• Journal of the Korean Society of Safety
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• v.15 no.4
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• pp.62-68
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• 2000

Static electricity in electronics manufacturing plants causes the economic loss, yet it is one of the least understood and least recognized effects haunting the industry today. Today's challenge in semiconductor devices is to achieve greater functional density pattern and to miniaturize electronic systems of being more fragile by electrostatic discharges(ESD) phenomena. As the use of automatic handling equipment for static-sensitive semiconductor components is rapidly increased, most manufacturers need to be more alert to the problem of ESD. One of the most common causes of electrostatic damage is the direct transfer of electrostatic charge from the human body or a charged material to the static-sensitive devices. To evaluate the ESD hazards by charged human body and devices, in this paper, characteristics of electrostatic attenuation in domestic semiconductor devices is investigated and the voltage to cause electronic component failures is investigated by field-induced charged device model(FCDM) tester. The FCDM simulator provides a fast and inexpensive test that faithfully represents ESD hazards in plants. Also the results obtained in this paper can be used for the prevention of semiconductor failure from ESD hazards.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.1
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• pp.1-12
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• 2001

Based on mixed-mode transient analyses utilizing a 2-dimensional device simulator, we have suggested the methodology to analyze the HBM ESD phenomena in CMOS chips utilizing NMOS transistors for ESD protection, and have analyzes the HBM discharge mechanisms in detail. Also the second breakdown characteristics in the protection device have been successfully simulated based on mixed-mode simulations, to explain the discharge mechanisms leading to device failure. To analyze the effects of the device structure changes on the discharge characteristics, we have compared the results of DC analyses and mixed-mode transient analyses, and have discussed about more robust designs of NMOS transistor structures against HBM ESD based on the analyses.

• Journal of Satellite, Information and Communications
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• v.7 no.2
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• pp.18-24
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• 2012

High current behaviors of the extended drain n-type metal-oxide-semiconductor field effects transistor (EDNMOSFET) for electrostatic discharge (ESD) protection of high voltage operating LDI (LCD Driver IC) chip are analyzed. Both the transmission line pulse (TLP) data and the thermal incorporated 2-dimensional simulation analysis demonstrate a characteristic double snapback phenomenon after triggering of biploar junction transistor (BJT) operation. Also, background doping concentration (BDC) is proven to be a critical factor to affect the high current behavior of the EDNMOS devices. The EDNMOS device with low BDC suffers from strong snapback in the high current region, which results in poor ESD protection performance and high latchup risk. However, the strong snapback can be avoided in the EDNMOS device with high BDC. This implies that both the good ESD protection performance and the latchup immunity can be realized in terms of the EDNMOS by properly controlling its BDC.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.97-98
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• 2006

High current behaviors of the grounded gate extended drain N-type metal-oxide-semiconductor field effects transistor (GG_EDNMOS) electro-static discharge (ESD) protection devices are analyzed. Simulation based contour analyses reveal that combination of BJT operation and deep electron channeling induced by high electron injection gives rise to the 2-nd on-state. Thus, the deep electron channel formation needs to be prevented in order to realize stable and robust ESD protection performance. Based on our analyses, general methodology to avoid the double snapback and to realize stable ESD protection is to be discussed.

• Current Industrial and Technological Trends in Aerospace
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• v.7 no.1
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• pp.68-78
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• 2009

In this paper, the electrostatic charging and discharging mechanism, and its effects in space plasma environment are reviewed and the system design control documents, ESD analysis tools and modelling techniques, and the SPIS program in Europe are introduced. A design of the satellite system against the electrostatic discharge (ESD) effects in space plasma environments is carefully taken into account at the early stage of development. In a view of the space system design, it really depended on the mission of system, electrical and mechanical configuration, system operation, and orbit condition. Behavior of the electrons and the ions in those environments may be occurred the sever problem to the satellite operation. So it is carefully understood for implementation of the satellite system. By this reason, the space environments and its effects have been comprehensively studied in U.S.A and Europe.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.3
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• pp.155-165
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• 2001

By suggesting a mixed-mode transient simulation method utilizing a 2-dimensional device simulator, we have analyzed CDM ESD Phenomena in CMOS chips, which utilize NMOS transistors as ESD protection devices. By analyzing the simulation results, the mechanisms leading to device failures in CDM discharge and the differences in discharge characteristics with different polarities of stored charges have been explained in detail. The effects of changes in interconnection resistance values on the gate-oxide failure at input buffers, which is the most serious problem in CDM discharge, have been examined. Also improvements in discharge characteristics with addition of the NMOS transistor for input-buffer protection have been examined.

