• Korean Journal of Optics and Photonics
• /
• v.26 no.5
• /
• pp.255-260
• /
• 2015

We have fabricated an optoacoustic ultrasound generator based on nanostructured germanium (Ge). Ge thin films were deposited via e-beam evaporation and then etched using a metal-assisted chemical (MAC) method to form nanostructured Ge films. The measured intensity of ultrasound from the nanostructured Ge covered with PDMS was about 3 times stronger than that of 100-nm-thick chromium (Cr). When the nanostructured Ge was embedded in the PDMS, the intensity of ultrasound became 8.5 times as strong compared to the 100-nm-thick Cr.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1992.11a
• /
• pp.77-81
• /
• 1992

The purpose of this research was th evaluate conductivity of electricity of Ge-Se-Bi system Chalcogenide glass as a amorphous semiconductor by observing its dissolution and crystallization. In this experiment. Ge-Se-Bi metal powder in the rage of $Ge_{12-25}$, $Se_{65-85}$, $Bi_{2.5-15}$ was used as the sample ore. The ore was. put into a vaccous quartz tube and then melted. The condition of heat treatment was to dispose it to $1000^{\circ}C$ heat for 10 hours and then rapidly quenched it at $3834^{\circ}C$/see. The crystallization of the fused sample ripened as the change of temperature and time, after the crystal core was formell. At that time it was possible to observe the state that $Bi_2Se_3$ and $GeSe_2$ were crystallized. In the experiment of making memberance, the memberance was produced by using the previously experimented bulk sample. And decrystalization was well progressed when Ge was over 15 at %, Se was over 70 at %, and Bi was under 10 at%. As for bulk. when Ge was fixed to 20 at %, the conducting of electricity was increased as Bi gained at %. In the case of memberance, the conductivity was much more increased than that of bulk sample as the increase of at the increase of at % of Bi. In the experiment on $Ge_{20}$, $Se_{77.5}$ and $Bi_{2.5}$, the crystallization sswas most vigorous when they were kept at $330^{\circ}C$ for 4 hours.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.337-337
• /
• 2012

단일 결정의 Ge 박막은 0.67 eV의 작은 밴드갭을 가지고 있기에 장파장의 빛을 흡수하기 위한 목적으로 태양전지 분야에서 집중적인 연구가 진행되어지고 있다. 또한, Si에 비하여 높은 전하 이동도를 가지고 있기에 박막 트랜지스터로의 응용 연구들이 진행되고 있는 중이다. 전자 소자로써 큰 효과를 가지고 오기 위해서는 양질의 Ge 결정박막을 성장하여야 한다. 이를 위하여 다양한 공정 방법으로 Ge 박막의 결정성 향상에 대한 연구들을 진행하고 있다. 그중 본 연구에서는 ICP-assisted DC sputtering 방법을 이용하여 저온(${\sim}230^{\circ}C$) Ge 박막 결정성장에 대한 연구를 진행하였다. Ge 박막을 유리기판(Eagle 2000) 위에 증착하였으며, $6{\times}10^{-6}$ Torr 이하의 기본 압력에서 공정을 진행하였다. 7 mTorr의 Ar 분위기에서 타겟에 인가되는 전압 및 전류를 변화 시키며 Ge 박막 증착에 미치는 영향에 대해서 연구를 진행하였다. 기본적인 DC sputtering 방법을 이용하여 박막을 증착하였을 경우 증착한 모든 샘플에서 결정성을 확인하였으며, 낮은 전압에서도 결정화가 일어나는 것을 확인 할 수 있었다. 또한 전압을 증가시켜도 결정화 정도가 일정하게 유지됨을 확인 할 수 있었다. 다만 이 경우에는 결정의 방향이 랜덤하게 형성되었으며, DC sputtering 방법을 이용하여 저온에서 공정을 진행하였기에 박막은 수십 nm의 columnar grain을 형성하였다. ICP를 이용한 DC sputtering 방법을 이용하여 박막을 증착 하였을 경우, 일정 전압 이하에서는 비정질의 Ge 박막이 균일하게 형성됨을 확인 할 수 있었으며, 이후 결정화 정도가 타겟에 인가되는 전압에 비례하여 증가하였다. 또한, 이때 증착된 Ge 박막은 단일 결정으로 형성되었음을 확인 할 수 있었다. 이는 박막 성장시 ICP에 의해서 생성된 Ar 이온이 표면으로 가속화됨으로 인하여 Ge 박막 표면에서 channeling 효과가 나타남으로 인하여 <110> 방향으로 결정이 정열된 것으로 보인다.

