• Title/Summary/Keyword: CMOS게이트

Search Result 368, Processing Time 0.024 seconds

XOR Gate Based Quantum-Dot Cellular Automata T Flip-flop Using Cell Interaction (셀 간 상호작용을 이용한 XOR 게이트 기반의 양자점 셀룰러 오토마타 T 플립플롭)

  • Yu, Chan-Young;Jeon, Jun-Cheol
    • The Journal of the Convergence on Culture Technology
    • /
    • v.7 no.1
    • /
    • pp.558-563
    • /
    • 2021
  • Quantum-Dot Cellular Automata is a next-generation nanocircular design technology that is drawing attention from many research organizations not only because it is possible to design efficient circuits by overcoming the physical size limitations of existing CMOS circuits, but also because of its energy-efficient features. In this paper, one of the existing digital circuits, T flip-flop circuit, is proposed using QCA. The previously proposed T flip-flops are designed based on the majority gate, so the circuits are complex and have long delays. Therefore, the design of the XOR gate-based T flip-flop using cell interaction reduces circuit complexity and minimizes latency. The proposed circuit is simulated using QCADesigner, and the performance is compared and analyzed with the existing proposed circuits.

A Study on the Analog/Digital BCDMOS Technology (아날로그/디지탈 회로 구성에 쓰이는 BCDMOS소자의 제작에 관한 연구)

  • Park, Chi-Sun
    • Journal of the Korean Institute of Telematics and Electronics
    • /
    • v.26 no.1
    • /
    • pp.62-68
    • /
    • 1989
  • In this paper, Analog/Digital BCDMOS technology that the bipolar devices for driver applications CMOS devices for logic applications, and DMOS devices for high voltage applications is pressented. An optimized poly-gate p-well CMOS process is chosen to fabricate the BCDMOS, and the basic concepts to desigh these devices are to improve the characteristics of bipolar, CMOS & DMOS with simple process technology. As the results, $h_{FE}$ value is 320 (Ib-$10{\mu}A$ for bipolar npn transistor, and there is no short channel effects for CMOS devices which have Leff to $1.25{\mu}m$ and $1.35{\mu}m$ for n-channel and p-channel, respectively. Finally, breakdown voltage is obtained higher than 115V for DMOS device.

  • PDF

Simultaneous Switching Characteristic Analysis and Design Methodology of High-Speed & High-Density CMOS IC Package (고밀도 고속 CMOS 집적회로에서 동시 스위칭에 의한 패키지 영향해석 및 패키지 설계방법)

  • 박영준;최진우;어영선
    • Journal of the Korean Institute of Telematics and Electronics C
    • /
    • v.36C no.11
    • /
    • pp.55-63
    • /
    • 1999
  • A new CMOS If Package design methodology is presented, analyzing the electrical characteristics of a package and its effects on the CMOS digital circuits. An analytical investigation of the package noise effects due to the simultaneous switching of the gates within a chip, i.e., simultaneous switching noise (SSN) is performed. Then not only are novel design formula to meet electrical constraints of the Package derived, but also package design methodology based on the formula is proposed. Further, in order to demonstrate the Proposed design methodology, the design results are compared with HSPICE (a general purpose circuit simulator) simulation for $0.3\mu\textrm{m}$-based CMOS circuits. According to the proposed design procedures, it is shown that the results have excellent agreements with those of HSPICE simulation.

  • PDF

Small signal model and parameter extraction of SOI MOSFET's (SOI MOSFET's의 소신호 등가 모델과 변수 추출)

  • Lee, Byung-Jin;Park, Sung-Wook;Ohm, Woo-Yong
    • 전자공학회논문지 IE
    • /
    • v.44 no.2
    • /
    • pp.1-7
    • /
    • 2007
  • The increasing high frequency capabilities of CMOS have resulted in increased RF and analog design in CMOS. Design of RF and analog circuits depends critically on device S-parameter characteristics, magnitude of real and imaginary components and their behavior as a function of frequency. Utilization of scaled high performance CMOS technologies poses challenges as concerns for reliability degradation mechanisms increase. It is important to understand and quantify the effects of the reliability degradation mechanisms on the S-parameters and in turn on small signal model parameters. Various physical effects influencing small-signal parameters, especially the transconductance and capacitances and their degradation dependence, are discussed in detail. The measured S-parameters of H-gate and T-gate devices in a frequency range from 0.5GHz to 40GHz. All intrinsic and extrinsic parameters are extracted from S-parameters measurements at a single bias point in saturation. In this paper we discuss the analysis of the small signal equivalent circuits of RF SOI MOSFET's verificated for the purpose of exacting the change of parameter of small signal equivalent model followed by device flame.

