Reliability of N/O($SiO_2$ /$Si_3$ $N_4$ ) Films According to Top Oxidation Condition
(상부산화 조건에 따른 N/O($SiO_2$ /$Si_3$ $N_4$ ) 구조막의 신뢰성 평가)
-
- Journal of the Korean Institute of Telematics and Electronics A
- /
- v.29A no.9
- /
- pp.20-28
- /
- 1992