IE interfaces (산업공학)

Korean Institute of Industrial Engineers (대한산업공학회)
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A Study of Semiconductor Process Control using Dual Damping EWMA

Dual Damping EWMA를 이용한 효율적인 반도체 공정 제어에 관한 연구

  • Kim, Seon-Eok (Department of Industrial System and Information Engineering, Korea University) ;
  • Ko, Hyo-Heon (Department of Industrial System and Information Engineering, Korea University) ;
  • Kim, Jih-Yun (Semiconductor Technology Research Center, Korea University) ;
  • Kim, Sung-Shick (Department of Industrial System and Information Engineering, Korea University)
  • 김선억 (고려대학교 산업시스템정보공학과) ;
  • 고효헌 (고려대학교 산업시스템정보공학과) ;
  • 김지현 (고려대학교 반도체기술 연구소) ;
  • 김성식 (고려대학교 산업시스템정보공학과)
  • Received : 20070800
  • Accepted : 20071100
  • Published : 2008.06.30
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Abstract

In this paper, an efficient control method for semiconductor fabrication process is presented. Generally, control is performed with data which is under the influence of process disturbance. EWMA is one of the most popular control methods in semiconductor fabrication that effectively deals with varying process condition. A new method using EWMA, called the Dual Damping EWMA, is presented in this study to reduce over-control by separating weight factor of input and output. The goal is to reflect Drift but reduce the effects of White noise in run to run control. Simulation is performed to evaluate the performance of DPEWMA and to compare with EWMA and Double EWMA.

Keywords

References

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