Browse > Article
http://dx.doi.org/10.4313/JKEM.2002.15.9.764

Ferroelectric Properties of Bi3.25La0.75 Ti3O12 Thin Films with Excess Bi Contents for Non-Volatile Memory Device Application  

김경태 (중앙대학교 전자전기공학부)
김창일 (중앙대학교 전자전기공학부)
강동희 (중앙대학교 화학과)
심일운 (중앙대학교 화학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.15, no.9, 2002 , pp. 764-769 More about this Journal
Abstract
The effect of excess Bi contents on the ferroelectric properties of B $i_{3.25}$ L $a_{0.75}$ $Ti_3$ $O_{12}$ (BLT) thin films has been investigated. Bismuth lanthanum titanate thin films with excess Bi contents were prepared onto Pt/Ti/ $SiO_2$/Si substrate by metalorganic decomposition (MOD) technique. The structure and morphology of the films were analyzed using X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. From the XRD analysis, BLT thin films show polycrystalline structure and the layered-perovskite phase was obtained over 10% excess of Bi contents. As a result of ferroelectric characteristics related to the Bi content of the BLT thin film, the remanent polarization and dielectric constant decreased with increasing over Bi content of 10% excess. The BLT film with Bi content of 10% excess was measured to have a dielectric constant of 326 and dielectric loss of 0.024. The BLT thin films showed little polarization fatigue test up to 3.5$\times$10$^{9}$ bipolar switching cycling.
Keywords
BLT; FRAM; Thin Film; Ferroelectric; MOD;
Citations & Related Records
Times Cited By KSCI : 4  (Citation Analysis)
연도 인용수 순위
1 MOD 법으로 제조한 강유전성 SBT 박막에서 하부전극이 유전 및 전기적 특성에 미치는 영향 /
[ 김태훈;김병호;송석표 ] / 전기전자재료학회논문지   과학기술학회마을
2 PLD 기법에 의한 강유전체 SBT/YBCO/LaAlO₃헤테로 박막의 제작 및 특성 /
[ 이재형;문병무;고중혁;구상모 ] / 전기전자재료학회논문지   과학기술학회마을
3 Preparation of Bi-based ferroelectric thin films by Sol-Gel method /
[ T. Atsuki;N. Soyama;T. Yonezawa;K. Ogi ] / Jpn. J. Appl. Phys.   DOI
4 Imprint failures and asymmetric electrical properties induced by thermal processes in epitaxial Bi₄Ti₂O12 thin films /
[ B. H. Park;S. J. Hyun;C. R. Moon;B. D. Choe;J. Lee;C. Y. Kim;W. Jo;T. W. Noh ] / J. Appl. Phys.   DOI   ScienceOn
5 Preparation and ferroelectric properties of SrBi₂Ta₂O9 thin films /
[ K. Amanuma;T. Hase;Y. Miyasaka ] / Appl. Phys. Lett.   DOI   ScienceOn
6 미래의 메모리 FRAM /
[ 유희준;김시호;유종선 ] / 시그마프레스
7 Ferroelectric properties of Bi₃.₂5La0.75Ti₃O₁₂ thin films prepared by chemical solution deposition /
[ D. Wu;A.. Li;Tao Zhu ] / J. Appl. Phys.   DOI   ScienceOn
8 Lanthanumsubs-tituted bismuth titanate for use in non-volatile memories /
[ B. H. Park;B. S. Kang;S. D. Bu;T. W. Noh;J. Lee;W. Jo ] / Nature   DOI
9 Stabilized platinum electrodes for ferroelectric film deposition using Ti, Ta and Zr adhesion layers /
[ T. Maeder;L. Sagalowicz;P. Muralt ] / Jpn. J. Appl. Phys.   DOI
10 Electrical properties of ferroelectric Bi₄Ti₃O12 thin films by APMOCVD /
[ H. Wang;X. N. Shen;X. J. Su;Z. Wang;S. X. Shang;M. Wang ] / Ferroelectrics
11 Metalorganicchemical vapor deposition of ferroelectric SrBi₂Ta₂O9 thin films /
[ T. Li;Y. Zhu;S. B. Desu;C. H. Peng;M. Nagata ] / Appl. Phys. Lett.   DOI
12 MOD 법에 의한 강유전성 SrxBiyTa₂O9-α (SBT)박막의 제조 및 후열처리 효과에 관한 연구 /
[ 김병호;윤희성;정병식;신동석 ] / 전기전자재료학회논문지   과학기술학회마을
13 Ferroelectric memories /
[ J. F. Scott;C. A. Paz de Araujo ] / Science   DOI   ScienceOn