An Efficient Dead Pixel Detection Algorithm and VLSI Implementation (효율적인 불량화소 검출 알고리듬 및 하드웨어 구현)

  • An Jee-Hoon;Lee Won-Jae;Kim Jae-Seok
    • Journal of the Institute of Electronics Engineers of Korea SD
    • /
    • v.43 no.9 s.351
    • /
    • pp.38-43
    • /
    • 2006
  • In this paper, we propose the efficient dead pixel detection algorithm for CMOS image sensors and its hardware architecture. The CMOS image sensors as image input devices are becoming popular due to the demand for miniaturized, low-power and cost-effective imaging systems. However, the presence of the dead pixels degrade the image quality. To detect the dead pixels, the proposed algorithm is composed of scan, trace and detection step. The experimental results showed that it could detect 99.99% of dead pixels. It was designed in a hardware description language and total logic gate count is 3.2k using 0.25 CMOS standard cell library.

Research on PAE of CMOS Class-E Power Amplifier For Multiple Antenna System (다중 안테나 시스템을 위한 CMOS Class-E 전력증폭기의 효율 개선에 관한 연구)

  • Kim, Hyoung-Jun;Joo, Jin-Hee;Seo, Chul-Hun
    • Journal of the Institute of Electronics Engineers of Korea TC
    • /
    • v.45 no.12
    • /
    • pp.1-6
    • /
    • 2008
  • In this paper, bias control circuit structure have been employed to improve the power added efficiency of the CMOS class-E power amplifier on low input power level. The gate and drain bias voltage has been controlled with the envelope of the input RF signal. The proposed CMOS class-E power amplifier using bias controlled circuit has been improved the PAE on low output power level. The operating frequency is 2.14GHz and the output power is 22dBm to 25dBm. In addition to, it has been evident that the designed the structure has showed more than a 80% increase in PAE for flatness over all input power level, respectively.

Investigation of the Characteristic of Latch-up of 0.1 ${\mu}{\textrm}{m}$ Gate Length CMOS (0.1${\mu}{\textrm}{m}$ 게이트 길이의 CMOS소자의 Latch-up 특성에 대한 연구)

  • 김연태;원태영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 1994.11a
    • /
    • pp.164-167
    • /
    • 1994
  • In this Study, we design the process of 0.1$\mu\textrm{m}$ gate length CMOS that is immunized against Latch-up, and investigate the characteristic of Latch-up of this device by the design rule of layout. Using TSUPREM4 and MEDICI, we design the device and simulate the variable characteristics of it we could understand that the characteristic of Latch-up is changed for the better by varying the critical factor of it. We also investigate the structure of CMOS that can be immunized against Latch-up.

A Study on the 0.5μm Dual Gate High Voltage CMOS Process for Si Liquid Display System (실리콘 액정표시 장치 시스템을 위한 00.5μm 이중 게이트 고전압 CMOS 공정 연구)

  • 송한정
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.15 no.12
    • /
    • pp.1021-1026
    • /
    • 2002
  • As the development of semiconductor process technology continue to advance, ICs continue their trend toward higher performance low power system-on-chip (SOC). These circuits require on board multi power supply. In this paper, a 0.5 ㎛ dual date oxide CMOS Process technology for multi-power application is demonstrated. 5 V and 20 V devices fabricated by proposed process is measured. From 5 V devices using dual gate precess, we got almost the same characteristics as are obtained from standard 5 V devices. And the characteristics of the 20 V device demonstrates that 3 ㎛ devices with minimum gate length are available without reliability degradation. Electrical parameters in minimum 3 ㎛ devices are 520 ㎂/㎛ current density, 120 ㎷ DIBL, 24 V BV for NMOS and ,350 ㎂/㎛ current density, 180 ㎷ DIBL, 26 V BV for PMOS, respectively.

A Design of Low Power ELM Adder with Hybrid Logic Style (하이브리드 로직 스타일을 이용한 저전력 ELM 덧셈기 설계)

  • 김문수;유범선;강성현;이중석;조태원
    • Journal of the Korean Institute of Telematics and Electronics C
    • /
    • v.35C no.6
    • /
    • pp.1-8
    • /
    • 1998
  • In this paper, we designed a low power 8bit ELM adder with static CMOS and hybrid logic styles on a chip. The designed 8bit ELM adder with both logic styles was fabricated in a 0.8$\mu\textrm{m}$ single-poly double-metal, LG CMOS process and tested. Hybrid logic style consists of CCPL(Combinative Complementary Pass-transistor Logic), Wang's XOR gate and static CMOS for critical path which determines the speed of ELM adder. As a result of chip test, the ELM adder with hybrid logic style is superior to the one with static CMOS by 9.29% in power consumption, 14.9% in delay time and 22.8% in PDP(Power Delay Product) at 5.0V supply voltage, respectively.

  • PDF