• Title/Summary/Keyword: AFm phase

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Synthesis and Characterization of Di and Triblock Copolymers Containing a Naphthalene Unit for Polymer Electrolyte Membranes (고분자전해질 막을 위한 나프탈렌 단위를 포함하는 디 및 트리 블록공중합체의 합성 및 특성분석)

  • KIM, AERHAN
    • Transactions of the Korean hydrogen and new energy society
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    • v.27 no.6
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    • pp.660-669
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    • 2016
  • A fluorinated-sulfonated, hydrophobic-hydrophilic copolymer was planed subsequently synthesized using typical nucleophilic substitution polycondensation reaction. A novel AB and ABA (or BAB) block copolymers were synthesized using sBCPSBP (sulfonated 4,4'-bis[4-chlorophenyl)sulfonyl]-1,1'-biphenyl), DHN (1,5-dihydroxynaphthalene), DFBP (decafluorobiphenyl) and HFIP (4,4'-hexafluoroisopropylidenediphenol). All block copolymers were easily cast and made into clear films. The structure and synthesized copolymers and corresponding membranes were analyzed using GPC (gel permeation chromatography), $^1H$-NMR ($^1H$ nuclear magnetic resonance) and FT-IR (Fourier transform infrared). TGA (Thermogravimetric analysis) and DSC (differential scanning calorimetry) analysis showed that the prepared membranes were thermally stable, so that elevated temperature fuel cell operation would be possible. Hydrophobic/hydrophilic phase separation and clear ionic aggregate block morpology was confirmed in both triblock and diblock copolymer in AFM (atomic force microscopy), which may be highly related to their proton transport ability. A sulfonated BAB triblock copolymer membrane with an ion-exchange capacity (IEC) of 0.6 meq/g has a maximum ion conductivity of 40.3 mS/cm at $90^{\circ}C$ and 100% relative humidity.

Ferroelectric Properties of Bi3.25La0.75 Ti3O12 Thin Films with Excess Bi Contents for Non-Volatile Memory Device Application (비휘발성 메모리 소자응용을 위한 과잉 Bi 첨가에 따른 BLT 박막의 강유전 특성)

  • 김경태;김창일;강동희;심일운
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.9
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    • pp.764-769
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    • 2002
  • The effect of excess Bi contents on the ferroelectric properties of B $i_{3.25}$ L $a_{0.75}$ $Ti_3$ $O_{12}$ (BLT) thin films has been investigated. Bismuth lanthanum titanate thin films with excess Bi contents were prepared onto Pt/Ti/ $SiO_2$/Si substrate by metalorganic decomposition (MOD) technique. The structure and morphology of the films were analyzed using X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. From the XRD analysis, BLT thin films show polycrystalline structure and the layered-perovskite phase was obtained over 10% excess of Bi contents. As a result of ferroelectric characteristics related to the Bi content of the BLT thin film, the remanent polarization and dielectric constant decreased with increasing over Bi content of 10% excess. The BLT film with Bi content of 10% excess was measured to have a dielectric constant of 326 and dielectric loss of 0.024. The BLT thin films showed little polarization fatigue test up to 3.5$\times$10$^{9}$ bipolar switching cycling.

Electrical Properties of the (Ba,Sr)$TiO_3$Thin Films Prepared by Sol-Gel Method (Sol-Gel법으로 제조한 (Ba,Sr)$TiO_3$박막의 전기적 특성)

  • 이영희;이문기;정장호;류기원
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.7
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    • pp.592-597
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    • 2000
  • In this study (B $a_{0.5}$/S $r_{0.5}$)Ti $O_3$[BST(50/50)] ceramic thin films were prepared by the Sol-Gel method BST(50/50) stock solution was made and spin-coated on the Indium Tin Oxide(ITO)/glass substrate at 4000 rpm for 30 seconds. The coated films were dried at 35$0^{\circ}C$ for 10 minutes and annealed at 650~75$0^{\circ}C$ for 1 hour. The microstructural properties of the BST(50/50) thin film were studied by the XRD and AFM. The ferroelectric perovskite phase was formed at the annealing condition of 75$0^{\circ}C$ for 1 hour. Dielectric constant and loss of this thin were 370, 3.7% at room temperature respectively. The polarization switching voltage showed the good value of 3V. The leakage current density of the BST(50/50) thin film was 10$^{-7A}$c $m^2$with applied voltage of 1.5V. BST(50/50) thin film capacitors having good dielectric and electrical properties are expecting for the application to the dielectric material of DRAM.RAM.M.

