• Title/Summary/Keyword: ESD characteristics

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A study of Automotive ESD Protection Circuit with improved Current Driving characteristics Using LVTSCR Structure (LVTSCR 구조를 이용한 향상된 전류구동 특성을 갖는 자동차용 ESD 보호회로 연구)

  • Bo-Bae Song;Young-Chul Kim
    • Journal of IKEEE
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    • v.28 no.2
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    • pp.204-208
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    • 2024
  • In this paper, we propose an ESD protection circuit that applies structural changes to LVTSCR, a general low-voltage ESD protection circuit, to improve the current driving capability (IEC-ESD) characteristics of the ESD protection circuit. Power consumption was minimized by separating the area where the electric field and ESD current path are formed in the LVTSCR structure, and the electrical characteristics were analyzed and current driving characteristics were improved. Structural problems resulting from deterioration of system level characteristics were analyzed through simulation, and the characteristics were verified by reflecting this. The electrical characteristics of the proposed ESD protection circuit were verified using a TCAD simulator and analyzed through HBM modeling and system level modeling. In addition, silicon production and HBM 10kV characteristics were verified through DB-Hitek 0.18um BCD process.

A Study on LVTSCR-Based N-Stack ESD Protection Device with Improved Electrical Characteristics (향상된 전기적 특성을 지닌 LVTSCR 기반의 N-Stack ESD 보호소자에 관한 연구)

  • Jin, Seung-Hoo;Woo, Je-Wook;Joung, Jang-Han;Koo, Yong-Seo
    • Journal of IKEEE
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    • v.25 no.1
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    • pp.168-173
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    • 2021
  • In this paper, we propose a new structure of ESD protection device that achieves improved electrical characteristics through structural change of LVTSCR, which is a general ESD protection device. In addition, it applies N-Stack technology for optimized design in the ESD Design Window according to the required voltage application. The N-Well area additionally inserted in the existing LVTSCR structure provides an additional ESD discharge path by electrically connecting to the anode, which improves on-resistance and temperature characteristics. In addition, the short trigger path has a lower trigger voltage than the existing LVTSCR, so it has excellent snapback characteristics. In addition, Synopsys' T-CAD Simulator was used to verify the electrical characteristics of the proposed ESD protection device.

Analysis of the ESD-Induced Degradation Behavior of Oxide VCSELs Using an Equivalent Circuit Model (ESD에 따른 산화형 VCSEL 열화 과정의 등가회로 모델을 이용한 분석)

  • Kim, Tae-Yong;Kim, Sang-Bae
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.3
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    • pp.6-21
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    • 2008
  • We have investigated the effect of the forward and reverse ESD pulse accumulation on the development of the oxide VCSEL's electrical and optical characteristics. The forward ESD-induced degradation is complicated, showing three degradation phases with increasing ESD voltage while the reverse ESD-induced degradation is divided by a sudden distinctive change in elecorl-optical characteristics. By comparing the measured L-I-V characteristics and their derivatives with the fitted characteristics using an equivalent circuit model as well as the large signal circuit model, the development of the oxide VCSEL's electro-optical characteristics under forward and reverse ESD conditions has been fully understood.

A Study on the Design of the Output ESD Protection Circuits and their Electrical Characteristics (출력단 ESD 보호회로의 설계 및 그 전기적 특성에 관한 연구)

  • 김흥식;송한정;김기홍;최민성;최승철
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.11
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    • pp.97-106
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    • 1992
  • In integrated circuits, protection circuits are required to protect the internal nodes from the harmful ESD(Electrostatic discharge). This paper discusses the characteristics of the circuit components in ESD protection circuitry in order to analyze the ESD phenomina, and the design methodalogy of ESD protection circuits, using test pattern with a variation of the number of diode and transistor. The test devices are fabricated using a 0.8$\mu$m CMOS process. SPICE simulation was also carried out to relate output node voltage and measured ESD voltage. With increasing number of diodes and transistors in protection circuit, the ESD voltage also increases. The ESD voltage of the bi-directional circuit for both input and output was 100-300[V], which in higher than that of only output(uni-directional) circuit. In addition, the ESD protection circuit with the diode under the pad region was useful for the reduction of chip size and parasitic resistance. In this case, ESD voltage was improved to a value about 400[V].

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A Study on PMOS Embedded ESD Protection circuit with Improved Robustness for High Voltage Applications. (향상된 감내특성을 갖는 PMOS 삽입형 고전압용 ESD 보호회로에 관한 연구)

  • Park, Jong-Joon
    • Journal of IKEEE
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    • v.21 no.3
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    • pp.234-239
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    • 2017
  • In this paper, we propose an ESD (Electrostatic Discharge) protection circuit based on a new structure of SCR (Silicon Controlled Rectifier) embedded with PMOS structure. The proposed ESD protection circuit has a built-in PMOS structure and has a latch-up immunity characteristic and an improved tolerance characteristic. To verify the characteristics of the proposed ESD protection circuit and to analyze its operating characteristics, we compared and analyzed the characteristics of the existing ESD protection circuit using TCAD simulation. Simulation results show that the proposed protection ESD protection circuit has superior latch-up immunity characteristics like the existing SCR-based ESD protection device HHVSCR (High Holding Voltage SCR). Also, according to the results of the HBM (Human Body Model) maximum temperature test, the proposed ESD protection circuit has a maximum temperature value of 355K, which is about 20K lower than the existing HHVSCR 373K. In addition, the proposed ESD protection circuit with improved electrical characteristics is designed by applying N-STACK technology. As a result of the simulation, the proposed ESD protection circuit has a holding voltage characteristic of 2.5V in a single structure, and the holding voltage increased to 2-STACK 4.2V, 3-STACK 6.3V, 4-STACK 9.1V.

