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http://dx.doi.org/10.3795/KSME-A.2007.31.1.050

Fabrication of Nickel Nano and Microstructures by Redeposition Phenomena in Ion Etching Process  

Jung, Phill-Gu (부산대학교 기계공학부)
Hwang, Sung-Jin (부산대학교 기계공학부)
Lee, Sang-Min (부산대학교 미세기계전자시스템협동과정)
Ko, Jong-Soo (부산대학교 기계공학부)
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.31, no.1, 2007 , pp. 50-54 More about this Journal
Abstract
Nickel nano and microstructures are fabricated with simple process. The fabrication process consists of nickel deposition, lithography, nickel ion etching and plasma ashing. Well-aligned nickel nanowalls and nickel self-encapsulated microchannels were fabricated. We found that the ion etching condition as a key fabrication process of nickel nanowalls and self-encapsulated microchannels, i.e., 40 sccm Ar flow, 550 W RF power, 15 mTorr working pressure, and $20^{\circ}C$ water cooled platen without using He backside cooling unit and with using it, respectively. We present the experimental results and discuss the formational conditions and the effect of nickel redeposition on the fabrication of nickel nano and microstructures.
Keywords
Nickel; Nanowall; Microchannel; Ion Etching; Redeposition;
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