• Journal of the Korean Vacuum Society
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• v.16 no.5
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• pp.383-387
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• 2007

In this paper the design of the discharge cleaning system for KSTAR vacuum vessel is described. We first discuss about the parameters which are related the efficiency of discharge cleaning. The RG(RF-assisted Glow) discharge which has the ignition and sustain pressure lower than those in the case of DC discharge, thus has the higher efficiency of discharge cleaning. So we adopt the RG discharge, in practical design, for KSTAR discharge cleaning system. For uniformity of the cleaning effect, we plan to install two discharge cleaning systems in A- and I-port of the KSTAR vacuum vessel. The designed system will be adapted for the study of the fuel recycling and of the boronization as well as the discharge cleaning of the KSTAR vacuum vessel.

• Journal of Power System Engineering
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• v.21 no.3
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• pp.74-84
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• 2017

This paper presents the development of the underwater cleaning robot platform for a higher efficiency in manufacturing industry. Human operators directly go into the cistern and clean sludge after drainage of the water so far. It is sometimes dangerous because of the harmful chemical materials from the product making process. In addition, it takes long time for water drainage and supplying it back. However, the robot cleaning operation does not need to drain water so that it could be applied to the sludge cleaning work at any time without the plant pause. Moreover, it can prevent the safety accidents because human operators are not necessary to enter directly the sludge cisterns. This paper shows the performance of cleaning work that can be applied in the industrial field through the design and development of underwater cleaning robot platform. And these results demonstrate that the developed underwater cleaning robot has great possibilities to clean other industrial water cisterns.

• The Journal of Korea Robotics Society
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• v.7 no.4
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• pp.243-251
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• 2012

In this paper, developing of a pool cleaning robot is addressed. First, we analyze commercial pool cleaning robot mechanisms, and the merits and demerits of wireless version of a pool cleaning robot is introduced. And then the water-jet moving mechanism for a pool cleaning robot is proposed to improve energy efficiency and mechanical design advantage, which is one of the strong candidates for wireless pool cleaning robots. Next, the method of cleaning performance evaluation of pool cleaning robots is firstly defined with five key factors, and it was verified by experimental results. If the cleaning performance can be quantitatively defined, we can design optimally a pool cleaning robot, which results in the cost down.

• Membrane Journal
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• v.29 no.6
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• pp.339-347
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• 2019

Forward osmosis (FO) is operated at a lower pressure than reverse osmosis (RO), which has great advantages in terms of fouling control, maintenance, membrane cleaning, and potential energy reduction. In particular, since the membrane fouling layer of the forward osmosis process has a relatively loose and dispersed property, it is possible to control the membrane fouling by physical cleaning, unlike the reverse osmosis process. However, existing studies do not apply the proper cleaning flow rate for forward osmosis physical cleaning, and thus there is a limit that the optimal operation can not be performed. Therefore, this study aims to evaluate the justification of proper flow rate that can show high efficiency cleaning with economical energy amount. The membrane fouling experiments of the forward osmosis process were maintained at a circulating flow rate of 8.54 cm/s and the recovery rates were compared with the three cleaning flow rates. As a result of this experiment, it was confirmed that the 2 × speed cleaning showed the same efficiency as the water permeability recovery rate of the 3 × speed cleaning, and it was confirmed that the 2 × speed cleaning was an appropriate flow rate with high cleaning efficiency and economical SEC.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.10
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• pp.1023-1028
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• 2009

Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-step CMP consists of Cu and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the chemical mechanical cleaning(CMC) is performed various conditions as a cleaning process. The CMC process combined mechanical cleaning by friction between a wafer and a pad and chemical cleaning by CMC solution consists of tetramethyl ammonium hydroxide (TMAH) / benzotriazole (BTA). This paper studies the removal of abrasive on the Cu wafer and the cleaning efficiency of CMC process.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2000.05a
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• pp.743-746
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• 2000

