• Title/Summary/Keyword: Copper Foil

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A Fabrication Method of Blade Type Tip for Probe Unit Device (프르브유닛 소자용 블레이드형 팁 제조방법)

  • Lee, Keun-Woo;Lee, Jae-Hong;Kim, Chang-Kyo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.8
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    • pp.1436-1440
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    • 2007
  • Beryllium copper has been known to be an important material for the various fields of industry because it can be used for mechanical and electrical/electronic components that are subjected to elevated temperatures (up to $400^{\circ}C$ for short times). Blade type tip for probing the cells of liquid crystal display(LCD) was fabricated using beryllium copper foil. The dry film resist was employed as a mask for patterning of the blade type tip. The beryllium copper foil was etched using hydrochloric acidic iron-chloride solution. The concentration, temperature, and composition ratio of hydrochloric acidic iron-chloride solution affect the etching characteristics of beryllium copper foil. Nickel with the thickness of $3{\mu}m$ was electroplated on the patterned copper beryllium foil for enhancing its hardness, followed by electroplating gold for increasing its electrical conductivity. Finally, the dry film resist on the bridge was removed and half of the nickel was etched to complete the blade type tip.

Measurement of Tensile Properties of Copper foil using ESPI technique (ESPI 기법을 이용한 동 박막의 인장 특성 측정)

  • 권동일;허용학;김동진;박준협;기창두
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.1059-1062
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    • 2003
  • Micro-tensile testing system has been developed and micro-tensile tests for copper foil have been carried out. The system consisted of a micro tensile loading system and a micro-ESPI system for measuring strain. The loading system has a maximum loading capacity of 50N and a stroke resolution of 4.5nm. Stress-strain curves for the electro-deposited copper foil with the thickness of 18$\mu\textrm{m}$ were obtained, and tensile properties, including elastic modulus, yielding strength and tensile strength, were determined. The tensile properties obtained under three different conditions of testing speed showed a dependency on the speed.

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Properties of electrodeposited copper foil by organic compounds (유기물 첨가에 의한 전해동박의 특성)

  • Lee, K.W.;No, S.S.;Choi, C.H.;Kim, S.K.;Son, S.H.;Moon, H.K.;Park, D.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05c
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    • pp.88-91
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    • 2001
  • The mechanical properties and surface luminous intensities of copper foil have been studied with variation of the amount of additives into the electrolyte. Especially, organic compound of HEC was added from 0.1 to 10ppm for the propose of increasing the mechanical property and the surface state. The total thickness of electrodeposited copper foil was decreased with increasing the amount of organic compounds. There was not so much significant effect of the current density. It has been observed that mechanical property and surface luminous intensity increase with increasing concentration of organic compounds.

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Effect of Pulse and Pulse-Reverse Current on Surface Morphology and Resistivity of Electrodeposited Copper (정펄스 및 역펄스 방법을 이용하여 구리 전해도금 시 전착층의 표면 형상과 고유저항에 미치는 효과)

  • Woo, Tae-Gyu;Park, Il-Song;Seol, Kyeong-Won
    • Korean Journal of Materials Research
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    • v.17 no.1
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    • pp.56-59
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    • 2007
  • Recently, requirement for the ultra thin copper foil increases with smaller and miniaturized electronic components. In this study, we evaluated the surface morphology, crystal phase ana surface roughness of the copper film electrodeposited by pulse method without using additives. Homogeneous and dense copper crystals were formed on the titanium substrate, and the optimum condition was 25% duty cycle. Moreover, the surface roughness(Ra), $0.295{\mu}m$, is the smallest value in this condition. It is thought that this copper foil is good for electromigration inhibition due to the preferential crystal growth of Cu (111)

Property and Surface Morphology of Copper Foil on the Current Density (구리 박막의 표면형상과 물성에 대한 전류밀도 영향)

  • Woo, Tae-Gyu;Park, Il-Song;Jung, Kwang-Hee;Seol, Kyeong-Won
    • Korean Journal of Materials Research
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    • v.20 no.10
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    • pp.555-558
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    • 2010
  • This study examined the effect of current density on the surface morphology and physical properties of copper plated on a polyimide (PI) film. The morphology, crystal structure, and electric characteristics of the electrodeposited copper foil were examined by scanning electron microscopy, X-ray diffraction, and a four-point probe, respectively. The surface roughness, crystal growth orientation and resistivity was controlled using current density. Large particles were observed on the surface of the copper layer electroplated onto a current density of 25 mA/$cm^2$. However, a uniform surface and lower resistivity were obtained with a current density of 10 mA/$cm^2$. One of the important properties of FCCL is the flexibility of the copper foil. High flexibility of FCCL was obtained at a low current density rather than a high current density. Moreover, a reasonable current density is 20 mA/$cm^2$ considering the productivity and mechanical properties of copper foil.