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The Application of DLC(diamond-like carbon) Film for Plastic Injection Mold by Hybrid Method of RF Sputtering and Ion Source (RF 스퍼터링과 이온소스 복합방식에 의한 플라스틱사출금형(SKD11)의 DLC막 응용)

  • Kim, Mi-Seon;Hong, Sung-Pill
    • Journal of the Korean institute of surface engineering
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    • v.42 no.4
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    • pp.173-178
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    • 2009
  • DLC film was synthesized on plastic injection mold(SKD11, $30\;mm\;{\times}\;19\;mm\;{\times}\;0.5\;mm$) and Si(100) wafer for 2 h at $130^{\circ}C$ under 6 mTorr using hybrid method of rf sputtering and ion source. The obtained film was analysed by Raman spectroscopy, AFM, TEM, Nano indenter and scratch tester, etc. The film was defined as an amorphous phase. In the Raman spectrum, broad peak of $sp^2$-bonded carbon attributed to graphite at $1550\;cm^{-1}$ were observed, and the ratio of ID($sp^3$ diamond intensity)/IG($sp^2$ graphite intensity) was approximately 0.54. The adhesion of DLC film was more than 80 N with scratch tester when $0.2\;{\mu}m$ thickness Cr was coated as interlayer. The micro-hardness was distributed at 35~37 GPa. The friction coefficient was 0.02~0.07, and surface roughness(Ra) was 0.34~1.64 nm. The lifetime of DLC coated plastic injection mold using as a connector part in computer was more than 2 times of non-coated mold.

Effect of a Cu Buffer Layer on the Structural, Optical, and Electrical Properties of IGZO/Cu bi-layered Films

  • Moon, Hyun-Joo;Gong, Tae-Kyung;Kim, Daeil;Choi, Dong-Hyuk;Son, Dong-Il
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.1
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    • pp.18-20
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    • 2016
  • Transparent and conducting IGZO thin films were deposited by RF magnetron sputtering on thin Cu coated glass substrates to investigate the effect of a Cu buffer layer on the structural, optical, and electrical film properties. Although X-ray diffraction (XRD) analysis revealed that both the IGZO single layer and IGZO/Cu bi-layered films were in the amorphous phase, the IGZO/Cu films showed a lower resistivity of 5.7×10−4 Ωcm due to the increased mobility and high carrier concentration. The decreased optical transmittance of the IGZO/Cu films was also attributed to a one order of magnitude higher carrier concentration than the IGZO films. From the observed results, the thin Cu layer is postulated to be an effective buffer film that can enhance the opto-electrical performance of the IGZO films in transparent thin film transistors.

Structural and C-V characteristics of SrTiO$_3$ /PbTiO$_3$ thin film deposited on Si (Si 기판위에 증착한 SrTiO$_3$ /PbTiG$_3$ 고용체 박막의 구조적 특성 및 C-V 특성)

  • 이현숙;이광배;김윤정;박장우
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.71-74
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    • 2000
  • Pt/Pb$TiO_3$/$SrTiO_3$/p-Si films were prepared by metallo-organic solution deposition(M0SD) method and investigated its structure and ferroelectric properties. Crystallinity of specimen as a funtions of post annealing temperature and the thickness of $SrTiO_3$(STO) buffer layer was studied using XRD and AFM. Based on C-V and P-E curve, $PbTiO_3$(PTO) capacitors showed good ferroelectric hysteresis arising from the polarization switching properties. When the thickness of ST0 buffer layer between PTO and Si substrate was 260 nrn and the post annealing temperature was $650^{\circ}C$, it was showed that production of the pyrochlore phase due to interdiffusion of Si into FTO was prevented. The dielectric constant of FTO thin films calculated from a maximum Cma in the accumulation region was 180 and the dielectric loss was 0.30 at 100 kHz frequency. The memory window in the C-V curve is 1.6V at a gate voltage of 5V.

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Behavior of Solid Phase Crystallizations in Mechanical Damage Induced Hydrogenated and Non-Hydrogenated Amorphous Amorphous Silicon Thin Films (기계적 Damage 활성화 효과에 대한 수소화 및 비수소화 비정질 규소 박막의 고상 결정화 거동)

