• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.18 no.6
• /
• pp.499-505
• /
• 2005

We compared the effects of a representative aromatic acid amplifier, 2-hydroxy-2'-tosylory biphenyl, doped in poly(tort-butyl methacrylate) (PTBMA), poly (tetrahydropyranylmethacrylate) (pTHPMh) or poly[tert-butoxycarbonyloxystyrene) (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 60 min in pTBMA and pTBOCST film and up to 10 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA film doped with the acid amplifier showed 9 times and 3 times higher photosensitivity, respectively. But pTBOCST film showed a negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability of the acid amplifier were found to be affected by the resin.

• Applied Chemistry for Engineering
• /
• v.16 no.2
• /
• pp.262-266
• /
• 2005

We compared the effects of a representative aliphatic acid amplifier, 4-hydroxy-4'-p-tosyloxy isopropylidene dicyclohexane, doped in poly[tert-butyl methacrylate] (pTBMA), poly[tetrahydropyranyl methacrylate] (pTHPMA) or poly[tert-butoxycarbonyloxystyrene] (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 20 min in pTBMA and pTBOCST film and up to 5 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA films doped with the acid amplifier showed four times and two times higher photosensitivity, respectively. But pTBOCST showed negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability were found to be affected by the resin.

• Applied Chemistry for Engineering
• /
• v.16 no.5
• /
• pp.660-663
• /
• 2005

Aiming the development of novel acid amplifiers, 2-hydroxyphenyl-4-methylbenzenesulfonate (1), 3-hydroxyphenyl-4-methylbenzene sulfonate (2), 4-hydroxyphenyl-4-methylbenzenesulfonate (3) were synthesized as the aromatic acid amplifiers with good thermal stability. They were autocatalytically generated p-toluenesulfonic acid in the presence of small amount of acid evolved from a photoacid generator. These aromatic sulfonates showed excellent thermal stability in PtBMA film and were proven to be the first aromatic acid amplifier to act as a photosensitivity enhancer. When these compounds were coupled with a chemically amplified photoresist system, photosensitivity was enhanced up to 3~6 folds.

• Journal of the Korean Chemical Society
• /
• v.48 no.1
• /
• pp.39-45
• /
• 2004

Acid amplifying copolymers are synthesized by the copolymerization of tert-butyl methacrylate(tBMA) with acid-sensitive functional group and 4-hydroxy-4'p-styrenesufonyloxyisopropylidene dicyclohexane(HSI) or 4-p-styrenesulfonyloxy-4'-tosyloxyisopropylidenedicyclohexane(STI) with acid-amplifying group as novel polymeric acid amplifying photoresists. Poly(HSI-co-tBMA) film and Poly(STI-co-tBMA) film as acid amplifying photoresists show reasonable thermal stability in the absence of an acid species. Poly(STI-co-tBMA) film exhibits 2X higher photosensitivity, whereas Poly(HSI-co-tBMA) film show 2X lower photosensitivity compared with ptBMA homopolymer. The attachment of acid-amplifying units to polymer backbones could provide a novel way to enhance the photosensitivity of acid-sensitive polymers depending on the structure of acid-amplifying units.

• Journal of the Korean Graphic Arts Communication Society
• /
• v.20 no.1
• /
• pp.91-101
• /
• 2002

An acid amplifier is defined as an acid-generating agent which is decomposed autocatalytically to produce new strongly acidic molecules in a non-liner manner, The addition of the acid amplifiers to conventional chemically amplified photoresists consisting of photoacid generators and acid-sensitive polymers result in the improvement of photosensitivity due to the amplified generation of catalytic acid molecules as a result of the decomposition of acid amplifiers. We synthesized and evaluated 1-hydroxy-4-tosyloxy cyclohexane(AA-1) and 1,4-ditosyloxy cyclohexane(Ah-2) as novel acid amplifiers. The acid amplifiers(AA-1, AA-2) showed reasonable thermal stability for resist processing temperature. As estimated by the sensitivity curve, tort-butyl methacrylate homopolymer(ptBMA) film doped with AA-1 or 2 exhibited much higher photosensitivity than ptBMA film without AA-1 or 2. And AA-1 showed higher effect than AA-2 on enhancing photosensitivity of ptBMA film.

• Korean Chemical Engineering Research
• /
• v.43 no.3
• /
• pp.393-400
• /
• 2005

A novel evaluation method was investigated for measuring the ability of acid amplification of acid amplifier. The method was based on the measurement of conductivity change by the acid generation according to UV radiation. It was found that the decrease of conductivity was caused by photopolymerization of epoxy monomer during UV curing process of ink film and by the rate of UV curing. In this paper, the novel acid amplifiers were synthesized and measured thermal stability by means of DSC. It was found that mono-type acid amplifiers were more stable than di-type. It was possible to make the dynamical evaluation of the curing rate of UV curable ink in curing process by this method.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.17 no.8
• /
• pp.806-811
• /
• 2004

1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.

• Journal of the Korean Graphic Arts Communication Society
• /
• v.20 no.2
• /
• pp.131-140
• /
• 2002

Chemically amplified deep UV(CA-DUV) resists are typically based on a combination of an acid labile polymer and a photoacid generator(PAG) but acid amplification type photoresist is formulated by addition of the acid amplifiers to chemically amplified resist system(CAPs). We developed acid amplifiers base on cyclohexanediol such as 1-methacryloyloxy-4-tosyloxy cyclohexane(MTC) and poly(MTC$_{10}$-co-tBMA$_{90}$)(P-1) to enhance photosensitivity. P-1 is a copolymer of tert-butyl methacrylate and MTC as a positive working photoresist based on polymeric acid amplifier in order to enhance photosensitivity and simplify the process of fomulating a photoresist. P-1 exhibited 2X higher photosensitivity compared with PtBMA. The acid amplifiers showed reasonable thermal stability for resist processing temperature and higher photosensitivity compared with chemically amplified resist.

• Journal of the Korean Graphic Arts Communication Society
• /
• v.22 no.1
• /
• pp.39-52
• /
• 2004

A novel evaluation method is investigated for measuring the ability of acid amplification of acid amplifier. The method is based on the measurement of conductivity change by the acid generation according to UV radiation. It is found that the decrease of conductivity is caused by photopolymerization of epoxy monomer during UV curing process of ink film and the by the rate of UV curing. In this paper, the novel acid amplifiers were synthesized and measured thermal stability by means of DSC. It was found that mono-type acid amplifiers were more stable than di-type. It is possible to make the dynamical evaluation the curing rate of UV curable ink in curing process by this method.

• Bulletin of the Korean Chemical Society
• /
• v.17 no.1
• /
• pp.39-42
• /
• 1996

A new oscillator for electrochemical quartz crystal microbalance (EQCM) was developed by using an operational amplifier without any LC component. The home-made EQCM using this oscillator showed only 0.02 Hz frequency noise at 0.3 s gate time when a 6 MHz AT-cut crystal was used. Pb underpotential deposition on gold substrate in nitric acid media was examined to demonstrate the performance of this EQCM. The derivative of frequency change could be obtained without averaging multiple scans.