• 제목/요약/키워드: Carrier mobility

검색결과 676건 처리시간 0.029초

반응성 RF 마그네트론 스퍼터링에 의한 TiNx 상온 성막에 있어서 기판 상의 펄스상 직류 바이어스 인가 효과 (Pulsed DC Bias Effects on Substrate in TiNx Thin Film Deposition by Reactive RF Magnetron Sputtering at Room Temperature)

  • 김세기
    • 한국표면공학회지
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    • 제52권6호
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    • pp.342-349
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    • 2019
  • Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N2/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied with a frequency of 350 kHz, and duty ratio of 40%(1.1 ㎲). The effects of pulsed DC substrate bias voltage on the crystallinity, color, electrical properties of TiNx films have been investigated using XRD, SEM, XPS and measurement of the electrical properties such as electrical conductivity, carrier concentration, mobility. The deposition rates of TiNx films was decreased with application of the pulsed DC substrate bias voltage. The TiNx films deposited without and with pulsed bias of -50V to substrate exhibits gray and gold colors, respectively. XPS depth profiling revealed that the introduction of the substrate bias voltage resulted in decreasing oxygen concentration in TiNx films, and increasing the electrical conductivities, carrier concentration, and mobility to about 10 times, 5 times, and 2 times degree, respectively.

Composition and interface quality control of AlGaN/GaN heterostructure and their 2DEG transport properties

  • Kee, Bong;Kim, H.J.;Na, H.S.;Kwon, S.Y.;Lim, S.K.;Yoon, Eui-Joon
    • Journal of Korean Vacuum Science & Technology
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    • 제4권3호
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    • pp.81-85
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    • 2000
  • The effects of $NH_3$ flow rate and reactor pressure on Al composition and the interface of AlGaN/GaN heterostructure were studied. Equilibrium partial pressure of Ga and Al over AiGaN alloy was calculated as a function of growth pressure, $NH_3$flow rate and temperature. It was found equilbrium vapor pressure of Al is significantly lower than that of Ga, thus, the alloy composition mainly controlled by Ga partial pressure. We believe that more decomposition of Ga occur at lower $NH_3$ flow rate and higher growth pressure leads to preferred Al incorporation into AlGaN. The alloy composition gradient became larger at AlGaN/GaN heterointerface at higher reactor pressures, higher Al composition and low $NH_3$ flow rate. This composition gradient lowered sheet carrier concentration and electron mobility as well. We obtained an AlGaN/GaN heterostructure with sheet carrier density of ${\sim}2{\times}10^{13}cm^{-2}$ and mobility of 1250 and 5000 $cm^2$/Vs at 300 K and 100 K, respectively.

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RF Magnetron Sputtering법으로 증착된 ZnNiO박막의 특성 (ZnNiO thin films deposited by r.f. magnetron sputtering method)

  • 오형택;이태경;김동우;박용주;박일우;김은규
    • 한국진공학회지
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    • 제12권4호
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    • pp.269-274
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    • 2003
  • The electrical, optical and structural properties of ZnNiO thin _ films deposited on Si substrates using rf-magnetron sputtering method have been investigated before and after the thermal annealing processes. The crystallinity of the ZnNiO thin film become degraded with increasing the Ni contents. This is mainly because the lattice of the thin film was expanded due to the oxygen-deficient conditions. Concerning the electrical properties of the thin film, the carrier concentration increases ($6.81\times10^{14}\textrm{cm}^{-2}$) and Hall mobility decreases (36.3 $\textrm{cm}^2$/Vㆍs) with higher doping concentration of Ni. However, the carrier concentration and Hall mobility became low ($1.10\times10^{14}\textrm{cm}^2$ and high (209.6 $\textrm{cm}^2$/Vㆍs), respectively, after the thermal annealing process at $1000 ^{\circ}C$. We also observed a strong luminescene center peaking at 546 nm in photoluminescence spectra, which was caused by a deep level center in the ZnO band gap with oxygen deficient ZnNiO structure.

