1 |
S. W. Park, K. Arimitsu, S. G. Lee, and K. Ichimura, 'A novel photoresist based on polymeric acid amplifiers', Chem. Lett., Vol. 29, No.9, p. 1036, 2000
|
2 |
W. S. Hwang, R. E. Kwong, and W. Moreau, 'Acid amplifiers-proton transfer or direct acid formation', Proc. SPIE, Vol. 3999, No.1, p. 591, 2000
|
3 |
E. J. Lee, K. A. Kuen, and Y. T. Jeong, '1-Hydroxy-4-tosyloxy cyclohexane and 4-ditosyloxy cyclohexane as acid amplifiers to enhance the photosensitivity of positiveworking photoresists', J. Kor. Printing. Soc., Vol. 20, No.1, p. 91, 2002
|
4 |
E. J. Lee, K. I. Hong, K. T. Lim, Y. S. Jeoung, S. S. Hong, and Y. T. Jeong, 'Preparation and characterzation of pstyrenesulfonates of isoproplidene dicyclohexnol as acid amplifiers to enhance the photosensitivity of positive-working photoresists', J. Kor. Chem. Soc., Vol. 46, No.5, p. 437, 2002.
|
5 |
E. J. Lee, and J. Y. Park, and Y. T. Jeong, 'Synthesis and characterization of a novel acid amplifier(1)', J. Kor. Soc. Imaging Sci. Technol., Vol. 7, No.2, p. 110, 2001
|
6 |
K. I. Hong, Y. S. Jeong, K. T. Lim, S. J. Choi, and Y. T. Jeong, 'p- ToJuenesulfonate esters of 1,2-benzenediol as novel acid amplifers', J. Ind. Eng. Chem., Vol. 10, No.5, p. 864, 2004
|
7 |
G. N Taylor, L. E. Stillwagon, and F. M. Houlihan, 'Positive, chemically-amplified aromatic methacrylate resist employing the tetrahydropyranyl protecting group', Chem. Mater., Vol. 3, No.6, p. 1031, 1991
|
8 |
J. M. J. Frechet, Eva Eichler, H. Ito, and C. G. willson, 'Polytp-tert-butoxycarbonyloxy styrene): a convenient precursor to p-hydroxystyrene resins', Polymer, Vol. 24, No.8, p. 995, 1983
|
9 |
W. Conley, C. Babcock, N. Farrar,H. Y. Liu, B. Peterson, and K. Taira, 'Comparisons of critical parameters for high and low activation energy deep UV photoresists', Proc. SPIE, Vol. 3333, No.1, p. 357, 1998
|
10 |
E. J. Lee, K. I. Hong, Y. S. Jeoung, K. T. Lim, and Y. T. Jeong, 'Effect of phenolic derivatives on thermal decomposition of sulfonate esters', J. Kor. Soc. Imaging Sci. Technol., Vol. 9, No.1, p. 27, 2003
|
11 |
E. Reichmanis, F. M. Houlihan, O. Nalamasu, and T. X. Neenan, 'Chemical amplification mechanisms for microlithography', Chem. Mater., Vol. 3, No.3, p. 394, 1991
|
12 |
K. Ichimura, K. Arimitsu, and K. Kudo, 'A novel concept of acid proliferation. autocatalytic fragmentation of an acetoacetate derivative as an acid amplifier', Chem. Lett., Vol. 24, No.6, p. 551, 1995
|
13 |
G. G. Barclay, D. R. Medeiros, and R. F. Sinta, 'Thermal stability of sulfonate ester photoacid generators in phenolic matrices', Chem. Mater., Vol. 7, No.7, p. 1315, 1995
DOI
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