  • Kim, Hyeong-Taek;Kim, Yeong-Gwan
    • Korean Journal of Materials Research
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    • v.6 no.4
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    • pp.436-445
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    • 1996
  • 비정질 실리콘박막의 고상결정화 특성에 대한 비정질 박막의 증착방법, 수소화 정도, 표면결정 활성화 에너지 변화 및 열처리 환경 영향을 X선 회절, EDAX, Raman 분광 분석으로 조사하였다. 저온(58$0^{\circ}C$)열처리 corning 시료에서 기판 barium(Ba), aluminum(AI) 성분의 막내 확산 임계열처리시간 및 확산에 기인 한 불안정 결정화 특성을 관찰하였다. 화학기상증착 석영 수소화 시료에서 hard damage 기계적 활성화 효과로 얻어진 조대결정립 결정화 특성을 X선 회절의 (111) 배향 상대강도 변화로 관찰 할 수 있었으며, 이는 활성화 효과에 의한 고상 결정화 시 핵생성과 성장속도변화로 다결정 실리콘의 전기적물성 향상 가능성을 보여주었다. Soft damage, bare 활성화 처리 수소화막의 결정화는 비정질 상의 혼재, 박막 응력등의 저품위 입계특성 및 미세결정립 성장 특성으로 관찰되었으나, 활성화 전처리에 의한 저온 및 고온(875$^{\circ}C$)단시간(30분) 결정화는 확인 되었다. 스퍼터링 비수소화 막의 결정화는 상변태 상태의 Raman 결정피크로 분석 되었으며, 결정화 거동에 선행막의 스퍼터링 및 비수소화 영향은 활성화효과에 관계없이 불완전 저품위 결정특성으로 확인되었다. AFM 표면형상은 3차원 island 성막특성을 보여주었고 표면거칠기정도는 높은 것으로 관찰되었다.

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Vibro-Contact Analysis of Ultrasonic Atomic Force Microscopy Tip and It's Application to Nano Surface (UAFM(초음파원자현미경) 팁의 진동-접촉 해석과 나노 표면에의 응용)

  • Park, Tae-Sung;Kwak, Dong-Ryul;Park, Ik-Keun;Kim, Chung-Seok
    • Journal of the Korean Society for Nondestructive Testing
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    • v.30 no.2
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    • pp.132-138
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    • 2010
  • Vibro-contact of cantilever tip is studied with respect to contact mechanics and an elastic characteristic of nanoscale surface is imaged. The contact resonance frequency is calculated theoretically using the spring-mass and Herzian models, and the variation of resonance frequency of cantilever was analyzed when the cantilever was free and contact. The elasticity imaging was also achieved successfully using phase and amplitude signals obtained from the spheroidized steel specimens by prototype ultrasonic AFM.

Effect of Inductively Coupled Plasma on the Microstructure, Structure and Mechanical Properties of VN Coatings (유도결합 플라즈마 파워가 VN 코팅막의 미세구조, 결정구조 및 기계적 특성에 미치는 영향에 관한 연구)

  • Chun, Sung Yong;Lee, So Yeon
    • Journal of the Korean institute of surface engineering
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    • v.49 no.4
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    • pp.376-381
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    • 2016
  • The effects of ICP (Inductively Coupled Plasma) power, ranging from 0 to 200 W, on the crystal structure, microstructure, surface roughness and mechanical properties of magnetron sputtered VN coatings were systematically investigated with FE-SEM, AFM, XRD and nanoindentation. The results show that ICP power has a significant influence on coating microstructure and mechanical properties of VN coatings. With the increasing of ICP power, coating microstructure evolves from a porous columnar structure to a highly dense one. Average crystal grain size of single phase cubic fcc VN coatings was decreased from 10.1 nm to 4.0 nm with increase of ICP power. The maximum hardness of 28.2 GPa was obtained for the coatings deposited at ICP power of 200 W. The smoothest surface morphology with Ra roughness of 1.7 nm was obtained from the VN coating sputtered at ICP power of 200 W.

Preparation and Characterization of Poly(butyl acrylate)/Poly(methyl methacrylate) Composite Latex by Seeded Emulsion Polymerization

  • Ju, In-Ho;Hong, Jin-Ho;Park, Min-Seok;Wu, Jong-Pyo
    • Journal of the Korean Applied Science and Technology
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    • v.19 no.2
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    • pp.131-136
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    • 2002
  • As model waterborne acrylic coatings, mono-dispersed poly(butyl acrylate-methyl methacrylate) copolymer latexes of random copolymer and core/shell type graft copolymer were prepared by seeded multi-staged emulsion polymerization with particle size of $180{\sim}200$ nm using semi-batch type process. Sodium lauryl sulfate and potassium persulfate were used as an emulsifier and an initiator, respectively. The effect of particle texture including core/shell phase ratio, glass transition temperature and crosslinking density, and film forming temperature on the film formation and final properties of film was investigated using SEM, AFM, and UV in this study. The film formation behavior of model latex was traced simultaneously by the weight loss measurement and by the change of tensile properties and UV transmittance during the entire course of film formation. It was found that the increased glass transition temperature and higher crosslinking degree of latex resulted in the delay of the onset of coalescence of particles by interdiffusion during film forming process. This can be explained qualitatively in terms of diffusion rate of polymer chains. However, the change of weight loss during film formation was insensitive to discern each film forming stages-I, II and III.