• Title/Summary/Keyword: 이온채널

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Threshold Voltage Shift for Doping Profile of Asymmetric Double Gate MOSFET (도핑분포함수에 따른 비대칭 이중게이트 MOSFET의 문턱전압이동현상)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.19 no.4
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    • pp.903-908
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    • 2015
  • This paper has analyzed threshold voltage shift for doping profile of asymmetric double gate(DG) MOSFET. Ion implantation is usually used in process of doping for semiconductor device and doping profile becomes Gaussian distribution. Gaussian distribution function is changed for projected range and standard projected deviation, and influenced on transport characteristics. Therefore, doping profile in channel of asymmetric DGMOSFET is affected in threshold voltage. Threshold voltage is minimum gate voltage to operate transistor, and defined as top gate voltage when drain current is $0.1{\mu}A$ per unit width. The analytical potential distribution of series form is derived from Poisson's equation to obtain threshold voltage. As a result, threshold voltage is greatly changed by doping profile in high doping range, and the shift of threshold voltage due to projected range and standard projected deviation significantly appears for bottom gate voltage in the region of high doping concentration.

Design of Multi-channel Anti-Fouling System for Marine Traffic Facilities (해양교통시설물용 다채널 AFS 설계)

  • Oh, Jin-Seok;Kuak, Jun-Ho
    • Journal of Advanced Marine Engineering and Technology
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    • v.35 no.5
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    • pp.661-666
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    • 2011
  • Recently, there are active research activities regarding to power systems of marine traffic facilities using a hybrid generation system which includes a photovoltaic generation system and a wave power generation system. However, when the marine traffic system is operated on a maritime environment for a substantial period of time, it was reported that the shellfish was adhered inside the water column. To tackle this problem, researches on the AFS (Anti-Fouling System) are on the progress. However, use of the single channel AFS resulted in frequent replacement of anode. Thus, the paper proposes a multi-channel method on AFS and experiments have been taken place correspondently. To improve the reliability of the experiment, the melting anode result was applied to our simulation program. The outcome of the simulation illustrates that the proposed multi-channel AFS's anode in the buoy have been ionized equally.

Phenomenal study on the dopant activation behavior in polysilicon thin films doped by non-mass separated ion mass doping technique (비질량 분리 이온 질량 주입법으로 도핑시킨 다결정 박막의 도판트 활성화 거동)

  • Yoon, Jin-Young;Choi, Duck-Kyun
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.7 no.1
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    • pp.143-150
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    • 1997
  • The electrical properties of polysilicon thin films implanted with $B_2H_6$ diluted in $H_2$ as dopant source using ion mass doping technique and the effect of radiation damage on the dopant activation behavior were investigated. Comparing the SIMS profiles of boron in polysilicon films with that obtained from computer simulation using TRIM92 the most probable ion species were $B_2H_x\;^+$(x=1, 2, 3‥‥) type molecular ions. As a result of the Implantation of energetic massive ions, a continuous amorphized layer was created in polysilicon films where the fraction of amorphized layer varied with doping time. This amorphization comes from the fact that mass separation of implanting species is not employed in this ion mass doping technique. In the dopant activation behavior, reverse annealing phenomenon appeared in the intermediate annealing temperature range for a severely damaged specimen. The experimental result showed that the off-state current of the p-channel polysilicon thin film transistor is dependent on the degree of radiation damage.

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The Behavior of the Mobility Degradation in Pocket Implanted MOSFETS (Halo 구조의 MOSFET에서 이동도 감소 현상)

  • Lee Byung-Heon;Lee Kie-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.4 s.334
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    • pp.1-8
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    • 2005
  • The increased effective impurity due to the pocket ion implantation is well blown to give rise to a reduction of the effective mobility of halo MOSFETs. However, further decrease of the effective mobility can be observed in pocket implanted MOSFETs above the mobility reduction due to the Coulomb impurity scattering and the gate bias dependency of the effective mobility can also differ from the simple model describing the mobility behavior in terms of the effective impurity. Phonon scattering and surface scattering as well as impurity Coulomb scattering are also shown to be effective in the degradation of the carrier mobility of pocket implanted MOSFETs. Using the 1-D regional approximation the effect of the distribution of the inversion charge density along the channel on the drain current is investigated. The inhomogeneous channel charge distribution due to pocket implantation is also shown to contribute to the further reduction of the effective mobility in halo MOSFETs.

