• JSTS:Journal of Semiconductor Technology and Science
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• 제15권6호
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• pp.601-607
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• 2015

A set of novel silicon controlled rectifier (SCR) devices' characteristics have been analyzed and verified under the electrostatic discharge (ESD) stress. A ring-shaped diffusion was added to their anode or cathode in order to improve the holding voltage (Vh) of SCR structure by creating new current discharging path and decreasing the emitter injection efficiency (${\gamma}$) of parasitic Bipolar Junction Transistor (BJT). ESD current density distribution imitated by 2-dimensional (2D) TCAD simulation demonstrated that an additional current path exists in the proposed SCR. All the related devices were investigated and characterized based on transmission line pulse (TLP) test system in a standard $0.5-{\mu}m$ 24 V CDMOS process. The proposed SCR devices with ring-shaped anode (RASCR) and ring-shaped cathode (RCSCR) own higher Vh than that of Simple SCR (S_SCR). Especially, the Vh of RCSCR has been raised above 33 V. What's more, their holding current is kept over 800 mA, which makes it possible to design power clamp with SCR structure for on chip ESD protection and keep the protected chip away from latch-up risk.

• 전기전자학회논문지
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• 제24권3호
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• pp.890-894
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• 2020

본 논문에서는 대표적인 ESD 보호소자인 LVTSCR의 구조적 변화를 통해 높은 홀딩전압 특성을 가지는 ESD 보호소자를 제안한다. 제안된 ESD 보호소자는 병렬 PNP path와 긴 N+ drift 영역을 삽입하여 기존의 LVTSCR보다 높은 홀딩전압을 가지며, 일반적인 SCR 기반 ESD보호소자의 단점인 Latch-up 면역특성을 향상시킨다. 또한 기생 BJT들의 유효 베이스 폭을 설계변수로 설정하였으며, N-Stack 기술을 적용하여 요구되는 application에 적용할 수 있도록 시놉시스사의 TCAD 시뮬레이션을 통해 제안된 ESD 보호소자의 전기적 특성을 검증하였다.

• 한국통신학회논문지
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• 제16권11호
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• pp.1071-1083
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• 1991

본 논문에서는 InGaAs APD와 GaAs MESFET를 이용하여 광 수신 전치증폭기의 설계와 제작에 대하여 논의 하였다. 3단 전달 임피던스형 광 수신 전치 증폭기에 대하여 분석하였으며 마이크로스트립을 이용하여 실현 시켰다. 실현된 광수 신전치 증폭기의 성능을 컴퓨터 시뮬레이션에 의하여 예측할 수 있었으며 이론값을 실험한 결과와 비교하였다. 설계 제작한 혼합 마이크로파 집적회로 형태의 광 수신 전치 증폭기는 대역폭이 380MHz이었으며 565Mb/s, $BER10^9$에서 수신기의 감도는 -40.6dBm을 보였다.

• Transactions on Electrical and Electronic Materials
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• 제5권2호
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• pp.71-75
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• 2004

This paper proposes a new bandgap reference (BGR) circuit which takes advantage of a cascode current mirror biasing to reduce the V$\_$ref/ variation, and sizing technique, which utilizes two related ratio numbers k and N, to reduce the PNP BJT area. The proposed BGR is designed and fabricated on a test chip with a goal to provide a reference voltage to the 10 bit A/D(4-4-4 pipeline architecture) converter of the CMOS Active Pixel Sensor (APS) imager to be used in X-ray imaging. The basic temperature variation effect on V$\_$ref/ of the BGR has a maximum delta of 6 mV over the temperature range of 25$^{\circ}C$ to 70$^{\circ}C$. To verify that the proposed BGR has radiation hardness for the X-ray imaging application, total ionization dose (TID) effect under Co-60 exposure conditions has been evaluated. The measured V$\_$ref/ variation under the radiation condition has a maximum delta of 33 mV over the range of 0 krad to 100 krad. For the given voltage, temperature, and radiation, the BGR has been satisfied well within the requirement of the target 10 bit A/D converter.

• JSTS:Journal of Semiconductor Technology and Science
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• 제16권4호
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• pp.443-450
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• 2016

The linearization technique for low noise amplifier (LNA) has been implemented in standard $0.18-{\mu}m$ BiCMOS process. The MOS-BJT derivative superposition (MBDS) technique exploits a parallel LC tank in the emitter of bipolar transistor to reduce the second-order non-linear coefficient ($g_{m2}$) which limits the enhancement of linearity performance. Two feedback capacitances are used in parallel with the base-collector and gate-drain capacitances to adjust the phase of third-order non-linear coefficients of bipolar and MOS transistors to improve the linearity characteristics. The MBDS technique is also employed cascode configuration to further reduce the second-order nonlinear coefficient. The proposed LNA exhibits gain of 9.3 dB and noise figure (NF) of 2.3 dB at 2 GHz. The excellent IIP3 of 20 dBm and low-power power consumption of 5.14 mW at the power supply of 1 V are achieved. The input return loss ($S_{11}$) and output return loss ($S_{22}$) are kept below - 10 dB and -15 dB, respectively. The reverse isolation ($S_{12}$) is better than -50 dB.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 D
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• pp.3124-3126
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• 2000

