• 한국전기전자재료학회논문지
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• 제18권6호
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• pp.499-505
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• 2005

We compared the effects of a representative aromatic acid amplifier, 2-hydroxy-2'-tosylory biphenyl, doped in poly(tort-butyl methacrylate) (PTBMA), poly (tetrahydropyranylmethacrylate) (pTHPMh) or poly[tert-butoxycarbonyloxystyrene) (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 60 min in pTBMA and pTBOCST film and up to 10 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA film doped with the acid amplifier showed 9 times and 3 times higher photosensitivity, respectively. But pTBOCST film showed a negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability of the acid amplifier were found to be affected by the resin.

• 공업화학
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• 제16권2호
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• pp.262-266
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• 2005

대표적인 지방족 산증식제인 4-hydroxy-4'-p-tosyloxy isopropylidene dicyclohexane을 산에 민감한 고분자인 poly[tert-butyl methacrylate] (pTBMA), poly[tetrahydropyranylmethacrylate] (pTHPMA) 및 poly[tert-butoxycarbonyloxystyrene] (pTBOCST) 수지에 첨가하여 열적 안정성과 감도 증진의 관점에서 산증식제의 효과를 비교하였다. 산증식제는 pTBMA 또는 pTBOCST 필름에서는 $120^{\circ}C$에서 20 min까지 안정하였으며, pTHPMA 필름에서는 5 min까지 안정하였다. 산증식제를 첨가한 레지스트의 감도 증진효과는 pTBMA는 4배, pTHPMA는 2배 정도 증진되었지만, pTBOCST의 경우는 감도 증진효과가 미미하였다. 이를 통하여 산증식제의 감도 증진효과와 열적 안정성은 수지의 종류에 따라 다르게 나타나는 것을 알 수 있었다.

• 공업화학
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• 제16권5호
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• pp.660-663
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• 2005

새로운 산증식제를 개발하기 위하여 2-hydroxyphenyl-4-methylbenzenesulfonate (1), 3-hydroxyphenyl-4-methylbenzene-sulfonate (2), 4-hydroxyphenyl-4-methylbenzenesulfonate (3)가 우수한 열적 성질을 갖는 방향족 산증식제로서 합성되었다. 이러한 새로운 산증식제들은 광산발생제로부터 생성된 소량의 산에 의해 자동촉매반응으로 p-톨루엔술포산을 생성하였다. 이러한 방향족 술포산 에스터들은 poly(tert-butyl methacrylate, PtBMA) 필름에서 우수한 열적 안정성을 보였고 감도증진제로서 작용하는 최초의 방향성 산증식제임이 증명되었다. 화학 증폭형 포토레지스트에 합성한 방향족 산중식제를 첨가한 경우에 감도가 3~6배 정도 증진되었다.

• 대한화학회지
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• 제48권1호
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• pp.39-45
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• 2004

산에 민감한 작용기를 갖는 tert-butyl methacrylate(tBMA)와 산 증식 기능을 갖는 4-hydroxy-4''p-styrenesulfonyloxyisopropylidene dicyclohexane(HSI)과 4-p-styrenesulfonyloxy-4''-tosyloxyisopropylidene dicyclohexane (STI)를 둘 다 함께 갖고 있는 공중합체를 새로운 고분자 산증식형 포토레지스트로 합성하였다. 산증식형 공중합체인 Poly(HSI-co-tBMA) film과 Poly(STI-co-tBMA) film은 산의 부재 시에는 레지스트 공정 온도에 대하여 충분한 열적 안정성을 나타내었다. Poly(STI-co-tBMA) film의 감도는 tBMA homopolymer에 비교하여 2배 정도 증진되었지만, Poly(HSI-co-tBMA) film은 오히려 2배 정도 감도가 저하되는 결과를 나타내었다. 고분자에 도입한 이러한 산증식 기능을 갖는 그룹의 구조에 따라 광감도 증진 효과가 다르게 나타남을 확인하였다.

