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Effect of Acid Amplifier, 4-Hydroxy-4'-p-tosyloxy Isopropylidene Dicyclohexane, on the Kind of Resin in Chemically Amplified Photoresist  

Kang, Ji Eun (Division of Image and Information Engineering, Pukyong National University)
Lim, Kwon Taek (Division of Image and Information Engineering, Pukyong National University)
Jeong, Yeon Tae (Division of Image and Information Engineering, Pukyong National University)
Publication Information
Applied Chemistry for Engineering / v.16, no.2, 2005 , pp. 262-266 More about this Journal
Abstract
We compared the effects of a representative aliphatic acid amplifier, 4-hydroxy-4'-p-tosyloxy isopropylidene dicyclohexane, doped in poly[tert-butyl methacrylate] (pTBMA), poly[tetrahydropyranyl methacrylate] (pTHPMA) or poly[tert-butoxycarbonyloxystyrene] (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 20 min in pTBMA and pTBOCST film and up to 5 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA films doped with the acid amplifier showed four times and two times higher photosensitivity, respectively. But pTBOCST showed negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability were found to be affected by the resin.
Keywords
photoresist; acid-amplifier; photosensitivity; thermal stability;
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