• 제목/요약/키워드: Drain engineering

검색결과 987건 처리시간 0.025초

가우스분포를 이용한 이중게이트 MOSFET의 드레인유기장벽감소분석 (Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET Using Gaussian Distribution)

  • 정학기;한지형;정동수;이종인;권오신
    • 한국정보통신학회:학술대회논문집
    • /
    • 한국해양정보통신학회 2011년도 추계학술대회
    • /
    • pp.878-881
    • /
    • 2011
  • 본 연구에서는 차세대 나노소자인 DGMOSFET에서 발생하는 단채널효과 중 하나인 드레인유기 장벽 감소(Drain Induced Barrier Lowering; DIBL)에 대하여 분석하고자 한다. 포아송방정식을 풀어 전위분포에 대한 분석학적 해를 구할 때 전하분포함수에 대하여 가우시안 함수를 사용함으로써 보다 실험값에 가깝게 해석하였으며 이때 가우시안 함수의 변수인 이온주입범위 및 분포편차 그리고 소자 파라미터인 채널의 두께, 도핑강도 등에 대하여 드레인유기장벽감소의 변화를 관찰하고자 한다. 본 연구의 모델에 대한 타당성은 이미 기존에 발표된 논문에서 입증하였으므로 본 연구에서는 이 모델을 이용하여 드레인유기장벽감소에 대하여 분석할 것이다.

  • PDF

답전윤환 인삼재배 예정지 토양의 물 이동특성 평가 (Assessment on Water Movement in Paddy-Upland Rotation Soil Scheduled for Ginseng Cultivation)

  • 허승오;이윤정;연병열;전상호;하상건;김정규
    • 한국약용작물학회지
    • /
    • 제17권3호
    • /
    • pp.204-209
    • /
    • 2009
  • This study was conducted to assess water movement in paddy-upland rotation soil scheduled for ginseng cultivation through the measurement of infiltration and permeability of soil water. Soil sample was divided with four soil layers. The first soil layer (to 30cm from top soil) was loamy sand, the second and the third soil layers (30$\sim$70 ㎝) were sand, and the fourth (< 120 ㎝) was sandy loam. The soil below 130 ㎝ of fourth soil layer was submerged under water. The shear strength, which represents the resisting power of soil against external force, was 3.1 kPa in the first soil layer. This corresponded to 1/8 of those of another soil layer and this value could result in soil erosion by small amount of rainfall. The rates of infiltration and permeability depending on soil layers were 39.86 cm $hr^{-1}$ in top soil, 2.34 cm $hr^{-1}$ in 30$\sim$70 ㎝ soil layer, 5.23 cm $hr^{-1}$ and 0.18 cm $hr^{-1}$ in 70$\sim$120 ㎝ soil layer, with drain tile, and without drain tile, respectively. We consider that ground water pooled in paddy soil and artificial formation of soil layer could interrupt water canal within soil and affect negatively on water movement. Therefore, we suggest that to drain at 5 m intervals be preferable when it makes soil dressing or soil accumulation to cultivate ginseng in paddy-upland rotation soil to reduce failure risk of ginseng cultivation.

선택적 산화 방식을 이용한 핀 채널 MOSFET의 소스/드레인 저항 감소 기법 (Reduction of Source/Drain Series Resistance in Fin Channel MOSFETs Using Selective Oxidation Technique)

  • 조영균
    • 융합정보논문지
    • /
    • 제11권7호
    • /
    • pp.104-110
    • /
    • 2021
  • 본 핀 채널 전계 효과 트랜지스터에서 낮은 소스/드레인 직렬 저항을 위한 새로운 선택적 산화 방식을 제안하였다. 이 방법을 이용하면, gate-all-around 구조와 점진적으로 증가되는 형태의 소스/드레인 확장영역을 갖는 핀 채널 MOSFET를 얻을 수 있다. 제안된 트랜지스터는 비교 소자에 비해 70% 이상의 소스/드레인 직렬 저항의 감소를 얻을 수 있다. 또한, 제안된 소자는 단채널 효과를 억제하면서도 높은 구동 전류와 전달컨덕턴스 특징을 보인다. 제작된 소자의 포화전류, 최대 선형 전달컨덕턴스, 최대 포화 전달컨덕턴스, subthreshold swing, 및 DIBL은 각각 305 ㎂/㎛, 0.33 V, 13.5 𝜇S, 76.4 𝜇S, 78 mV/dec, 62 mV/V의 값을 갖는다.