• Journal of IKEEE
• /
• v.10 no.2 s.19
• /
• pp.156-160
• /
• 2006

Capacitance versus voltage (C-V) curves of Ge-nanocrystal (NC)-embedded MOS capacitors with and without a single capping Al2O3 layer are characterized in this work. C-V curves of the Ge-NC-embedded MOS capacitor with the A12O3 layer are counterclockwise in the voltage sweeps, which indicates tile presence of charge storages in the Ge NCs by the tunnelling of charge carriers between the Si substrate and the Ge NCs. In the Ge-NC-embedded MOS capacitor without Al2O3 layer, clockwise hysteresis of the C-V curves and leftward shifts of the flat band voltages are observed for the embedded MOS capacitor without the Al2O3 layer. It is suggested that the characteristics of the C-V curves are due to the charge trapping at oxygen vacancies within a SiO2 layer. In addition, the illumination of the white light enhances the lower capacitance part of the C-V hysteresis. The origin for the enhancement is discussed in this paper.

• Journal of Bio-Environment Control
• /
• v.16 no.3
• /
• pp.180-185
• /
• 2007

The effects of selenium (Se) and germanium (Ge) fertilization on the growth and quality of Chinese cabbages cultivated in spring and autumn and peppers cultivated in spring were investigated. $Se\;(Na_2SeO_4)\;and\;Ge\;(GeO_2)$ were supplied 5, 10, or 20 times in an aqueous solution of 0, 2, 4, or $8mg{\cdot}L^{-1}$ during the cultivation of Chinese cabbages and peppers. The fresh weight of Chinese cabbages increased by Ge fertilization with high concentration. But it was not affected by Se fertilization. The content of vitamin C increased by 10 times application with $4mg{\cdot}L^{-1}$ of Se or Ge. The concentration of Se in Chinese cabbage increased according to increasing concentration of Se fertilization. Se concentration was higher in the outer leaves than in the inner leaves. Se concentration in the mesophyll was higher than that in the midrib. Ge fertilization increased the uptake and concentration of Ge in autumn-cultivated Chinese cabbages. Se and Ge fertilization did not affect the fresh weight of peppers. The content of vitamin C in pepper increased by 20 times application of $2mg{\cdot}L^{-1}$ of Se. Vitamin C content in red peppers was twice as much as in green peppers.

• Transactions on Electrical and Electronic Materials
• /
• v.7 no.1
• /
• pp.7-11
• /
• 2006

The changes of the electrical conductivity in chalcogenide amorphous semiconductors, $Ge_{1}Se_{1}Te_{2}$, have been studied. A phase change random access memory (PRAM) device without an access transistor is successfully fabricated with the $Ge_{1}Se_{1}Te_{2}$-phase-change resistor, which has much higher electrical resistivity than $Ge_{2}Sb_{2}Te_{5}$ and its electric resistivity can be varied by the factor of $10^5$ times, relating with the degree of crystallization. 100 nm thick $Ge_{1}Se_{1}Te_{2}$ thin film was formed by vacuum deposition at $1.5{\times}10^{-5}$ Torr. The static mode switching (DC test) is tested for the $100\;{\mu}m-sized$ $Ge_{1}Se_{1}Te_{2}$ PRAM device. In the first sweep, the amorphous $Ge_{1}Se_{1}Te_{2}$ thin film showed a high resistance state at low voltage region. However, when it reached to the threshold voltage, $V_{th}$, the electrical resistance of device was drastically reduced through the formation of an electrically conducting path. The pulsed mode switching of the $20{\mu}m-sized$ $Ge_{1}Se_{1}Te_{2}$ PRAM device showed that the reset of device was done with a 80 ns-8.6 V pulse and the set of device was done with a 200 ns-4.3 V pulse.

• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.41 no.10
• /
• pp.1-7
• /
• 2004

In order to enhance the electron mobility in SOI n-MOSFET, we fabricated fully depletion(FD) n-MOSFET on the strained Si/relaxed SiGa/SiO$_2$/Si structure(strained Si/SGOI) formed by inserting SiGe layer between a buried oxide(BOX) layer and a top silicon layer. The summated thickness of the strained Si and relaxed SiGe was fixed by 12.8 nm and then the dependency of electron mobility on strained Si thickness was investigated. The electron mobility in the FD n-MOSFET fabricated on the strained Si/SGOI enhanced about 30-80% compared to the FD n-MOSFET fabricated on conventional SOI. However, the electron mobility decreased with the strained Si thickness although the inter-valley phonon scattering was reduced via the enhancement of the Ge mole fraction. This result is attributed to the increment of intra-valley phonon scattering in the n-channel 2-fold valley via the further electron confinement as the strained Si thickness was reduced.

• Applied Science and Convergence Technology
• /
• v.24 no.3
• /
• pp.60-66
• /
• 2015

The modified amorphous GeTe formed by pulsed laser irradiation in as-grown GeTe has been analyzed in terms of variations of local bonding structure using extended x-ray absorption fine structure (EXAFS). The modified GeTe film has octahedral-like Ge-Te bonding structure that can be effectively induced by irradiation process. The EXAFS data clearly shows that the irradiation can lead to reduction of the average coordination number. Variations in the transition temperature for the irradiated film during crystallization can be described by the presence of octahedral-like local structure.

• Proceedings of the IEEK Conference
• /
• 1998.06a
• /
• pp.453-456
• /
• 1998

The electrical properties of $Si_{1-x}Ge_{x}$ samples have been investigated. The sample structures were grown by MBE (molecular geam epitaxy) with Ge mole-fraction of x=0.0, x=0.05, x=0.1, and x=0.2. To examine the influence of the thermal processing, the $O_{2}$ and N$_{2}$ process were performed at 800[.deg. C] and 900[.deg. C], respectively. After this thermal process, hall measurements have been done over a wide range of the ambient temperature between 320[.deg. K] and 10[.deg. K] to find the temperature dependence using the comparessed-He gas system. The Ge-rich layer has been formed at the $SiO_{2}$/SiGe interface and it has an effect on the hall mobility. And it has been found that hall mobility was increased by the $N_{2}$ annealing process comparing with dry oxidation process at both 800[.deg.C] and900[.deg. C].

• Journal of the Korean Society of Manufacturing Technology Engineers
• /
• v.23 no.2
• /
• pp.133-137
• /
• 2014

The recent development of electro-optic devices and anticorrosion media has made it necessary investigate infrared optical systems with solid-solid interfaces of materials with amorphous characteristics. One of the most promising classes of materials for these purposes seems to be chalcogenide glasses, which are based on the Ge_Sb_Se system, have drawn much attention because of their use in preparing optical lenses and fibers that are transparent in the range of 3-12 um. In this study, a standard melt-quenching technique was used to prepare amorphous Ge_Sb_Sechalcogenideto be used in the design and manufacture of infrared optical products. The results of structural, optical, and surface roughness analyses of high purity Ge_Sb_Sechalcogenide glasses after various annealing processes reported.