• Title/Summary/Keyword: Bipolar process

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Design of a Latchup-Free ESD Power Clamp for Smart Power ICs

  • Park, Jae-Young;Kim, Dong-Jun;Park, Sang-Gyu
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.8 no.3
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    • pp.227-231
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    • 2008
  • A latchup-free design based on the lateral diffused MOS (LDMOS) adopting the "Darlington" approaches was designed. The use of Darlington configuration as the trigger circuit results in the reduction of the size of the circuit when compared to the conventional inverter driven RC-triggered MOSFET ESD power clamp circuits. The proposed clamp was fabricated using a $0.35{\mu}m$ 60V BCD (Bipolar CMOS DMOS) process and the performance of the proposed clamp was successfully verified by TLP (Transmission Line Pulsing) measurements.

Multi Function IGBT Gate Driver Including Arm Short Protection (Arm Short 보호 기능을 포함한 다기능 IGBT GATE DRIVER)

  • 이경복;조국춘;최종묵
    • Proceedings of the KSR Conference
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    • 2000.05a
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    • pp.202-209
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    • 2000
  • This paper introduces the main function and protection method of IGBT gate driver that designed by KOROS. Recently, the applications of insulated gate bipolar transistors(IGBTs) have expanded widely, particularly in the area of railway converters. This driver is suitable for railway traction applications, so they are designed for circumstance of railway vehicle such as vibration. The input control power for this driver is supplied from battery charger of railway. it is no necessary an isolated power supply board or auxiliary power supply, with substantial savings in cost and space in railway applications. This gate driver can be used wide range of input voltage. So, performance of the driver has no relation with the battery voltage(70V∼110V). The protection methods of IGBT gate driver have many kind of ways, but this gate driver it designed to apply to converter for railway system, so this gate driver includes protection for arm short current and low control power voltage, etc. And the process of protection method and protection reference value are optimized by means of sufficient test with our own facilities.

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Reverse-Conducting IGBT Using MEMS Technology on the Wafer Back Side

  • Won, Jongil;Koo, Jin Gun;Rhee, Taepok;Oh, Hyung-Seog;Lee, Jin Ho
    • ETRI Journal
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    • v.35 no.4
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    • pp.603-609
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    • 2013
  • In this paper, we present a 600-V reverse conducting insulated gate bipolar transistor (RC-IGBT) for soft and hard switching applications, such as general purpose inverters. The newly developed RC-IGBT uses the deep reactive-ion etching trench technology without the thin wafer process technology. Therefore, a freewheeling diode (FWD) is monolithically integrated in an IGBT chip. The proposed RC-IGBT operates as an IGBT in forward conducting mode and as an FWD in reverse conducting mode. Also, to avoid the destructive failure of the gate oxide under the surge current and abnormal conditions, a protective Zener diode is successfully integrated in the gate electrode without compromising the operation performance of the IGBT.

Fabrication and Characterization of the Silicon Vertical Hall Devices (실리콘 종형 홀 소자의 제조 및 그 특성)

  • 류지구;최세곤
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.3
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    • pp.72-78
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    • 1992
  • The Silicon vertical Hall devices are fabricated using standard bipolar process and characterized in terms of the Hall voltage, sensitivities, and offset voltage. The Hall voltage and sensitivity of the devices showed good linearity with respect to the magnetic flux density and reverse supply voltage Vr. The sensitivity of device with P$^{+}$ isolation dam has been increased up to 1.2 times compared to that of device without the dam. With the condition of V$_{r}$=-5.0[V], B=0.4[T] and I$_{sup}$=1.0[mA], the Hall voltage and sensitivity of the device with P$^{+}$ isolation dam were about 29[mV] and 74[V/AT], respectively. These vertical Hall devices can be used as the adjustable magnetic fields sensor.

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A Study of Substrate Surface Treatment and Metal Pattern Formation using Inkjet Printing Technology (잉크젯 프린팅 기술을 이용한 기판 표면처리와 금속 패턴 형성에 관한 연구)

  • Jo, Yong-Min;Park, Sung-Jun
    • Journal of ILASS-Korea
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    • v.17 no.1
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    • pp.20-26
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    • 2012
  • Inkjet printing is one of the direct writing technologies and is able to form a pattern onto substrate by dispensing droplets in desired position. Also, by inkjet technology manufacturing time and production costs can be reduced, and procedures can be more efficient. To form a metal pattern, it must be harmonized with conductive nano ink, printing process, sintering, and surface treatment. In this study, micro patterning of conductive line has been investigated using the piezoelectric printhead driven by a bipolar voltage signal is used to dispense $20-40{\mu}m$ diameter droplets and silver nano ink which consists of 50 nm silver particles. In addition, hydrophobic treatment of surface, overlap printing techniques, and sintering conditions with changing temperature and times to achieve higher conductivity.