• 한국인쇄학회지
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• 제20권1호
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• pp.91-101
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• 2002

An acid amplifier is defined as an acid-generating agent which is decomposed autocatalytically to produce new strongly acidic molecules in a non-liner manner, The addition of the acid amplifiers to conventional chemically amplified photoresists consisting of photoacid generators and acid-sensitive polymers result in the improvement of photosensitivity due to the amplified generation of catalytic acid molecules as a result of the decomposition of acid amplifiers. We synthesized and evaluated 1-hydroxy-4-tosyloxy cyclohexane(AA-1) and 1,4-ditosyloxy cyclohexane(Ah-2) as novel acid amplifiers. The acid amplifiers(AA-1, AA-2) showed reasonable thermal stability for resist processing temperature. As estimated by the sensitivity curve, tort-butyl methacrylate homopolymer(ptBMA) film doped with AA-1 or 2 exhibited much higher photosensitivity than ptBMA film without AA-1 or 2. And AA-1 showed higher effect than AA-2 on enhancing photosensitivity of ptBMA film.

• Korean Chemical Engineering Research
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• 제43권3호
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• pp.393-400
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• 2005

산증식제가 가지고 있는 산증식 능력을 측정하기 위한 새로운 평가 방법이 연구되어지고 있다. 그 방법은 UV 조사에 따른 산의 발생으로 인한 전도도 변화를 측정하는 것에 그 원리를 두고 있다. 본 연구자는 실험을 통해 다음과 같은 사실을 알 수 있었다. Inks film의 UV 경화반응 동안의 epoxy monomer의 광중합과 UV 경화율에 의해 전기 전도도가 감소하게 된다는 것이다. 본 논문에서는 새로운 산증식제를 합성하고, 합성된 산증식제의 열적 안정성을 DSC로 측정하였다. 여기서는 mono-type의 산증식제가 di-type의 산증식제보다 열적으로 더 안정하였다. 이러한 결과를 바탕으로 경화과정에 있어 UV 경화형 ink의 경화속도를 동적으로 평가할 수 있었다.

• 한국전기전자재료학회논문지
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• 제17권8호
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• pp.806-811
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• 2004

1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.

• 한국인쇄학회지
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• 제20권2호
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• pp.131-140
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• 2002

Chemically amplified deep UV(CA-DUV) resists are typically based on a combination of an acid labile polymer and a photoacid generator(PAG) but acid amplification type photoresist is formulated by addition of the acid amplifiers to chemically amplified resist system(CAPs). We developed acid amplifiers base on cyclohexanediol such as 1-methacryloyloxy-4-tosyloxy cyclohexane(MTC) and poly(MTC$_{10}$-co-tBMA$_{90}$)(P-1) to enhance photosensitivity. P-1 is a copolymer of tert-butyl methacrylate and MTC as a positive working photoresist based on polymeric acid amplifier in order to enhance photosensitivity and simplify the process of fomulating a photoresist. P-1 exhibited 2X higher photosensitivity compared with PtBMA. The acid amplifiers showed reasonable thermal stability for resist processing temperature and higher photosensitivity compared with chemically amplified resist.

• 한국인쇄학회지
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• 제22권1호
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• pp.39-52
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• 2004

A novel evaluation method is investigated for measuring the ability of acid amplification of acid amplifier. The method is based on the measurement of conductivity change by the acid generation according to UV radiation. It is found that the decrease of conductivity is caused by photopolymerization of epoxy monomer during UV curing process of ink film and the by the rate of UV curing. In this paper, the novel acid amplifiers were synthesized and measured thermal stability by means of DSC. It was found that mono-type acid amplifiers were more stable than di-type. It is possible to make the dynamical evaluation the curing rate of UV curable ink in curing process by this method.

• Bulletin of the Korean Chemical Society
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• 제17권1호
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• pp.39-42
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• 1996

A new oscillator for electrochemical quartz crystal microbalance (EQCM) was developed by using an operational amplifier without any LC component. The home-made EQCM using this oscillator showed only 0.02 Hz frequency noise at 0.3 s gate time when a 6 MHz AT-cut crystal was used. Pb underpotential deposition on gold substrate in nitric acid media was examined to demonstrate the performance of this EQCM. The derivative of frequency change could be obtained without averaging multiple scans.