The application of IR(Infrared) communication is very wide and IR receiver has become a standard of home entertainment. A preamplifier with single 5V supply was designed for IR receiver IC. To operate at long distance, receiver IC should have high gain and low noise characteristic. To provide constant output signal magnitude, independent of transciever distance, gain limiting stage is needed. And to cut-off DC noise component effectively, large resistance and capacitance are required. Transimpedance type preamplifier, and diode limiting amplifier, and current limiting amplifier were designed. It is another function of current limiting amplifier that transforms single input signal to differential output signal. Using AMS BiCMOS model, both BJT version and MOS version was designed. Total power consumption is O.lmW, and IC size is $0.3mm^2$

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권3호
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• pp.381-389
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• 2015

A fully integrated multistandard multiband CMOS mobile TV tuner with small silicon area and low power consumption is proposed for receiving multiple mobile digital TV signals and FM signal. In order to reduce the silicon area of the multistandard multiband receiver, other RF front-end circuits except LNAs are shared and a local oscillator (LO) signal generation architecture with a single VCO for a frequency synthesizer is proposed. To reduce the low frequency noise and the power consumption, a vertical NPN BJT is used in an analog baseband circuits. The RF tuner IC is implemented in a $0.18-{\mu}m$ CMOS technology. The RF tuner IC satisfies all specifications for DVB-H/T, T-DMB, and ISDB-T with a sufficient margin and a successful demonstration has been carried out for DVB-H/T, T-DMB, and ISDB-T with a digital demodulator.

• 한국위성정보통신학회논문지
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• 제7권2호
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• pp.18-24
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• 2012

본 논문에서는 ESD 방지를 위한 최적 방법론에 목표하여 확장된 드레인을 갖는 EDNMOS 소자의 더블 스냅백 현상 및 백그라운 도핑 농도 (BDC)의 영향을 조사하였다. 고전류 영역에서 낮은 BDC를 가진 EDNMOS 소자는 강한 스냅백으로 인해 취약한 ESD 성능과 높은 래치업 위험을 가지게 되나, 높은 BDC를 가진 EDNMOS 소자는 스냅백을 효과적으로 방지할 수 있음을 알 수 있었다. 따라서 BDC 제어로 안정적인 ESD 방지 성능과 래치업 면역을 구현할 수 있음을 밝혔다.

• 한국정보통신학회논문지
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• 제12권1호
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• pp.137-142
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• 2008

본 논문에서는 $Low-V_T$ 트랜지스터가 필요 없는 로직공정으로 Parasitic NPN BJT를 이용하여 저 전압에서 동작 가능한 밴드갭 기준전압 발생기 회로를 제안하였다. $0.18{\mu}m$ triple-well 공정을 사용한 BGR회로를 측정 한 결과 VREF의 평균전압은 0.72V $3{\sigma}$는 45.69mV로 양호하게 측정되었다.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2004년도 학술대회지
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• pp.717-722
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• 2004

A design was done, and all characteristic of photodetectr of the web pattern type which a standard process of the Bipolar which Si PIN structure was used in this paper, and was used for the current amplifier design was used, and high-speed, was used as receiving optcal area of high altitude, and the module which had a low dark current characteristic was implemented with one chip with a base. Important area decreases an area of Ie at the time of this in order to consider an electrical characteristic and economy than the existing receiving IC, and performance of a product and confidence are got done in incense. First of all, the receiving IC which a spec, pattern of a wafer to he satisfied with the following electrical optical characteristic that produced receiving IC of 5V and structure are determined, and did one-chip is made. On the other hand, the time when AR layer of double is $Si_{3}N_{4}/SiO_{2}=1500/1800$ has an optical reflectivity of less than $10{\%}$ on an incidence optical wavelength of 660 ,and, in case of photo detector which reverse voltage made with 1.8V runs in 1.65V, an error about a change of thickness is very the thickness that can be improved surely. And, as for the optical current characteristic, about 5 times increases had the optical current with 274nA in 55nA when Pc was -27dBm. A BJT process is used, and receiving IC running electricity suitable for low voltage and an optical characteristic in minimum 1.8V with a base with two phases is made with one chip. IC of low voltage operates in 1.8V and 3.0V at the same time, and optical link receiving IC is going to be implemented