• Journal of Korean Elementary Science Education
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• v.38 no.1
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• pp.149-162
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• 2019

The purpose of this study was to develop an education for sustainable development(ESD) program using community resources in Paju and to investigate the influences on ESD competencies of 6th graders. The community resources used were Unjeong lake park, environmental circulation center, environmental management center, currency museum, butterfly museum, experience center for peaceful unification, Yulgok arboretum, and Jangsan observatory. The newly developed program was related to creative-experience activity and composed of 15 sessions for 6th-grade class in elementary school, including all of the environmental, economic, and social aspects of ESD. Two classes of the 6th grade were divided into the experimental group and the control group. The results to examine the effects of the program were as follows. First, it was proven that ESD program using community resources did not help improving the perception and function competencies of learners except for the thinking abilities. Second, it contributed to the improvement of learners' attitude competencies, especially in self-reflective attitude and other-oriented attitude. Also, according to in-depth interview, the students were constantly developing their values for sustainable development, reflecting their thoughts and behaviors in a reflective way and improving their attitude toward life.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.54 no.3
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• pp.109-113
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• 2005

It has been reported that the failure phenomenon and variation of electrical characteristic due to the effect of electrostatic discharge(ESD) in silicon devices. But we had fess reports about the phenomenon due to the ESD in the compound semiconductors. So there are a lot of difficulty to the phenomenon analysis and to select the protection method of main circuits or the devices. It has not been reported that the relation between the ESD stress and GaN devices, which is remarkable to apply the operation in high temperature and high voltage due to the superior material characteristic. We studied that the characteristic variation of the AlGaN/GaN HEMT current, the leakage current, the transconductance(gm) and the failure phenomenon of device due to the ESD stress. We have applied the ESD stress by transmission line pulse(TLP) method, which is widely used in ESD stress experiments, and observed the variation of the electrical characteristic before and after applying the ESD stress. The on-current trended to increase after applying the ESD stress. The leakage current and transconductance were changed slightly. The failure point of device was mainly located in middle and edge sides of the gate, was considered the increase of temperature due to a leakage current. The GaN devices have poor thermal characteristic due to usage of the sapphire substrate, so it have been shown to easily fail at low voltage compared to the conventional GaAs devices.

• ETRI Journal
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• v.27 no.5
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• pp.628-634
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• 2005

From AC analysis results utilizing a 2-dimensional device simulator, we extracted an AC-equivalent circuit of a grounded-gate NMOS (ggNMOS) electrostatic discharge (ESD) protection device. The extracted equivalent circuit is utilized to analyze the effects of the parasitics in a ggNMOS protection device on the characteristics of a low noise amplifier (LNA). We have shown that the effects of the parasitics can appear exaggerated for an impedance matching aspect and that the noise contribution of the parasitic resistances cannot be counted if the ggNMOS protection device is modeled by a single capacitor, as in prior publications. We have confirmed that the major changes in the characteristics of an LNA when connecting an NMOS protection device at the input are reduction of the power gain and degradation of the noise performance. We have also shown that the performance degradation worsens as the substrate resistance is reduced, which could not be detected if a single capacitor model is used.

• Journal of the Korean Electrochemical Society
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• v.11 no.2
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• pp.95-99
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• 2008

This study has made the electrode that is coated zirconium oxide on the titanium by ESD(Electrostatic spray deposition) coating methode. It has investigated the effects of the etching method of a Ti substrate as the preparation, making of zirconium oxide film and electrochemical characteristics of the electrode that is etched on the titanium. The HCl etching develops a fine and homogeneous roughness on the Ti substrate. Fabrication and material properties of the metal oxide electrode, which is known to be so effective to generate ozone and hypochlorous acid (HOCl) as power oxidant, were studied. A proper metal oxide material is focus zirconium oxide through reference. A coating method to enhance the fabrication reproducibility of the zirconium oxide electrode was used ESD coating method by zirconium oxychloride. Zirconium oxide films on the Ti substrate were tested using SEM, XRD, Cyclic voltammetry.