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http://dx.doi.org/10.5012/jkcs.2004.48.1.039

A Novel Photoresist based on Polymeric Acid Amplifier  

Lee, Eun-Ju (Division of Image and Information Engineering, Pukyong National University)
Jeong, Yong-Seok (Division of Image and Information Engineering, Pukyong National University)
Lim, Kwon-Taek (Division of Image and Information Engineering, Pukyong National University)
Jeong, Yeon-Tae (Division of Image and Information Engineering, Pukyong National University)
Publication Information
Journal of the Korean Chemical Society / v.48, no.1, 2004 , pp. 39-45 More about this Journal
Abstract
Acid amplifying copolymers are synthesized by the copolymerization of tert-butyl methacrylate(tBMA) with acid-sensitive functional group and 4-hydroxy-4'p-styrenesufonyloxyisopropylidene dicyclohexane(HSI) or 4-p-styrenesulfonyloxy-4'-tosyloxyisopropylidenedicyclohexane(STI) with acid-amplifying group as novel polymeric acid amplifying photoresists. Poly(HSI-co-tBMA) film and Poly(STI-co-tBMA) film as acid amplifying photoresists show reasonable thermal stability in the absence of an acid species. Poly(STI-co-tBMA) film exhibits 2X higher photosensitivity, whereas Poly(HSI-co-tBMA) film show 2X lower photosensitivity compared with ptBMA homopolymer. The attachment of acid-amplifying units to polymer backbones could provide a novel way to enhance the photosensitivity of acid-sensitive polymers depending on the structure of acid-amplifying units.
Keywords
Photoresist; Polymeric Acid Amplifier; Thermal Stability; Photosensitivity;
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Times Cited By KSCI : 1  (Citation Analysis)
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