High thermoelectric performance and low thermal conductivity in K-doped SnSe polycrystalline compounds

  • Lin, Chan-Chieh;Ginting, Dianta;Kim, Gareoung;Ahn, Kyunghan;Rhyee, Jong-Soo
    • Current Applied Physics
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    • 제18권12호
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    • pp.1534-1539
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    • 2018
  • SnSe single crystal showed a high thermoelectric zT of 2.6 at 923 K mainly due to an extremely low thermal conductivity $0.23W\;m^{-1}\;K^{-1}$. It has anisotropic crystal structure resulting in deterioration of thermoelectric performance in polycrystalline SnSe, providing a low zT of 0.6 and 0.8 for Ag and Na-doped SnSe, respectively. Here, we presented the thermoelectric properties on the K-doped $K_xSn_{1-x}Se$ (x = 0, 0.1, 0.3, 0.5, 1.5, and 2.0%) polycrystals, synthesized by a high-temperature melting and hot-press sintering with annealing process. The K-doping in SnSe efficiently enhances the hole carrier concentration without significant degradation of carrier mobility. We find that there exist widespread Se-rich precipitates, inducing strong phonon scattering and thus resulting in a very low thermal conductivity. Due to low thermal conductivity and moderate power factor, the $K_{0.001}Sn_{0.999}Se$ sample shows an exceptionally high zT of 1.11 at 823 K which is significantly enhanced value in polycrystalline compounds.

MOCVD에 의한 GaAs/AlGaAs 초격자 및 HEMT 구조의 성장 (Growth of GaAs/AlGaAs Superlattice and HEMT Structures by MOCVD)

  • 김무성;김용;엄경숙;김성일;민석기
    • 대한전자공학회논문지
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    • 제27권2호
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    • pp.81-92
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    • 1990
  • MOCVD에 의하여 초격자 및 HEMT 구조를 성장하고 그 특성을 보고한다. GaAs/AlGaAs의 경우, 주기성(periodicity),계면 급준성, Al 조성 균일성을 경사연마 및 double crystal x-ray 측정에 의하여 확인하였고, 고립 양자우물의 양자효과(quantum size effect)에 의한 PL(photoluminescence) 스펙트럼을 관측하였다. 이 PL FWHM (full width at half maximum)과 우물 두께의 관계로 부터 계면 급준성이 1 monolayer fluctuation 정도인 초격자 구조가 성장되었음을 확인하였다. 한편, HEMT 구조의 경우에 헤테로 계면에 형성된 2차원 전자층의 존재를 C-V profile, SdH(shu-bnikov-de Haas)진동, 저온 Hall 측정을 통하여 확인하였다. 저온 Hall 측정에서 15K에서 sheet carrier density $5.5{\times}10^{11}cm^-2$,mobility $69,000cm^2/v.sec$, 77K에서 sheet carrier density $6.6{\times}10^{11}cm^-2$, mobility $41,200cm^2/v.sec$ 이었다. 또한 quantum Hall effect 측정으로 부터 잘 형성된 SdH 진동 및 quantized Hall plateau를 관측하였다.

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Halo 구조의 MOSFET에서 이동도 감소 현상 (The Behavior of the Mobility Degradation in Pocket Implanted MOSFETS)

  • 이병헌;이기영
    • 대한전자공학회논문지SD
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    • 제42권4호
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    • pp.1-8
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    • 2005
  • 소오스와 드레인 근처에 포켓이온이 주입된 halo구조의 MOSFET에서 전송자의 이동도 감소는 포켓이온주입의 조건에 따라 이온화된 불순물의 증가에 따른 쿨롱(Coulomb) 산란율의 증가에 의한 이동도의 감소량보다 큰 이동도의 감소가 관측될 수 있다. 게이트 바이어스에 대한 이동도의 특성변화도 기존의 일차적인 쿨롱산란의 증가효과에 의한 해석과 비교하여 상이한 결과가 나타날 수 있음이 실험적으로 확인되고 있다. 본 연구에서는 포켓이온 주입에 의하여 쿨롱산란원이 되는 유효불순물 농도의 증가에 따른 일차적인 이동도의 감소효과를 벗어난 이동도 특성을 분석하여 이동도의 감소현상을 일반적으로 설명할 수 있는 개선된 해석적 모델을 제시하였다. 해석적인 결과를 도출하기 위하여 일차원 영역구분의 근사방법을 적용한 결과, 포켓이온 주입에 의하여 포논산란율 및 표면산란율(surface roughness scattering rate)의 증가도 이동도감소에 기여함이 보여 졌다. 채널의 전송자분포가 드레인 전류에 영향을 미치게 되므로 포켓이온에 의해 유발된 전송자분포의 효과를 분석하여 유효이동도가 추가적으로 감소함을 확인하였다.