NCFET (negative capacitance FET)에서 잔류분극과 항전계가 문턱전압과 드레인 유도장벽 감소에 미치는 영향 (Impact of Remanent Polarization and Coercive Field on Threshold Voltage and Drain-Induced Barrier Lowering in NCFET (negative capacitance FET))

  • 정학기
    • 한국전기전자재료학회논문지
    • /
    • 제37권1호
    • /
    • pp.48-55
    • /
    • 2024
  • The changes in threshold voltage and DIBL were investigated for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in NCFET (negative capacitance FET). The threshold voltage and DIBL (drain-induced barrier lowering) were observed for a junctionless double gate MOSFET using a gate oxide structure of MFMIS (metal-ferroelectric-metal-insulator-semiconductor). To obtain the threshold voltage, series-type potential distribution and second derivative method were used. As a result, it can be seen that the threshold voltage increases when Pr decreases and Ec increases, and the threshold voltage is also maintained constant when the Pr/Ec is constant. However, as the drain voltage increases, the threshold voltage changes significantly according to Pr/Ec, so the DIBL greatly changes for Pr/Ec. In other words, when Pr/Ec=15 pF/cm, DIBL showed a negative value regardless of the channel length under the conditions of ferroelectric thickness of 10 nm and SiO2 thickness of 1 nm. The DIBL value was in the negative or positive range for the channel length when the Pr/Ec is 25 pF/cm or more under the same conditions, so the condition of DIBL=0 could be obtained. As such, the optimal condition to reduce short channel effects can be obtained since the threshold voltage and DIBL can be adjusted according to the device dimension of NCFET and the Pr and Ec of ferroelectric.

An Analytical Model for the Threshold Voltage of Short-Channel Double-Material-Gate (DMG) MOSFETs with a Strained-Silicon (s-Si) Channel on Silicon-Germanium (SiGe) Substrates

  • Bhushan, Shiv;Sarangi, Santunu;Gopi, Krishna Saramekala;Santra, Abirmoya;Dubey, Sarvesh;Tiwari, Pramod Kumar
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • 제13권4호
    • /
    • pp.367-380
    • /
    • 2013
  • In this paper, an analytical threshold voltage model is developed for a short-channel double-material-gate (DMG) strained-silicon (s-Si) on silicon-germanium ($Si_{1-X}Ge_X$) MOSFET structure. The proposed threshold voltage model is based on the so called virtual-cathode potential formulation. The virtual-cathode potential is taken as minimum channel potential along the transverse direction of the channel and is derived from two-dimensional (2D) potential distribution of channel region. The 2D channel potential is formulated by solving the 2D Poisson's equation with suitable boundary conditions in both the strained-Si layer and relaxed $Si_{1-X}Ge_X$ layer. The effects of a number of device parameters like the Ge mole fraction, Si film thickness and gate-length ratio have been considered on threshold voltage. Further, the drain induced barrier lowering (DIBL) has also been analyzed for gate-length ratio and amount of strain variations. The validity of the present 2D analytical model is verified with ATLAS$^{TM}$, a 2D device simulator from Silvaco Inc.

Evaluation of Flexible Complementary Inverters Based on Pentacene and IGZO Thin Film Transistors