Ab ovo or de novo? Mechanisms of Centriole Duplication

  • Loncarek, Jadranka;Khodjakov, Alexey
    • Molecules and Cells
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    • v.27 no.2
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    • pp.135-142
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    • 2009
  • The centrosome, an organelle comprising centrioles and associated pericentriolar material, is the major microtubule organizing center in animal cells. For the cell to form a bipolar mitotic spindle and ensure proper chromosome segregation at the end of each cell cycle, it is paramount that the cell contains two and only two centrosomes. Because the number of centrosomes in the cell is determined by the number of centrioles, cells have evolved elaborate mechanisms to control centriole biogenesis and to tightly coordinate this process with DNA replication. Here we review key proteins involved in centriole assembly, compare two major modes of centriole biogenesis, and discuss the mechanisms that ensure stringency of centriole number.

Magnetic Sensitivity Improvement of Silicon Vertical Hall Device (Si 종형 Hall 소자의 자기감도 개선)

  • Ryu, Ji-Goo;Kim, Nam-Ho;Chung, Su-Tae
    • Journal of Sensor Science and Technology
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    • v.20 no.4
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    • pp.260-265
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    • 2011
  • The silicon vertical hall devices are fabricated using a modified bipolar process. It consists of the thin p-layer at Si-$SiO_2$, interface and n-epi layer without $n^+$buried layer to improve the sensitivity and influence of interface effects. Experimental samples are a sensor type I with and type H without p+isolation dam adjacent to the center current electrode. The experimental results for both type show a more high current-related sensitivity than the former's vertical hall devices. The sensitivity of type H and type I are about 150 V/AT and 340 V/AT, respectively. This sensor's behavior can be explained by the similar J-FET model.

A study on the method for calculating the base-collector breakdown voltage of NPN BJT for integrated circuits (집적회로용 NPN BJT의 베이스-컬렉터간 역방향 항복전압 계산 방법에 관한 연구)

  • Lee, Eun-Gu;Lee, Dong-Ryul;Kim, Tae-Han;Kim, Cheol-Seong
    • Proceedings of the KIEE Conference
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    • 2002.11a
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    • pp.137-140
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    • 2002
  • The algorithm for calculating the base-collector breakdown voltage of NPN BJT(Bipolar Junction Transistor) for integrated circuits is proposed. The method for calculating the electric field using the solution of Poisson's equation is presented and the method for calculating the breakdown voltage using the integration of ionization coefficients is presented. The base-collector breakdown voltage of NPN BJT using 20V process obtained from the proposed method shows an averaged relative error of 8.0% compared with the measured data.

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Study of the 1,200 V-Class Floating Island IGBT (1,200 V급 Floating Island IGBT의 관한 연구)

  • Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.9
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    • pp.523-526
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    • 2016
  • This paper was researched about 1,200 V level floating island IGBT (insulated gate bipolar transistor). Presently, 1,200 V level IGBT is used in Inverter for distributed power generation. We analyzed and compared electrical charateristics of the proposed floating island IGBT and conventional IGBT. For analyzing and comparison, we used T-CAD tool and simulated the electrical charateristics of the devices. And we extracted optimal design and process parameter of the devices. As a result of experiments, we obtained 1,456 V and 1,459 V of breakdown voltages, respectively. And we obatined 4.06 V and 4.09 V of threshold voltages, respectively. On the other hand, on-state voltage drop of floating island IGBT was 3.75 V. but on-state vlotage drop of the conventional IGBT was 4.65 V. Therefore, we almost knew that the proposed floating island IGBT was superior than the conventional IGBT in terms of power dissipation.

A Diagnostic Study of Pulsed Plasma Process for Reactive Deposition (반응성 증착용 펄스 플라즈마 공정의 진단)

  • Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.45 no.4
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    • pp.168-173
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    • 2012
  • A real-time monitoring of an immersed antenna type inductively coupled plasma (ICP) was done with optical emission spectroscopy (OES) to check the reports that sputtered atom density is decreasing as the ICP power is increased. At 10 mTorr pressure of Ar, Mg was sputtered by a bipolar pulsed power supply into 2 MHz ICP which has an insulator covered 2.5 turn antenna. Emitted light was collected in two different positions: above the target and inside the ICP region. With 100 W of Mg sputtering power, the intensities of Mg I (285.06 nm), Mg II (279.48 nm), Ar I (420.1 nm) were increased constantly with ICP power from 100 W to 600 W. At 500 W, the intensity of $Mg^+$ exceeded that of Mg under PID controlled discharge voltage of 180 V. The ratio of Mg II/Mg I was increased from 0.45 to 2.71 approximately 6 times.