Fully CMOS-compatible Process Integration of Thin film Inductor with a Sputtered Bottom NiFe Core (스퍼터링 방법으로 증착된 하층 NiFe 코어를 갖는 박막인덕터의 CMOS 집적화 공정)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.16 no.2
- /
- pp.138-143
- /
- 2003