A Study on ESD Protection Circuit with High Holding Voltage with Parallel PNP and N+ difrt inserted (Parallel PNP 및 N+ drift가 삽입된 높은 홀딩전압특성을 갖는 ESD보호회로에 관한 연구)

  • Kwak, Jae-Chang
    • Journal of IKEEE
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    • v.24 no.3
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    • pp.890-894
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    • 2020
  • In this paper, we propose an ESD protection device with improved electrical characteristics through structural changes of LVTSCR, a typical ESD protection device. The proposed ESD protection device has a higher holding voltage than the existing LVTSCR by inserting a long N+ drift region and additional P-Well and N-Well, and improves the latch-up immunity, a chronic disadvantage of a general SCR-based ESD protection device. In addition, the effective base width of parasitic BJTs was set as a design variable, and the electrical characteristics of the proposed ESD protection device were verified through Synopsys' TCAD simulation so that it can be applied to the required application by applying the N-Stack technology.

A Study on Low Area ESD Protection Circuit with Improved Electrical Characteristics (향상된 전기적 특성을 갖는 저면적 ESD 보호회로에 관한 연구)

  • Do, Kyoung-Il;Park, Jun-Geol;Kwon, Min-Ju;Park, Kyeong-Hyeon;Koo, Yong-Seo
    • Journal of IKEEE
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    • v.20 no.4
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    • pp.361-366
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    • 2016
  • This paper presents the ESD protection circuit with improved electrical characteristic and area efficiency. The proposed ESD protection circuit has higher holding voltage and lower trigger voltage characteristics than the 3-Stacking LVTSCR. In addition, it has only two stages and has improved Ron characteristics due to short discharge path of ESD current. We analyzed the electrical characteristics of the proposed ESD protection circuit by TCAD simulator. The proposed ESD protection circuit has a small area of about 35% compared with 3-Stacking LVTSCR, The proposed circuit is designed to have improved latch-up immunity by setting the effective base length of two NPN parasitic bipolar transistors as a variable.

Design of ESD Protection Circuit with improved Snapback characteristics Using Stack Structure (스텍 구조를 이용한 향상된 스냅백 특성을 갖는 ESD 보호회로 설계)

  • Song, Bo-Bae;Lee, Jea-Hack;Kim, Byung-Soo;Kim, Dong-Sun;Hwang, Tae-Ho
    • Journal of IKEEE
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    • v.25 no.2
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    • pp.280-284
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    • 2021
  • In this paper, a new ESD protection circuit is proposed to improve the snapback characteristics. The proposed a new structure ESD protection circuit applying the conventional SCR structural change and stack structure. The electrical characteristics of the structure using penta-well and double trigger were analyzed, and the trigger voltage and holding voltage were improved by applying the stack structure. The electron current and total current flow were analyzed through the TCAD simulation. The characteristics of the latch-up immunity and excellent snapback characteristics were confirmed. The electrical characteristics of the proposed ESD protection circuit were analyzed through HBM modeling after forming a structure through TCAD simulator.

Damage and Failure Characteristics of Semiconductor Devices by ESD (ESD에 의한 반도체소자의 손상특성)

  • 김두현;김상렬
    • Journal of the Korean Society of Safety
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    • v.15 no.4
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    • pp.62-68
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    • 2000
  • Static electricity in electronics manufacturing plants causes the economic loss, yet it is one of the least understood and least recognized effects haunting the industry today. Today's challenge in semiconductor devices is to achieve greater functional density pattern and to miniaturize electronic systems of being more fragile by electrostatic discharges(ESD) phenomena. As the use of automatic handling equipment for static-sensitive semiconductor components is rapidly increased, most manufacturers need to be more alert to the problem of ESD. One of the most common causes of electrostatic damage is the direct transfer of electrostatic charge from the human body or a charged material to the static-sensitive devices. To evaluate the ESD hazards by charged human body and devices, in this paper, characteristics of electrostatic attenuation in domestic semiconductor devices is investigated and the voltage to cause electronic component failures is investigated by field-induced charged device model(FCDM) tester. The FCDM simulator provides a fast and inexpensive test that faithfully represents ESD hazards in plants. Also the results obtained in this paper can be used for the prevention of semiconductor failure from ESD hazards.

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A Study on ESD Protection Circuit for 2-Stack Structure Design Based on LVTSCR (LVTSCR 기반의 2-Stack 구조 설계를 위한 ESD 보호회로에 관한 연구)

  • Seo, Jeong-Yun;Do, Kyoung-Il;Chae, Hee-Guk;Seo, Jeong-Ju;Koo, Yong-Seo
    • Journal of IKEEE
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    • v.22 no.3
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    • pp.836-841
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    • 2018
  • In this paper, This paper is based on the conventional ESD protection circuits SCR and LVTSCR. Also, the SCR-based ESD protection circuit, which is different from the conventional structure, is presented and tested for variations in the trigger voltage and holding voltage. Due to the insertion of additional N +, P + regions, the newly added SCR-based protection circuit have improved electrical characteristics. To discuss the electrical characteristics of the proposed circuit, Synopsys T-CAD simulation data was shown.