we compared the performance of FIR CV-EWMA control chart with that of the CV-EWMA control chart and we found that the CV-EWMA control chart gives longer in-control ARL and much shorter out-of-control ARL.

Multivariate EWMA Control Charts for the Variance-Covariance Matrix with Variable Sampling Intervals (가변추출간격상(假變抽出間格上)에서 분산(分散)-공분산(共分散) 행례(行例)에 대한 다변량(多變量) 기하이동평균(幾何移動平均) 처리원(處理圓))

  • Cho, Gyo-Young
    • Journal of the Korean Data and Information Science Society
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    • v.4
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    • pp.31-44
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    • 1993
  • Multivariate exponentially weighted moving average (EWMA) control charts for monitoring the variance-covariance matrix are investigated. A variable sampling interval (VSI) feature is considered in these charts. Multivariate EWMA control charts for monitoring the variance-covariance matrix are compared on the basis of their average time to signal (ATS) performances. The numerical results show that multivariate VSI EWMA control charts are more efficient than corrsponding multivariate fixed sampling interval (FSI) EWMA control charts.

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Demerit-EWMA Control Charts

  • Cho, Gyo-Young;Jeon, Young-Mok
    • 한국데이터정보과학회:학술대회논문집
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    • 2004.04a
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    • pp.7-14
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    • 2004
  • In this paper, we present an effective method for process control using the Demerit-EWMA control chart in the process where nonconforming units or nonconformities are occurred by various types. We compare performance of Demerit control chart, Demerit-CUSUM control chart and Demerit-EWMA control chart based on the average run length.

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A Study of Demerit-EWMA Control Charts

  • Cho, Gyo-Young;Jeon, Young-Mok
    • Journal of the Korean Data and Information Science Society
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    • v.15 no.2
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    • pp.431-439
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    • 2004
  • In this paper, we present an effective method for process control using the Demerit-EWMA control chart in the process where nonconforming units or nonconformities are occurred by various types. We compare performance of Demerit control chart, Demerit-CUSUM control chart and Demerit-EWMA control chart based on the average run length(ARL).

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A study on Application of EWMA Control Chart for Manufacturing Processes (제조공정 관리를 위한 EWMA 관리도의 적용에 관한 연구)

  • Kim, Jong-Gurl;Kim, Dong-Nyuk
    • Proceedings of the Safety Management and Science Conference
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    • 2012.11a
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    • pp.445-451
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    • 2012
  • 제조공정에서 사용되어지는 SPC(Statistical Process Control)관리 기법은 가피원인을 탐지하여 변동을 감소시키는 통계적 공정관리 시스템이다. SPC의 대표적인 관리기법으로는 Shewhart관리도, Cusum관리도, EWMA관리도가 있으며 이러한 관리 기법들은 공정을 보다 안정적으로 관리 할 수 있도록 유지 및 예측하는데 사용 되어 진다. 본 논문에서는 일반적으로 사용되어 지는 Shewhart관리도와 공정 예측에 유리한 EWMA 관리도에 대해 연구해보고 공정변화에 민감하게 반응하는 EWMA 관리도의 적용 사례를 제시하고자 한다.

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Control Charts for Constant Failure Rate of System

  • Cho, Gyo-Young;Lee, Ok-Hee
    • Journal of the Korean Data and Information Science Society
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    • v.13 no.2
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    • pp.147-156
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    • 2002
  • In this paper, we propose EWMA control charts using the life time data for the system with the constant failure rate, which were drawn from the fixed sampling interval without replacement(with replacement), and investigate the power of detection of EWMA by comparing ARL of EWMA control charts with one of Shewhart control charts.

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Control Charts for Constant Failure Rate of System

  • Cho, Gyo-Young;Lee, Ok-Hee
    • 한국데이터정보과학회:학술대회논문집
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    • 2002.06a
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    • pp.141-149
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    • 2002
  • In this paper, we propose EWMA control charts using the life time data for the system with the constant failure rate, which were drawn from the fixed sampling interval without replacement (with replacement), and investigate the power of detection of EWMA by comparing ARL of EWMA control charts with one of Shewhart control charts.

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