Controlled Charge Carrier Transport and Recombination for Efficient Electrophosphorescent OLED

  • Chin, Byung-Doo;Choi, Yu-Ri;Eo, Yong-Seok;Yu, Jai-Woong;Baek, Heume-Il;Lee, Chang-Hee
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1418-1420
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    • 2008
  • In this paper, the light emitting efficiency, spectrum, and the lifetime of the phosphorescent devices, whose emission characteristics are strongly dominated not only by the energy transfer but also by the charge carrier trapping induced by the emissive dopant, are explained by differences in the energy levels of the host, dopant, and nearby transport layers. On the basis of our finding on device performance and photocurrent measurement data by time-of-flight (TOF), we investigated the effect of the difference of carrier trapping dopant and properties of the host materials on the efficiency roll-off of phosphorescent organic light emitting diode (OLED), along with a physical interpretation and practical design scheme, such as a multiple host system, for improving the efficiency and lifetime of devices.

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Pseudo MOSFET 기술에 의한 양성자 조사 SOl 웨이퍼의 캐리어 수명 분석 (Carrier Lifetime Analysis of Proton Irradiated SOl Wafer with Pseudo MOSFET Technology)

  • 정성훈;이용현;이재성;권영규;배영호
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.732-736
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    • 2009
  • Protons are irradiated into SOl wafers under total dose of 100 krad, 500 krad, 1 Mrad and 2 Mrad to analyze the irradiation effect. The electrical properties are analyzed by pseudo MOSFET technology after proton irradiation. The wafers are annealed to stabilize generated defects in a nitrogen atmosphere at $300^{\circ}C$ for 1 hour because proton irradiation induces a lot of unstable defects in the surface silicon film. Both negative and positive turn-on voltages are shifted to negative direction after the irradiation. The more proton total dose, the more turn on voltage shifts. It means that positive oxide trap charge is generated in the buried oxide(BOX). The minority carrier lifetime which is analyzed by the drain current transient characteristics decreases with the increase of proton total dose. The proton irradiation makes crystal defects in the silicon film, and consequently, the crystal defects reduce the carrier lifetime and mobility. As these results, it can be concluded that pseudo MOSFET is a useful technology for the analysis of irradiated SOI wafer.

Direct Measurement of Diffusion Length in Mixed Lead-halide Perovskite Films Using Scanning Photocurrent Microscopy

  • Kim, Ahram;Son, Byung Hee;Kim, Hwan Sik;Ahn, Yeong Hwan
    • Current Optics and Photonics
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    • 제2권6호
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    • pp.514-518
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    • 2018
  • Carrier diffusion length in the light-sensitive material is one of the key elements in improving the light-current conversion efficiency of solar-cell devices. In this paper, we measured the carrier diffusion length in lead-halide perovskite ($MAPbI_3$) and mixed lead-halide ($MAPbI_{3-x}Cl_x$) perovskite devices using scanning photocurrent microscopy (SPCM). The SPCM signal decreased as we moved the focused laser spot away from the metal contact. By fitting the data with a simple exponential curve, we extracted the carrier diffusion length of each perovskite film. Importantly, the diffusion length of the mixed-halide perovskite was higher than that of the halide perovskite film by a factor of 3 to 6; this is consistent with the general expectation that the carrier mobility will be higher in the case of the mixed lead-halide perovskites. Finally, the diffusion length was investigated as a function of applied bias for both samples, and analyzed successfully in terms of the drift-diffusion model.

MANET에서 처리율 향상을 위한 SINR 기반 동적 캐리어 감지 임계값 방법 (Dynamic Carrier Sensing Threshold Scheme based on SINR for Throughput Improvement in MANET)

  • 이현노;김동회
    • 디지털콘텐츠학회 논문지
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    • 제15권3호
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    • pp.319-326
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    • 2014
  • IEEE 802.11 무선랜은 CSMA/CA(Carrier Sense Multiple Access/Collision Avoidance) 방식의 MAC(Media Access Control) 프로토콜을 사용하며, 데이터 충돌을 회피하기 위하여 데이터 전송 시 다른 사용자가 채널을 사용하고 있는지를 캐리어 감지를 통해 확인하게 된다. 현재 IEEE 802.11 표준에서는 캐리어 감지 범위에 영향을 주는 임계값을 일정한 고정 값으로 운용을 하고 있는데, 모바일 Ad-hoc 네트워크와 같이 이동성으로 인해 가변성이 큰 경우에는 고정 특정 캐리어 감지 임계값으로는 효율적인 네트워크 운영이 어렵다. 본 논문에서는 신호대간섭잡음비를 고려하여 캐리어 감지 임계값과 전송속도를 적절히 선택하는 제안된 SINR 기반 동적 캐리어 감지 임계값 방법을 모바일 Ad-hoc 네트워크 환경에 맞게 운영을 함으로써 더 좋은 네트워크 처리율을 얻을 수 있음을 보여준다.