Molecular Dynamics (MD) Study of Proton Exchange Membranes for Fuel Cells (연료전지용 수소이온 교환막의 분자동역학 연구)

  • Park, Chi Hoon;Nam, Sang Yong;Hong, Young Taik
    • Membrane Journal
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    • v.26 no.5
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    • pp.329-336
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    • 2016
  • Proton exchange membrane (PEM) is one of the key components of membrane-electrode assembly (MEA), which plays important role in fuel cell performance together with catalysts. It is widely accepted that water channel morphology inside PEMs as a proton pathway significantly affects the PEM performance. Molecular dynamics (MD) simulations are a very useful tool to understand molecular and atomic structures of materials, so that many related researches are currently being studied. In this paper, we summarize the current research trend in MD simulations, present which properties can be characterized, and finally introduce the usefulness of MD simulations to the researchers for proton exchange membranes.

Elastic Behavior of Zeolite Mesolite under Hydrostatic Pressure (제올라이트 메소라이트의 수압 하 탄성특성)

  • Lee, Yong-Jae;Lee, Yong-Moon;Seoung, Dong-Hoon;Jang, Young-Nam
    • Economic and Environmental Geology
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    • v.42 no.5
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    • pp.509-512
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    • 2009
  • Powder diffraction patterns of the zeolite mesolite ($Na_{5.33}Ca_{5.33}Al_{16}Si_{24}O_{80}{\cdot}21.33H_2O$), with a natrolite framework topology were measured as a function of pressure up to 5.0 GPa using a diamond-anvil cell and a $200{\mu}m$-focused monochromatic synchrotron X-ray. Under the hydrostatic conditions mediated by pore-penetrating alcohol and water mixture, the elastic behavior of mesolite is characterized by continuous volume expansion between ca. 0.5 and 1.5 GPa, which results from expansion in the ab-plane and contraction along the c-axis. Subsequent to this anomalous behavior, changes in the powder diffraction patterns suggest possible reentrant order-disorder transition. The ordered layers of sodium- and calcium-containing channels in a 1:2 ratio along the b-axis attribute to the $3b_{natrolite}$ cell below 1.5 GPa. When the volume expansion is completed above 1.5 GPa, such characteristic ordering reflections disappear and the $b_{natrolite}$ cell persists with marginal volume contraction up to ca. 2.5 GPa. Further increase in pressure leads to progressive volume contraction and appears to generate another set of superlattice reflections in the $3c_{natrolite}$ cell. This suggests that mesolite in the pressure-induced hydration state experiences order-disorder-order transition involving the motions of sodium and calcium cations either through cross-channel diffusion or within the respective channels.

Lightning Impulse Response with Two-Phase Flow in Dielectric Liquid by Using Finite Element Analysis (절연유체 내 2상유동을 고려한 뇌임펄스 응답 유한요소해석)

  • Lee, Ho-Young;Lee, Jong-Chul;Lee, Se-Hee
    • Proceedings of the KIEE Conference
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    • 2011.07a
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    • pp.1521-1522
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    • 2011
  • 뇌임펄스에 의한 절연유체 내 절연파괴 현상은 스트리머 채널에서의 유체유동과 기체유동이 동시에 발생한다. 스트리머 개시와 동시에 발생하는 기포들은 절연파괴에 직접적인 영향을 미치며 이를 모의해석하기위해서 2상유동이 고려되어야한다. 2상유동이 고려된 뇌임펄스 응답 유한요소해석은 전계에 의한 푸아송 방정식과 전자, 양이온, 음이온에 대한 전하연속방정식으로 구성되며 전계 방출과 열전자 방출효과를 경계조건으로 부여하였다. 기체 전리현상은 타운젠트 이론을 도입하였으며, 유체 전리현상은 제너 이온화 모델을 도입하여 수학적 모델링을 통한 2상유동으로 결합하였다. IEC standard #60897의 표준규격에 따라 침-구형 전극을 설계하였고 2차원 축대칭 간략화모델에 적용하여 실험적 결과와 비교분석함으로써 신뢰할 수 있는 수치해석기법이 제시되었다.

