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http://dx.doi.org/10.4313/JKEM.2005.18.6.499

Effect of Aromatic Acid Amplifier, 2-hydroxy-2'-tosyloxy Biphenyl, on the kind of Resist Resins  

Kang, Ji-Eun (부경대학교 화상정보공학)
Jeong, Yong-Seok (부경대학교 화상정보공학)
Jeong, Yeon-Tae (부경대학교 화상정보공학)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.18, no.6, 2005 , pp. 499-505 More about this Journal
Abstract
We compared the effects of a representative aromatic acid amplifier, 2-hydroxy-2'-tosylory biphenyl, doped in poly(tort-butyl methacrylate) (PTBMA), poly (tetrahydropyranylmethacrylate) (pTHPMh) or poly[tert-butoxycarbonyloxystyrene) (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 60 min in pTBMA and pTBOCST film and up to 10 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA film doped with the acid amplifier showed 9 times and 3 times higher photosensitivity, respectively. But pTBOCST film showed a negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability of the acid amplifier were found to be affected by the resin.
Keywords
Photoresist; Acid-amplifier; Photosensitivity; Thermal stability;
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