• 한국진공학회:학술대회논문집
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• 한국진공학회 1996년도 제10회 학술발표회 논문개요집
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• pp.102-102
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• 1996

This paper represents a new type low power High Frequency technological ion source (HF TIS) for ion - beam processing: the surface modification of materials, cleaning of surface, sputtering, coating of thin films, and polishing. The operational principle of HF TIS is based on the excitation of electrostatic waves in plasma located in the external magnetic field. Low power HF TIS with diameter 92 rom gives the opportunity to obtain beams of inert and chemically reactive gases with currents range from 5 to 150 mA (current density $0.015\;~\;3.5\;mA/\textrm{m}^2$) and ion beam energy 100 ~ 2500 eV at a HF power level 10 ~ 150 W. Three grid concave type ion optical system (IOS) is used for extraction and formation ofion beam.n beam.

• 대한전자공학회논문지
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• 제10권1호
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• pp.9-17
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• 1973

본논문온 전류안정부저항특성을 나타내는 회로를 구성하는데 있어서, 입력전류가 변하는 어느 구간에서 입력전류의 변화에 따라서, SAMUEL SEELY가 제시한 Beam저항을 도입하여, Beam저항이 감소하는 원리를 적용하였다. 이러한 원리에 따르는 회로의 모델을 트랜지스터 회로로써 구체화하였다. 구체화된 트런지스터회로는 PNP 트런지스터와 NPN트랜지스터와 저항으로 이루어졌다. 이 회로의 전압-전류특성이 안정되도록 하기 위하여 회로를 수정하여 회로의 동작을 추정하여 해석하였다. 추정된 동작과 부저항치를 실험을 통하여 모두 뒷밭침 하였다. 여기서 얻어진 회로은 쟈이레이터의 구성과 SCR동작의 모의화등에 유용하게 이용될 것이며, 전류안정중저항회로의 구성에 관한 평이화를 기하였다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.42-42
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• 2003

• 한국정밀공학회지
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• 제25권3호
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• pp.15-22
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• 2008

• 공업화학
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• 제25권2호
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• pp.227-232
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• 2014

전자빔조사와 과산화수소를 사용하여 알지네이트(sodium alginate, SA)를 저분자화 시키는데 1.0, 2.5 MeV의 전자빔 에너지가 이용되었으며, 저분자화 수율($G_s$), 분자량의 제어를 위해 2.5 ~ 20 kGy의 조사량, 0 ~ 4.5%의 과산화수소의 양을 조절하였다. 전자빔조사에 의한 저분자화 알지네이트(depolymerized sodium alginate, DSA)는 주로 1,4-glicoside결합이 끊어지며, C2-C3결합이 끊어지며 생기는 약간의 formate 말단을 가지며, 전자빔 조사 저분자화 저분자 알지네이트 말단(end group)의 화학적 구조가 단순하며, 고분자 알지네이트와 유사한 구조를 가짐을 알 수 있었다. 도입된 전자빔의 에너지와 조사량이 증가하면 알지네이트의 분자량은 감소하였으며, 알지네이트의 농도(2.0w/v%)로 높을 때 저분자화수율이 높았다. 특히 2% 알지네이트 수용액에 20 kGy (2MeV)의 조사량과 1.5% 과산화수소를 도입하였을 때 가장 큰 저분자화 수율($7.919{\times}10^4mol/J$)을 얻을 수 있었다.

• Applied Science and Convergence Technology
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• 제27권4호
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• pp.65-69
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• 2018

We studied the critical pressure characteristics of an anode type ion beam source driven by both charge repulsion and diffusion mechanism. The critical pressure $P_{crit}$ of the diffusion type ion beam source was linearly decreased from 2.5 mTorr to 0.5 mTorr when the gas injection was varied in 3~10 sccm, while the $P_{crit}$ of the charge repulsion ion beam source was remained at 3.5 mTorr. At the gas injection of 10 sccm, the range of having normal beam shape in the charge repulsion ion beam source was about 6.4 times wider than that in the diffusion type ion beam source. An impurity of Fe 2p (KE = 776.68 eV) of 12.88 at. % was observed from the glass surface treated with the abnormal beam of the charge repulsion type ion beam source. The body temperature of the diffusion type ion beam source was observed to increase rapidly at the rate of $1.9^{\circ}C/min$ for 30 minutes and to vary slowly at the rate of $0.1^{\circ}C/min$ for 200 minutes for an abnormal beam and normal beam, respectively.

• 한국축산식품학회지
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• 제37권2호
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• pp.297-304
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• 2017

Animal-origin food products pose serious threat to public food safety due to high microbial loads. The microbial and radioactive contaminations in commercial cold duck meat products were evaluated. Ten different lots of commercial samples ($C_1-C_{10}$) were classified based on type and smoking process. All samples were highly contaminated (< 4-7 Log CFU/g) with total aerobic bacteria (TAB), yeasts and molds (Y&M), and 7 samples ($C_1-C_7$) were positive for coliforms. Furthermore, three samples were contaminated with Listeria monocytogenes ($C_4-C_6$) and one with Salmonella typhimurium ($C_6$). No radionuclides ($^{131}I$, $^{137}Cs$, and $^{134}Cs$) were detected in any sample. The results of DEFT (direct epifluorescent filter technique)/APC (aerobic plate count), employed to screen pre-pasteurization treatments of products, indicated that smoked samples were positive showing DEFT/APC ratios higher than 4. Notably, the samples showed a serious threat to microbial safety, thus were irradiated with electron-beam (e-beam). The $D_{10}$ values for S. typhimurium and L. monocytogenes were 0.65 and 0.42 kGy, respectively. E-beam application at 3 and 7 kGy resulted in reduction of initial TAB, Y&M, and coliform populations by 3 and 6 log cycles, respectively. Thus, e-beam was proven to be a good decontamination approach to improve the hygiene of cold duck meat.

• 열처리공학회지
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• 제23권1호
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• pp.29-33
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• 2010

Titanium nitride (TiN) films were deposited on the polycarbonate substrate by using radio frequency (RF) magnetron sputtering without intentional substrate heating. After deposition, the films were bombarded with intense electron beam for 20 minutes. The intense electron irradiation impacts on the crystalline, hardness and surface roughness of the TiN films. The films irradiated with an electron beam of 300 eV show the small grains on the surface, while as deposited TiN films did not showany grains on the surface. Also the surface harness evaluated with micro indenter was increased up to 18 Gpa at electron energy of 900 eV after electron beam irradiation. In addition, surface root mean square (RMS) roughness of the films irradiated with intense electron beam affected strongly. The films irradiated by electron beam with 900 eV have the lowest roughness of 1.2 nm in this study.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.976-979
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.441-441
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• 2011

$TiO_2$ nanoparticles were grown on carbon fiber by atomic later deposition (ALD) with TTIP $(Ti(OCH(CH_3)_2)_4$ and $H_2O$ precusors. After sampe surfaces were treated by electron beam (1 MeV, 5 KGy), an improvement in the photocatalytic reacitivity of $TiO_2$ nanoparticles on carbon fiber was observed. An increase in the population of hydroxyl group on $TiO_2$ particles and the oxidation of carbon fiber were found upon e-beam exposure, whereas there was no noticeable changes of their morphology. It implies that those changes in O and C 1s state of $TiO_2$ particles/carbon fiber induced by e-beam treatment could be related to the enhancement of the photocatalytic activity. In contrast, when carbon fiber fully covered with $TiO_2$ thick films was treated with high-energy electron beam under same conditions, the improvement of photocatalytic activity as well as any changes in XPS spectra (Ti 2p, O 1s and C 1s) could not be found.