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Modeling and characteristics of $K^+$ ion-exchanged waveguide-type optical coupler ($K^+$ 이온교환 도파로형 광결합기의 모델링 및 특성)

  • 천석표;박태성;정홍배
    • Electrical & Electronic Materials
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    • v.9 no.3
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    • pp.259-264
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    • 1996
  • In this study, we performed a modeling for $K^{+}$ ion-exchanged diffused channel waveguide and waveguide-type optical coupler by Wentzel-Kramer-Brillouin(WKB) dispersion equation, normalized field distribution equation for mode and coupled mode theory, and examined the optical-power-dividing of the optical coupler fabricated by using the modeling condition. The optical-power-dividing was observed at the waveguide-type optical coupler with 3[.mu.m] line-width, 6[.mu.m] space between channel waveguides, and 3[mm] interaction length.h.

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Fabrication of Nickel Nano and Microstructures by Redeposition Phenomena in Ion Etching Process (이온식각공정의 재증착 현상을 이용한 니켈 마이크로 나노 구조물 제작)

  • Jung, Phill-Gu;Hwang, Sung-Jin;Lee, Sang-Min;Ko, Jong-Soo
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.31 no.1 s.256
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    • pp.50-54
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    • 2007
  • Nickel nano and microstructures are fabricated with simple process. The fabrication process consists of nickel deposition, lithography, nickel ion etching and plasma ashing. Well-aligned nickel nanowalls and nickel self-encapsulated microchannels were fabricated. We found that the ion etching condition as a key fabrication process of nickel nanowalls and self-encapsulated microchannels, i.e., 40 sccm Ar flow, 550 W RF power, 15 mTorr working pressure, and $20^{\circ}C$ water cooled platen without using He backside cooling unit and with using it, respectively. We present the experimental results and discuss the formational conditions and the effect of nickel redeposition on the fabrication of nickel nano and microstructures.

Characteristics of Generation and Propagation of Relativistic Electron Beam and Pulsed Plasma at Sub-Torr Pressure

  • 고재준;최은하
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.241-241
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    • 1999
  • 본 연구는 상대론적 전자빔(300kV, 20KA, 60ns)과 펄스플라즈마의 발생 및 전파특성에 관한 것으로 세부 내용은 다음과 같다. Sub-Torr로 유지되는 다이오드에서 상대론적 전자빔의 발생이 이루어질 때 전자빔의 펄스너비 및 전류 상승시간을 다이오드 압력을 변인으로 하여 연구하였다. 펄스너비와 압력과의 관계식을 실험적으로 유도하였으며 다이오드 내에서 전자빔과 중성기체와의 충돌에 의한 기체이온화 모델로 설명하였다. 또한 Sub-Torr 도파관에서 상대론적 전자빔의 수송 특성을 연구하였으며 전자빔의 propagation window와 고압에서의 수송효율의 저하 원인을 밝혔다. 그리고 이 영역에서 매우 짧은 펄스 플라즈마의 형태로 형성되는 빔 유도 플라즈마채널의 이온밀도 및 conductivity를 진단하는 새로운 실험적 방법을 확립하였다. 한편 빔 수송효율 증대를 위한 한 방법으로 진공영역에서 지역화된 중성기체를 빔 선두부분에 위치시켜 지역적인 공간전하 중성화를 꾀하는 기법도 시험되었다. 마지막으로 중 출력(1kV, 10kA, 1ms) 규모의 자기플라즈마 동력학 장치를 제작하여 펄스 플라즈마를 발생시키고 그 특성을 조사하였다. 제작된 자기플라즈마 동력학 장치는 현재 기초과학 지원 연구소의 "한빛" 장치에 부착되어 초기 플라즈마 발생용으로 활용되고 있다.로 활용되고 있다.

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