1 |
Smith T. and Boning. D. (1997), Self-tuning EWMA Controller Utilizing Artificial Neural Network Function Approximation Techniques, IEEE Transactions of Components, Packaging and Manufacturing Technology, 20(2), 121-132
|
2 |
Moreau, W. M.(1998), Semiconductor Lithography : Principles, Practices, and Materials, Plenum Press, New York
|
3 |
Sachs, E., Guo, R., Ha, S. and Hu, A. (1991), Process Control System for VLSI Fabrication, IEEE Transaction on Semiconductor Manufacturing, 4(2), 133-144
|
4 |
Sachs, E., Hu, A, and Ingolfsson, A. (1995), Run to Run Process Control: Combining SPC and Feedback Control, IEEE Transactions on Semiconductor Manufacturing, 8(1), 26-43
DOI
ScienceOn
|
5 |
Yang T., Chen M. C., Su C. T. (2003), Quality Management Practice in Semiconductor Manufacturing Industries-Empirical Studies in Taiwan, Integrated Manufacturing Systems, 14(2), 153-159
DOI
ScienceOn
|
6 |
Del Castillo, E and Hurwitz, A. (1997), Run-to-Run Process Control: Literature Review and Extensions, Journal of Quality Technology, 29(2), 184-185
DOI
|
7 |
Bode, C. A., Ko, B. S. and Edgar, T. F. (2004), Run-to-run Control and Performance Monitoring of Overlay in Semiconductor Manufacturing, Control Engineering Practice, 12(7) 893-900
DOI
ScienceOn
|
8 |
Ingolfsson, A. and Sachs, E. (1993), Stability and Sensitivity of an EWMA Controller, Journal of Quality Technology, 25, 271-287
DOI
|
9 |
Moyne J., Del Castillo E. and Hurwitz, A. M. (2001), Run-to-Run Control in Semiconductor Manufacturing, CRC Press LLC, New York
|
10 |
Boning, D., Moyne, W., Smith, T., Moyne, J., and Hurwitz, A. (1995), Practical Issues in Run Process Control, Proc. Sixth Annual SEMI/IEEE ASMC, Boston
|
11 |
Tseng S. T., Chou R. J. and Lee S. P. (2002), Statistical Design of Double EWMA Controller, Applied Stochastic Models in Business and Industry, 18(3), 313-322
DOI
ScienceOn
|
12 |
Box, G. E. P. and Luceño, A. (1997), Statistical Control by Monitoring and Feedback Adjustment, Wiley-Interscience, New York
|
13 |
Laidler, D. W., Leray, P., Crow, D. A. and Robert, K. E. (2003), Knowledge- based APC Methodology for Overlay Control, Preceedings of SPIE-the International Society for Optical Engineering, 5044, 32-43
|
14 |
Juran, J. M. and Gryna, F. M. Jr. (1980), Quality Planning and Analysis 2nd ed, McGraw-Hill, New York
|
15 |
Box, G. E. P. and Jenkins, G. M. (1963), Future Contributions to Adaptive Quality Control : Simultaneous Estimation of Dynamics: Nonzero Costs, Bulletin of the International Statistical Institute, 34, 943-974
|
16 |
Butler, S. W. and Stefani, J. A. (1994), Supervisory Run-to-Run Control of a Polysilicon Gate Etch Using in Situ Ellipsometry, IEEE Transactions on Semiconductor Manufacturing, 7(2), 193-201
DOI
ScienceOn
|
17 |
Del Castillo, E. and Yeh J. Y. (1998), An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes, IEEE Transactions on Semi-conductor Manufacturing, 11(2), 285-295
DOI
ScienceOn
|
18 |
Kane, V. E. (1986), Process Capability Indices, Journal of Quality Technology, 18(1), 41-52
DOI
|
19 |
Kymal, C. and Patiyasevi, P. (2006), Semiconductor Quality Initiatives : How to Maintain Quality in This Fast-Changing Industry, Quality Digest, 26(4), 43-48
|