  • Kim, D.I.;Hwang, B.U.;Jeon, H.S.;Bae, B.S.;Lee, H.J.;Lee, N.E.
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
    • /
    • pp.154-154
    • /
    • 2012
  • Flexible complementary inverters based on thin-film transistors (TFTs) are important because they have low power consumption and high voltage gain compared to single type circuits. We have manufactured flexible complementary inverters using pentacene and amorphous indium gallium zinc oxide (IGZO) for the p-channel and n-channel, respectively. The circuits were fabricated on polyimide (PI) substrate. Firstly, a thin poly-4-vinyl phenol (PVP) layer was spin coated on PI substrate to make a smooth surface with rms surface roughness of 0.3 nm, which was required to grow high quality IGZO layers. Then, Ni gate electrode was deposited on the PVP layer by e-beam evaporator. 400-nm-thick PVP and 20-nm-thick ALD Al2O3 dielectric was deposited in sequence as a double gate dielectric layer for high flexibility and low leakage current. Then, IGZO and pentacene semiconductor layers were deposited by rf sputter and thermal evaporator, respectively, using shadow masks. Finally, Al and Au source/drain electrodes of 70 nm were respectively deposited on each semiconductor layer using shadow masks by thermal evaporator. The characteristics of TFTs and inverters were evaluated at different bending radii. The applied strain led to change in voltage transfer characteristics of complementary inverters as well as source-drain saturation current, field effect mobility and threshold voltage of TFTs. The switching threshold voltage of fabricated inverters was decreased with increasing bending radius, which is related to change in parameters of TFTs. Throughout the bending experiments, relationship between circuit performance and TFT characteristics under mechanical deformation could be elucidated.

  • PDF

CLAMP MODE에서 동작하는 ZVS-MRC FORWARD 콘버어터에 관한 연구 (THE CLAMP MODE FORWARD ZERO-VOLTAGE-SWITCHING MULTI-RESONANT-CONVERTER)

  • 김희준;미스리시문
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 1991년도 추계학술대회 논문집 학회본부
    • /
    • pp.210-213
    • /
    • 1991
  • The clamp mode Zero-Volatge-Switched Multi-Resonant-Converter(ZVS-MRC) is proposed. In the converter, the performance of the conventional ZVS-MRC is improved by clamping the drain-to-source voltage of the power switch using a soft switching nondissipative active clamp network. The analysis for each stage of the converter operation modes is presented and is verified by experiments.

  • PDF

부성저항을 이용한 능동 대역 통과 여파기 (An Active Bandpass Filter Using Negative Resistance Circiuts)

  • 신상문;권태운;최재하
    • 한국전자파학회:학술대회논문집
    • /
    • 한국전자파학회 2000년도 종합학술발표회 논문집 Vol.10 No.1
    • /
    • pp.229-232
    • /
    • 2000
  • In this study, An active band grass filter for 2.14GHz have been designed with MMIC using negative resistance circuit. The negative resistance element was realized with a common-drain FET with series inductive feedback. The designed active filter showed an insertion loss of 0dB at 2.14GHz and a 3-dB bandwidth of 125MHz.

  • PDF

Co-Silicide Device Characteristics in Embedded DRAM

  • Kim, Jong-Chae;Kim, Yeong-Cheol;Kim, Byung-Kook
    • 한국결정학회지
    • /
    • 제12권3호
    • /
    • pp.162-165
    • /
    • 2001
  • The EDL (Embedded DRAM and Logic) technologies with stack cell capacitors based on NO dielectric and Co-silicided source/drain junctions using a Ti capping material, were successfully implemented. The employed Co-silicided film exhibited junction leakage characteristics comparable to those of non-silicided junctions. Improved device characteristics without degradation of I/sub off/ was also achieved.

  • PDF

조적채움 RC 골조의 비선형 거동에 대한 해석 모텔 (Analytical Modeling for Nonlinear Behaviors of a Masonry-Infilled RC Frame)

  • 이한선;우성우
    • 한국지진공학회:학술대회논문집
    • /
    • 한국지진공학회 2001년도 추계 학술발표회 논문집 Proceedings of EESK Conference-Fall 2001
    • /
    • pp.227-234
    • /
    • 2001
  • The responses of a 1:5 scale 3-story masonry-infilled RC frame which was designed only for gravity loads were simulated by using a nonlinear analysis program, DRAIN-2DX The objective of this study is to verify the correlation between the experimental and analytical responses of masonry-infilled RC frame. It is concluded from this comparison that the strength and stillness of the whole structure can be predicted with quite high reliability using compressive strut (compression link element, Type 09) while some local behavior cannot be described reasonably.

  • PDF