Effect of Kind and Thickness of Seed Metal on the Surface Morphology of Copper Foil (Seed 금속의 종류와 두께에 따른 구리 전착층의 표면형상에 미치는 영향)

  • Woo, Tae-Gyu;Park, Il-Song;Seol, Kyeong-Won
    • Korean Journal of Materials Research
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    • v.17 no.5
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    • pp.283-288
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    • 2007
  • This study aimed to investigate the effects of the seed layer with copper electroplating on the surface morphology of copper foil. Three kinds of seed metal such as platinum, palladium, Pt-Pd alloy were used in this study. Electrodeposition was carried out with the constant current density of 200 $mA/cm^2$ for 68 seconds. Electrochemical experiments, in conjunction with SEM, XRD, AFM and four-point probe, were performed to characterize the morphology and mechanical characteristics of copper foil. Large particles were observed on the surface of the copper deposition layer when a copper foil was electroplated on the 130 nm thickness of Pd, Pt-Pd seed layer. However, a homogeneous surface, low resistivity was obtained when the 260 nm thickness of Pt, Pt-Pd alloy seed layer was used. The minimum value of resistivity was 2.216 ${\mu}{\Omega}-cm$ at the 260 nm thickness of Pt-Pd seed layer.

Design of Rolling Pass Schedule in Copper Thin Foil Cold Rolling According to Roll Crown of 6 High Mill (6단 압연롤 크라운을 고려한 동극박 냉간 압연 패스스케줄 설계)

  • Lee, Sang-Ho;Ok, Soon-Young;Hwang, In-Youb;Hwang, Won-Jea;Kim, Byung-Min
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.11
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    • pp.66-72
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    • 2008
  • During the plate and foil cold rolling process, considerable values of the force of material pressure on the tool occur. These pressures cause the elastic deformation of the roll, thus changing the shape of the deformation legion. Rolled copper foils should be characterized by a good quality and light dimensional tolerances. Because of automation that is commonly implemented in flat product rolling mills, these products should meet the requirements of tightened tolerances, particularly strip thickness, and feature the greatest possible flatness. The shape of the roll gap is influenced by the elastic deformation of rolls parts of the rolling process affecter of the pressure force. However, to control roll deformation should be difficult. Because the foil thickness is very thin and the permissible deviations in the thickness of foil are small. In this paper, FE-simulation of roll deformation in thin foil cold roiling process is presented.

A Study on the Surface Modification Mechanism of Copper Foil Using O2 / Ar Plasma (O2 / Ar 플라즈마를 이용한 구리호일 표면 개질에 관한 연구)

  • Lee, Jongchan;Son, Jinyoung;Kim, Moonkeun;Kwon, Kwang-Ho;Lee, Hyunwoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.11
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    • pp.836-840
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    • 2013
  • In this study, the surface modification of copper foil using an inductively coupled $O_2$ / Ar plasma as $O_2$ gas fraction (0~100%) was investigated in order to improve the surface characteristics. After plasma treatment, the measurement of the surface roughness, surface contact angle and surface energy were performed for the surface analysis of copper foil. As a result, the surface roughness and the surface energy were increased. And plasma diagnostics was performed by a double Langmuir probe (DLP) and optical emission spectroscopy (OES). Using these results, the plasma surface modification mechanism was investigated.

Fabrication of a Porous Copper Current Collector Using a Facile Chemical Etching to Alleviate Degradation of a Silicon-Dominant Li-ion Battery Anode

  • Choi, Hongsuk;Kim, Subin;Song, Hayong;Suh, Seokho;Kim, Hyeong-Jin;Eom, KwangSup
    • Corrosion Science and Technology
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    • v.20 no.5
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    • pp.249-255
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    • 2021
  • In this work, we proposed a facile method to fabricate the three-dimensional porous copper current collector (3D Cu CC) for a Si-dominant anode in a Li-ion battery (LiB). The 3D Cu CC was prepared by combining chemical etching and thermal reduction from a planar copper foil. It had a porous layer employing micro-sized Cu balls with a large surface area. In particular, it had strengthened attachment of Si-dominant active material on the CC compared to a planar 2D copper foil. Moreover, the increased contact area between a Si-dominant active material and the 3D Cu could minimize contact loss of active materials from a CC. As a result of a battery test, Si-dominant active materials on 3D Cu showed higher cyclic performance and rate-capability than those on a conventional planar copper foil. Specifically, the Si electrode employing 3D Cu exhibited an areal capacity of 0.9 mAh cm-2 at the 300th cycles (@ 1.0 mA cm-2), which was 5.6 times higher than that on the 2D copper foil (0.16 mAh cm-2).