The removal of contaminants of silicon wafers has been investigated by various methods. Laser cleaning is the new dry cleaning technique to replace wafer wet cleaning in the near future. A dry laser cleaning uses inert gas jet to remove contaminant particles lifted off by the action of a KrF excimer laser. A laser cleaning model is developed to simulate the cleaning process and analyze the influence of contaminant particles and experimental parameters on laser cleaning efficiency. The model demonstrates that various types of submicrometer-sized particles from the front sides of silicon wafer can be efficiently removed by laser cleaning. The laser cleaning is explained by a particle adhesion model. including van der Waals forces and hydrogen bonding, and a particle removal model involving rapid thermal expansion of the substrate due to the thermoelastic effect. In addition, the experiment of wafer laser cleaning using KrF excimer laser was conducted to remove various contaminant particles.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.1
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• pp.94-98
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• 2012

The behavior of ozone micro bubble cleaning system was investigated to evaluate the solution as a new method of solar cell wafer cleaning in comparison with former conventional RCA cleaning. We have developed the ozone dissolution system in the ozonated water for more efficient cleaning conditions. The optimized cleaning conditions for solar cell wafer process were 10 ppm of ozone concentration and 12 minutes in cleaning periods, respectively. We have confirmed the cleaning reliability and cell efficiencies after ozone micro bubble cleaning. Using this new cleaning technology, it was possible to obtain higher efficiency, higher productivity, and fast tact time for applying cleaning in the fields on bare ingot wafer, LED wafers as well as the solar cell wafer.

• Journal of the Korean Applied Science and Technology
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• v.13 no.3
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• pp.111-117
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• 1996

Many alternatives to Trichlorothane & Trichlorotrifluoroethane mainly used as cleaning solvent for industrial parts are developed and commercialized because the solvent is scheduled to phaseout after 1996. Considering there are many kinds of parts and contaminants in all parts cleaning, It is essential to investigating the characteristics and performance of the alternatives prior to use. For the contaminant of a standard oil, waters, hydrocarbon and halogen parts which are the comercially available and promising alternatives were experimented at the same condition of Trichlorothane & Trichlorotrifluoroethane to check the cleaning performance. Overally, the removal efficiency of halogen solvent parts was better than that of hydrocarbon or waters parts for removing the standard oil used in this experiment.

• Journal of Korean Society of Water and Wastewater
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• v.25 no.6
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• pp.981-987
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• 2011

Biologically treated water contains a large quantity of organic matters and microorganisms which can cause various problems to membrane. The membrane fouling occurred by these reasons is hard to control by single physical cleaning. This study analyzes the efficiency of aeration with chemical backwashing and foulants removal during chemical backwashing. The cleaning efficiency improves when the chemical concentration is high and the contact time of chemical is long. Chemical backwashing with aeration shows exceptional cleaning efficiency which leads the physical cleaning is required during chemical backwashing since it forms flow inside the membrane submerged tank. From the foulants removal analysis, the particles such as turbidity and TOC removal rate increase when the aeration is applied. Dissolved matter of DOC and UV254 removal is dependent on higher chemical concentration. According to FTIR analysis, one of major foulants, the polysaccharide is controlled by the chemical backwashing with aeration condition.

• Journal of the Korean Society of Safety
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• v.14 no.4
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• pp.114-119
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• 1999

When NaOCl was generated and put into sea-water cooling machine in order to overcome the biological hindrances against sea-water cooling machine, it was converted into metallic ion, particularly Ca and Mg, as a hydrate in sea-water and is to stick to electrolyte as a side reaction. This phenomena make the distance between the electrolytes narrow to decrease the flow rate, which induces the local vortex flow which erodes the pole plate. Moreover, this increases the resistance of the electrolyte as well as voltage to decrease the electrolytic efficiency, which has curtailed a chlorine yield and caused a pole plate cut. We are able to overcome these problems by chemical cleaning and intend to extend the life-time of electrolyte and to increase output of the sea-water electrolysis facilities by studying optimal policy regarding chemical cleaning of electrolytic cell. Cleaning time of electrolytic facilities is determined when both increase in electrolytic efficiency and decrease in pole-plate voltage are 10%. At this time as operating current of electrolytic facilities is high, operating time is diminished. Whereas, parameter of end point determination according to cleaning is Mg ionic concentration in solution. When we use Cleaner as a 7wt% HCl, cleaning time is about 80min proper. We are able to maintain pole plate performance by protecting against pole plate cut by means of electrolytic by-product, improve operating rate of facilities, and cut down on maintenance expenditure after acidic cleaning.